ATE512991T1 - Phenylglyoxalsäureester, die durch photolyse wenig migrierende fragmente bilden - Google Patents
Phenylglyoxalsäureester, die durch photolyse wenig migrierende fragmente bildenInfo
- Publication number
- ATE512991T1 ATE512991T1 AT06755125T AT06755125T ATE512991T1 AT E512991 T1 ATE512991 T1 AT E512991T1 AT 06755125 T AT06755125 T AT 06755125T AT 06755125 T AT06755125 T AT 06755125T AT E512991 T1 ATE512991 T1 AT E512991T1
- Authority
- AT
- Austria
- Prior art keywords
- fragments
- migring
- phenylglyoxal
- photolysis
- acid esters
- Prior art date
Links
- 150000002148 esters Chemical class 0.000 title abstract 2
- 239000012634 fragment Substances 0.000 title abstract 2
- OJUGVDODNPJEEC-UHFFFAOYSA-N phenylglyoxal Chemical compound O=CC(=O)C1=CC=CC=C1 OJUGVDODNPJEEC-UHFFFAOYSA-N 0.000 title 2
- 239000002253 acid Substances 0.000 title 1
- 238000006303 photolysis reaction Methods 0.000 title 1
- 230000015843 photosynthesis, light reaction Effects 0.000 title 1
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/61—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a ring other than a six-membered aromatic ring of the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
- C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/909—Solventless ink
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT000032A ITVA20050032A1 (it) | 2005-05-13 | 2005-05-13 | Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore |
| PCT/EP2006/062206 WO2006120212A1 (en) | 2005-05-13 | 2006-05-10 | Phenylglyoxalic esters generating by photolysis low migratable fragments |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE512991T1 true ATE512991T1 (de) | 2011-07-15 |
Family
ID=36698801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT06755125T ATE512991T1 (de) | 2005-05-13 | 2006-05-10 | Phenylglyoxalsäureester, die durch photolyse wenig migrierende fragmente bilden |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7868054B2 (de) |
| EP (1) | EP1879925B1 (de) |
| CN (1) | CN101175773B (de) |
| AT (1) | ATE512991T1 (de) |
| IT (1) | ITVA20050032A1 (de) |
| WO (1) | WO2006120212A1 (de) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE533814T1 (de) | 2008-01-17 | 2011-12-15 | Basf Se | Modifizierte olefinpolymere |
| EP2342237B1 (de) | 2008-11-03 | 2014-04-23 | Basf Se | Fotoinitiatormischungen |
| US8816211B2 (en) | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
| US20120208914A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photoinitiator compositions and uses |
| US20120207935A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photocurable inks and methods of use |
| JP6221204B2 (ja) * | 2011-03-28 | 2017-11-01 | 日立化成株式会社 | 感光性樹脂組成物、感光性フィルム、パターン形成方法、中空構造の形成方法、及び電子部品 |
| AT514594B1 (de) | 2013-09-06 | 2015-02-15 | Durst Phototech Digital Tech | Photoinitiator |
| ES2831086T3 (es) * | 2016-09-02 | 2021-06-07 | Igm Group B V | Glioxilatos policíclicos como fotoiniciadores |
| CN111032102B (zh) | 2017-08-17 | 2022-03-22 | 科洛普拉斯特公司 | 聚合物涂层 |
| CN108623559A (zh) * | 2018-03-28 | 2018-10-09 | 同济大学 | 一种二苯并噻吩甲酰甲酸酯类光引发剂及其制备方法与应用 |
| CN112441953A (zh) * | 2020-11-22 | 2021-03-05 | 同济大学 | 含二苯硫醚基酮甲酸酯水溶性光聚合引发剂及其制备方法 |
| CN120865170A (zh) * | 2024-04-30 | 2025-10-31 | 常州强力先端电子材料有限公司 | 一种光引发剂及其制备方法和应用 |
| CN120865455A (zh) * | 2024-04-30 | 2025-10-31 | 常州强力先端电子材料有限公司 | 一种光固化组合物及其应用 |
| CN120865125A (zh) * | 2024-04-30 | 2025-10-31 | 常州强力先端电子材料有限公司 | 一种光引发剂及其制备方法和应用 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3844916A (en) * | 1972-09-18 | 1974-10-29 | Desoto Inc | Radiation curable non-gelled michael addition reaction products |
| US3930868A (en) * | 1973-05-23 | 1976-01-06 | The Richardson Company | Light sensitive arylglyoxyacrylate compositions |
| US4038164A (en) * | 1975-09-18 | 1977-07-26 | Stauffer Chemical Company | Photopolymerizable aryl and heterocyclic glyoxylate compositions and process |
| US4024297A (en) * | 1976-02-02 | 1977-05-17 | Ppg Industries, Inc. | Actinic light polymerizable coating compositions |
| US4048034A (en) * | 1976-08-27 | 1977-09-13 | Uop Inc. | Photopolymerization using an alpha-aminoacetophenone |
| EP0003002B1 (de) * | 1977-12-22 | 1984-06-13 | Ciba-Geigy Ag | Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone |
| DE2825955A1 (de) * | 1978-06-14 | 1980-01-03 | Bayer Ag | Arylglyoxyloyloxyalkylacrylate und ihre verwendung in photopolymerisierbaren bindemitteln |
| JPS55139217A (en) * | 1979-04-19 | 1980-10-30 | Aisin Seiki Co Ltd | Method and apparatus for welding hollow thermoplastic resin material in hot air |
| US4475999A (en) * | 1983-06-06 | 1984-10-09 | Stauffer Chemical Company | Sensitization of glyoxylate photoinitiators |
| US4987159A (en) * | 1990-04-11 | 1991-01-22 | Fratelli Lamberti S.P.A. | Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use |
| DK0956280T3 (da) * | 1997-01-30 | 2003-02-24 | Ciba Sc Holding Ag | Ikke-flygtige phenylglyoxylsyreestere |
| DE19913353A1 (de) * | 1999-03-24 | 2000-09-28 | Basf Ag | Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren |
| TWI312786B (en) * | 2001-11-08 | 2009-08-01 | Ciba Sc Holding Ag | Novel difunctional photoinitiators |
| JP4222945B2 (ja) * | 2002-02-04 | 2009-02-12 | チバ ホールディング インコーポレーテッド | 界面活性シロキサン光開始剤 |
| AU2003246675A1 (en) * | 2002-07-19 | 2004-02-09 | Ciba Specialty Chemicals Holding Inc. | New difunctional photoinitiators |
| US7309550B2 (en) * | 2004-09-20 | 2007-12-18 | Chemence, Inc. | Photosensitive composition with low yellowing under UV-light and sunlight exposure |
-
2005
- 2005-05-13 IT IT000032A patent/ITVA20050032A1/it unknown
-
2006
- 2006-05-10 CN CN2006800160983A patent/CN101175773B/zh active Active
- 2006-05-10 AT AT06755125T patent/ATE512991T1/de not_active IP Right Cessation
- 2006-05-10 WO PCT/EP2006/062206 patent/WO2006120212A1/en not_active Ceased
- 2006-05-10 US US11/914,245 patent/US7868054B2/en active Active
- 2006-05-10 EP EP06755125A patent/EP1879925B1/de active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US7868054B2 (en) | 2011-01-11 |
| WO2006120212A1 (en) | 2006-11-16 |
| CN101175773B (zh) | 2010-04-14 |
| ITVA20050032A1 (it) | 2006-11-14 |
| CN101175773A (zh) | 2008-05-07 |
| US20080193677A1 (en) | 2008-08-14 |
| EP1879925B1 (de) | 2011-06-15 |
| EP1879925A1 (de) | 2008-01-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |