ATE512991T1 - Phenylglyoxalsäureester, die durch photolyse wenig migrierende fragmente bilden - Google Patents

Phenylglyoxalsäureester, die durch photolyse wenig migrierende fragmente bilden

Info

Publication number
ATE512991T1
ATE512991T1 AT06755125T AT06755125T ATE512991T1 AT E512991 T1 ATE512991 T1 AT E512991T1 AT 06755125 T AT06755125 T AT 06755125T AT 06755125 T AT06755125 T AT 06755125T AT E512991 T1 ATE512991 T1 AT E512991T1
Authority
AT
Austria
Prior art keywords
fragments
migring
phenylglyoxal
photolysis
acid esters
Prior art date
Application number
AT06755125T
Other languages
English (en)
Inventor
Stefano Romagnano
Gabriele Norcini
Marco Visconti
Bassi Giuseppe Li
Original Assignee
Lamberti Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lamberti Spa filed Critical Lamberti Spa
Application granted granted Critical
Publication of ATE512991T1 publication Critical patent/ATE512991T1/de

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/61Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a ring other than a six-membered aromatic ring of the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/909Solventless ink

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
AT06755125T 2005-05-13 2006-05-10 Phenylglyoxalsäureester, die durch photolyse wenig migrierende fragmente bilden ATE512991T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT000032A ITVA20050032A1 (it) 2005-05-13 2005-05-13 Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore
PCT/EP2006/062206 WO2006120212A1 (en) 2005-05-13 2006-05-10 Phenylglyoxalic esters generating by photolysis low migratable fragments

Publications (1)

Publication Number Publication Date
ATE512991T1 true ATE512991T1 (de) 2011-07-15

Family

ID=36698801

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06755125T ATE512991T1 (de) 2005-05-13 2006-05-10 Phenylglyoxalsäureester, die durch photolyse wenig migrierende fragmente bilden

Country Status (6)

Country Link
US (1) US7868054B2 (de)
EP (1) EP1879925B1 (de)
CN (1) CN101175773B (de)
AT (1) ATE512991T1 (de)
IT (1) ITVA20050032A1 (de)
WO (1) WO2006120212A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE533814T1 (de) 2008-01-17 2011-12-15 Basf Se Modifizierte olefinpolymere
EP2342237B1 (de) 2008-11-03 2014-04-23 Basf Se Fotoinitiatormischungen
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
JP6221204B2 (ja) * 2011-03-28 2017-11-01 日立化成株式会社 感光性樹脂組成物、感光性フィルム、パターン形成方法、中空構造の形成方法、及び電子部品
AT514594B1 (de) 2013-09-06 2015-02-15 Durst Phototech Digital Tech Photoinitiator
ES2831086T3 (es) * 2016-09-02 2021-06-07 Igm Group B V Glioxilatos policíclicos como fotoiniciadores
CN111032102B (zh) 2017-08-17 2022-03-22 科洛普拉斯特公司 聚合物涂层
CN108623559A (zh) * 2018-03-28 2018-10-09 同济大学 一种二苯并噻吩甲酰甲酸酯类光引发剂及其制备方法与应用
CN112441953A (zh) * 2020-11-22 2021-03-05 同济大学 含二苯硫醚基酮甲酸酯水溶性光聚合引发剂及其制备方法
CN120865170A (zh) * 2024-04-30 2025-10-31 常州强力先端电子材料有限公司 一种光引发剂及其制备方法和应用
CN120865455A (zh) * 2024-04-30 2025-10-31 常州强力先端电子材料有限公司 一种光固化组合物及其应用
CN120865125A (zh) * 2024-04-30 2025-10-31 常州强力先端电子材料有限公司 一种光引发剂及其制备方法和应用

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US3844916A (en) * 1972-09-18 1974-10-29 Desoto Inc Radiation curable non-gelled michael addition reaction products
US3930868A (en) * 1973-05-23 1976-01-06 The Richardson Company Light sensitive arylglyoxyacrylate compositions
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
US4024297A (en) * 1976-02-02 1977-05-17 Ppg Industries, Inc. Actinic light polymerizable coating compositions
US4048034A (en) * 1976-08-27 1977-09-13 Uop Inc. Photopolymerization using an alpha-aminoacetophenone
EP0003002B1 (de) * 1977-12-22 1984-06-13 Ciba-Geigy Ag Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone
DE2825955A1 (de) * 1978-06-14 1980-01-03 Bayer Ag Arylglyoxyloyloxyalkylacrylate und ihre verwendung in photopolymerisierbaren bindemitteln
JPS55139217A (en) * 1979-04-19 1980-10-30 Aisin Seiki Co Ltd Method and apparatus for welding hollow thermoplastic resin material in hot air
US4475999A (en) * 1983-06-06 1984-10-09 Stauffer Chemical Company Sensitization of glyoxylate photoinitiators
US4987159A (en) * 1990-04-11 1991-01-22 Fratelli Lamberti S.P.A. Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use
DK0956280T3 (da) * 1997-01-30 2003-02-24 Ciba Sc Holding Ag Ikke-flygtige phenylglyoxylsyreestere
DE19913353A1 (de) * 1999-03-24 2000-09-28 Basf Ag Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren
TWI312786B (en) * 2001-11-08 2009-08-01 Ciba Sc Holding Ag Novel difunctional photoinitiators
JP4222945B2 (ja) * 2002-02-04 2009-02-12 チバ ホールディング インコーポレーテッド 界面活性シロキサン光開始剤
AU2003246675A1 (en) * 2002-07-19 2004-02-09 Ciba Specialty Chemicals Holding Inc. New difunctional photoinitiators
US7309550B2 (en) * 2004-09-20 2007-12-18 Chemence, Inc. Photosensitive composition with low yellowing under UV-light and sunlight exposure

Also Published As

Publication number Publication date
US7868054B2 (en) 2011-01-11
WO2006120212A1 (en) 2006-11-16
CN101175773B (zh) 2010-04-14
ITVA20050032A1 (it) 2006-11-14
CN101175773A (zh) 2008-05-07
US20080193677A1 (en) 2008-08-14
EP1879925B1 (de) 2011-06-15
EP1879925A1 (de) 2008-01-23

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