ATE517419T1 - Begrenzungseinrichtung für elektromagnetische strahlung, insbesondere in einem analysegerät - Google Patents

Begrenzungseinrichtung für elektromagnetische strahlung, insbesondere in einem analysegerät

Info

Publication number
ATE517419T1
ATE517419T1 AT02738530T AT02738530T ATE517419T1 AT E517419 T1 ATE517419 T1 AT E517419T1 AT 02738530 T AT02738530 T AT 02738530T AT 02738530 T AT02738530 T AT 02738530T AT E517419 T1 ATE517419 T1 AT E517419T1
Authority
AT
Austria
Prior art keywords
electromagnetic radiation
analyzer
beam cross
limitation device
section limiter
Prior art date
Application number
AT02738530T
Other languages
English (en)
Inventor
Jan Boldewijn
Den Hoogenhof Waltherus Van
Original Assignee
Panalytical Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panalytical Bv filed Critical Panalytical Bv
Application granted granted Critical
Publication of ATE517419T1 publication Critical patent/ATE517419T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Radiation (AREA)
AT02738530T 2001-06-29 2002-06-20 Begrenzungseinrichtung für elektromagnetische strahlung, insbesondere in einem analysegerät ATE517419T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01202514 2001-06-29
PCT/IB2002/002479 WO2003002996A2 (en) 2001-06-29 2002-06-20 Limiting device for electromagnetic radiation, notably in an analysis device

Publications (1)

Publication Number Publication Date
ATE517419T1 true ATE517419T1 (de) 2011-08-15

Family

ID=8180568

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02738530T ATE517419T1 (de) 2001-06-29 2002-06-20 Begrenzungseinrichtung für elektromagnetische strahlung, insbesondere in einem analysegerät

Country Status (5)

Country Link
US (1) US7247854B2 (de)
EP (1) EP1434983B1 (de)
JP (1) JP4406559B2 (de)
AT (1) ATE517419T1 (de)
WO (1) WO2003002996A2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2406405A (en) * 2003-09-24 2005-03-30 Loyalty Founder Entpr Co Ltd Portable data storage device with playback facility

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4260885A (en) * 1978-02-24 1981-04-07 Albert Richard D Selectable wavelength X-ray source, spectrometer and assay method
JPS62226551A (ja) * 1986-03-27 1987-10-05 Toshiba Corp 質量分析装置
JPH0519839Y2 (de) * 1986-06-09 1993-05-25
US5334838A (en) * 1992-12-11 1994-08-02 American Mining Electronics, Inc. Radiation sensor
EP0623817B1 (de) * 1993-04-23 1999-01-13 Shimadzu Corporation Ortsaufgelöste Analyse einer Probe mittels eines Röntgenfluoreszenzspektrometers
JP3049313B2 (ja) * 1998-08-13 2000-06-05 科学技術庁金属材料技術研究所長 Ｘ線撮像分析方法および装置
JP3284198B2 (ja) * 1998-10-30 2002-05-20 理学電機工業株式会社 蛍光ｘ線分析装置
US6653645B1 (en) * 2000-05-15 2003-11-25 Hsing-Yao Chen Deflection lens device for electron beam lithography

Also Published As

Publication number Publication date
EP1434983A2 (de) 2004-07-07
JP4406559B2 (ja) 2010-01-27
JP2004530913A (ja) 2004-10-07
EP1434983B1 (de) 2011-07-20
US7247854B2 (en) 2007-07-24
WO2003002996A2 (en) 2003-01-09
US20040234035A1 (en) 2004-11-25
WO2003002996A3 (en) 2004-04-22

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties