ATE518111T1 - Profilaufnahme von komplexen oberflächenstrukturen unter verwendung von abtastinterferometrie - Google Patents

Profilaufnahme von komplexen oberflächenstrukturen unter verwendung von abtastinterferometrie

Info

Publication number
ATE518111T1
ATE518111T1 AT04718544T AT04718544T ATE518111T1 AT E518111 T1 ATE518111 T1 AT E518111T1 AT 04718544 T AT04718544 T AT 04718544T AT 04718544 T AT04718544 T AT 04718544T AT E518111 T1 ATE518111 T1 AT E518111T1
Authority
AT
Austria
Prior art keywords
profiling
surface structures
complex surface
scanning interferometry
interferometry
Prior art date
Application number
AT04718544T
Other languages
English (en)
Inventor
Groot Peter De
Robert Stoner
De Lega Xavier Colonna
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Priority claimed from PCT/US2004/007033 external-priority patent/WO2004079295A2/en
Application granted granted Critical
Publication of ATE518111T1 publication Critical patent/ATE518111T1/de

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/0209Low-coherence interferometers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608Height gauges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02041Interferometers characterised by particular imaging or detection techniques
    • G01B9/02044Imaging in the frequency domain, e.g. by using a spectrometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AT04718544T 2003-03-06 2004-03-08 Profilaufnahme von komplexen oberflächenstrukturen unter verwendung von abtastinterferometrie ATE518111T1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US45261503P 2003-03-06 2003-03-06
US45246503P 2003-03-06 2003-03-06
US53943704P 2004-01-26 2004-01-26
PCT/US2004/007033 WO2004079295A2 (en) 2003-03-06 2004-03-08 Profiling complex surface structures using scanning interferometry

Publications (1)

Publication Number Publication Date
ATE518111T1 true ATE518111T1 (de) 2011-08-15

Family

ID=35695979

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04718544T ATE518111T1 (de) 2003-03-06 2004-03-08 Profilaufnahme von komplexen oberflächenstrukturen unter verwendung von abtastinterferometrie

Country Status (2)

Country Link
EP (1) EP1604169B1 (de)
AT (1) ATE518111T1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101010189B1 (ko) * 2008-06-30 2011-01-21 에스엔유 프리시젼 주식회사 두께 또는 표면형상 측정방법
WO2021168611A1 (en) * 2020-02-24 2021-09-02 Yangtze Memory Technologies Co., Ltd. Systems and methods for semiconductor chip surface topography metrology
CN111356896B (zh) 2020-02-24 2021-01-12 长江存储科技有限责任公司 用于半导体芯片表面形貌计量的系统和方法
CN111406198B (zh) 2020-02-24 2021-02-19 长江存储科技有限责任公司 用于半导体芯片表面形貌计量的系统和方法
US11761753B2 (en) * 2021-07-30 2023-09-19 Svarog LLC Thin films and surface topography measurement using polarization resolved interferometry

Also Published As

Publication number Publication date
EP1604169B1 (de) 2020-05-06
EP1604169A2 (de) 2005-12-14

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Legal Events

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