ATE518901T1 - Vernetzbares prepolymer, herstellungsverfahren dafür und verwendung davon - Google Patents

Vernetzbares prepolymer, herstellungsverfahren dafür und verwendung davon

Info

Publication number
ATE518901T1
ATE518901T1 AT07744514T AT07744514T ATE518901T1 AT E518901 T1 ATE518901 T1 AT E518901T1 AT 07744514 T AT07744514 T AT 07744514T AT 07744514 T AT07744514 T AT 07744514T AT E518901 T1 ATE518901 T1 AT E518901T1
Authority
AT
Austria
Prior art keywords
prepolymer
cross
production process
linkable prepolymer
crosslinkable
Prior art date
Application number
AT07744514T
Other languages
English (en)
Inventor
Masahiro Ito
Shunsuke Yokotsuka
Takeshi Eriguchi
Kaori Tsuruoka
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE518901T1 publication Critical patent/ATE518901T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/06—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polyethers, polyoxymethylenes or polyacetals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
    • C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/48—Polymers modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/28—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
    • C08G2650/46—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing halogen
    • C08G2650/48—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing halogen containing fluorine, e.g. perfluropolyethers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyethers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
AT07744514T 2006-06-02 2007-05-31 Vernetzbares prepolymer, herstellungsverfahren dafür und verwendung davon ATE518901T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006154515 2006-06-02
JP2006315359 2006-11-22
PCT/JP2007/061126 WO2007142124A1 (ja) 2006-06-02 2007-05-31 架橋性プレポリマーならびにその製造方法および用途

Publications (1)

Publication Number Publication Date
ATE518901T1 true ATE518901T1 (de) 2011-08-15

Family

ID=38801381

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07744514T ATE518901T1 (de) 2006-06-02 2007-05-31 Vernetzbares prepolymer, herstellungsverfahren dafür und verwendung davon

Country Status (6)

Country Link
US (1) US8519080B2 (de)
EP (1) EP2025698B1 (de)
CN (1) CN101454375B (de)
AT (1) ATE518901T1 (de)
TW (1) TW200815498A (de)
WO (1) WO2007142124A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1995635A4 (de) * 2006-03-16 2011-03-30 Asahi Glass Co Ltd Negative lichtempfindliche fluorierte aromatische harzzusammensetzung
JP5245378B2 (ja) * 2007-11-30 2013-07-24 旭硝子株式会社 架橋性プレポリマー、その製造方法および用途
CN102066443B (zh) * 2008-06-19 2014-01-15 旭硝子株式会社 固化性组合物及使用了该组合物的固化膜
EP2344568B1 (de) 2008-09-23 2017-12-20 Nexam Chemical AB Acetylenpolyamid
JP5459310B2 (ja) 2009-03-18 2014-04-02 旭硝子株式会社 光導波路およびその製造方法
CN102892800B (zh) 2010-05-14 2015-05-13 聂克斯姆化学有限公司 交联催化
CN102947359B (zh) * 2010-06-23 2014-12-24 旭硝子株式会社 固化性组合物和固化膜的制造方法
CN104813232A (zh) * 2012-09-28 2015-07-29 纳幕尔杜邦公司 包含具有其上设置可成像的可交联含氟聚合物膜的基板的可成像制品,以及由其制备的成像制品
US9581763B2 (en) * 2014-05-15 2017-02-28 The Boeing Company Method for fabricating an optical device using a treated surface
WO2022220018A1 (ja) * 2021-04-15 2022-10-20 ダイキン工業株式会社 フッ素ゴム架橋用組成物、成形品およびシール材

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5155175A (en) * 1989-12-08 1992-10-13 Intellectual Property Law Dept. Crosslinkable fluorinated polyarylene ether composition
JP3195247B2 (ja) * 1996-08-30 2001-08-06 沖電気工業株式会社 有機絶縁膜材料およびその製造方法
JP3969779B2 (ja) * 1997-03-05 2007-09-05 沖電気工業株式会社 有機絶縁膜材料の製造方法
JP4843870B2 (ja) * 2001-05-31 2011-12-21 旭硝子株式会社 新規ポリアリーレンエーテル、その製造方法及びその用途
JP4206925B2 (ja) * 2001-07-12 2009-01-14 旭硝子株式会社 含フッ素芳香族ポリマー及びその用途
US6716955B2 (en) * 2002-01-14 2004-04-06 Air Products And Chemicals, Inc. Poly(arylene ether) polymer with low temperature crosslinking grafts and adhesive comprising the same
JP4501052B2 (ja) * 2002-01-24 2010-07-14 東洋紡績株式会社 熱架橋性高分子固体電解質、高分子固体電解質膜及びその製造方法
JP2003342411A (ja) 2002-05-29 2003-12-03 Asahi Glass Co Ltd 多孔質ナノコンポジット薄膜及びその形成方法
JP5177933B2 (ja) 2003-08-12 2013-04-10 東洋インキＳｃホールディングス株式会社 隔壁用組成物、それを用いた画素形成用基板および画素の形成方法
JP4501391B2 (ja) * 2003-09-30 2010-07-14 旭硝子株式会社 架橋性含フッ素芳香族プレポリマー及びその用途
JP2006154515A (ja) 2004-11-30 2006-06-15 Koninkl Philips Electronics Nv 電子インク表示装置及びその製造方法
DE102005001599A1 (de) * 2005-01-12 2006-07-20 Basf Ag Funktionalisierte Polyarylether
JP4696675B2 (ja) 2005-05-16 2011-06-08 凸版印刷株式会社 レトルト用透明バリアフィルムおよびその製造方法
JP5549900B2 (ja) * 2005-06-24 2014-07-16 旭硝子株式会社 架橋性含フッ素芳香族プレポリマー及びその用途
EP1995635A4 (de) 2006-03-16 2011-03-30 Asahi Glass Co Ltd Negative lichtempfindliche fluorierte aromatische harzzusammensetzung

Also Published As

Publication number Publication date
EP2025698A1 (de) 2009-02-18
CN101454375A (zh) 2009-06-10
CN101454375B (zh) 2012-06-06
TW200815498A (en) 2008-04-01
US20090081376A1 (en) 2009-03-26
WO2007142124A1 (ja) 2007-12-13
US8519080B2 (en) 2013-08-27
EP2025698B1 (de) 2011-08-03
EP2025698A4 (de) 2010-08-18

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