ATE518970T1 - Doppelbeschichtungsvorrichtung mit verbesserter trennplatte - Google Patents

Doppelbeschichtungsvorrichtung mit verbesserter trennplatte

Info

Publication number
ATE518970T1
ATE518970T1 AT08101220T AT08101220T ATE518970T1 AT E518970 T1 ATE518970 T1 AT E518970T1 AT 08101220 T AT08101220 T AT 08101220T AT 08101220 T AT08101220 T AT 08101220T AT E518970 T1 ATE518970 T1 AT E518970T1
Authority
AT
Austria
Prior art keywords
coating device
separation plate
improved separation
double coating
process chambers
Prior art date
Application number
AT08101220T
Other languages
English (en)
Inventor
Hans Wolf
Oliver Heimel
Joerg Krempel-Hesse
Frank Fuchs
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of ATE518970T1 publication Critical patent/ATE518970T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating Apparatus (AREA)
AT08101220T 2008-02-01 2008-02-01 Doppelbeschichtungsvorrichtung mit verbesserter trennplatte ATE518970T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08101220A EP2085494B1 (de) 2008-02-01 2008-02-01 Doppelbeschichtungsvorrichtung mit verbesserter Trennplatte

Publications (1)

Publication Number Publication Date
ATE518970T1 true ATE518970T1 (de) 2011-08-15

Family

ID=39535500

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08101220T ATE518970T1 (de) 2008-02-01 2008-02-01 Doppelbeschichtungsvorrichtung mit verbesserter trennplatte

Country Status (3)

Country Link
EP (1) EP2085494B1 (de)
CN (1) CN101503795B (de)
AT (1) ATE518970T1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102703865A (zh) * 2012-06-14 2012-10-03 昆山浦力金属工业有限公司 一种真空镀膜机

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19505258C2 (de) 1995-02-16 1998-08-06 Samsung Electronics Co Ltd Beschichtungsvorrichtung
EP0946781A1 (de) * 1996-12-23 1999-10-06 Balzers Aktiengesellschaft Vakuumbehandlungsanlage
IT1310029B1 (it) * 1999-02-26 2002-02-05 Ist Naz Fisica Della Materia Vaporizzatore a microplasma pulsato.
US6214120B1 (en) * 1999-08-27 2001-04-10 Innovac Corporation High throughput multi-vacuum chamber system for processing wafers and method of processing wafers using the same
DE10348281B4 (de) 2003-10-17 2007-06-06 Applied Materials Gmbh & Co. Kg Vakuum-Behandlungsanlage für ebene rechteckige oder quadratische Substrate
DE10352144B8 (de) 2003-11-04 2008-11-13 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten
EP1717339A2 (de) 2005-04-20 2006-11-02 Applied Films GmbH & Co. KG Kontinuierliche Beschichtungsanlage

Also Published As

Publication number Publication date
EP2085494A1 (de) 2009-08-05
EP2085494B1 (de) 2011-08-03
CN101503795A (zh) 2009-08-12
CN101503795B (zh) 2012-03-14

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties