ATE521915T1 - Verfahren zur erzeugung einer strukturierten schicht auf einem substrat - Google Patents

Verfahren zur erzeugung einer strukturierten schicht auf einem substrat

Info

Publication number
ATE521915T1
ATE521915T1 AT06819306T AT06819306T ATE521915T1 AT E521915 T1 ATE521915 T1 AT E521915T1 AT 06819306 T AT06819306 T AT 06819306T AT 06819306 T AT06819306 T AT 06819306T AT E521915 T1 ATE521915 T1 AT E521915T1
Authority
AT
Austria
Prior art keywords
producing
substrate
stepper
tools
structured layer
Prior art date
Application number
AT06819306T
Other languages
English (en)
Inventor
Michael Chudzik
Joseph Shepard
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of ATE521915T1 publication Critical patent/ATE521915T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electrodes Of Semiconductors (AREA)
AT06819306T 2005-12-01 2006-11-07 Verfahren zur erzeugung einer strukturierten schicht auf einem substrat ATE521915T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/164,684 US7871933B2 (en) 2005-12-01 2005-12-01 Combined stepper and deposition tool
PCT/EP2006/068188 WO2007062962A1 (en) 2005-12-01 2006-11-07 Combined stepper and deposition tool

Publications (1)

Publication Number Publication Date
ATE521915T1 true ATE521915T1 (de) 2011-09-15

Family

ID=37698226

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06819306T ATE521915T1 (de) 2005-12-01 2006-11-07 Verfahren zur erzeugung einer strukturierten schicht auf einem substrat

Country Status (7)

Country Link
US (1) US7871933B2 (de)
EP (1) EP1955113B1 (de)
JP (1) JP2009517872A (de)
KR (1) KR101063715B1 (de)
CN (1) CN101313250B (de)
AT (1) ATE521915T1 (de)
WO (1) WO2007062962A1 (de)

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US8017183B2 (en) * 2007-09-26 2011-09-13 Eastman Kodak Company Organosiloxane materials for selective area deposition of inorganic materials
JP5438750B2 (ja) * 2008-03-24 2014-03-12 本田技研工業株式会社 原子間力顕微鏡を利用したナノ構造の堆積のための装置
US20090238990A1 (en) * 2008-03-24 2009-09-24 Neil Dasgupta SAM oxidative removal for controlled nanofabrication

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Also Published As

Publication number Publication date
EP1955113B1 (de) 2011-08-24
CN101313250B (zh) 2011-06-29
KR101063715B1 (ko) 2011-09-07
US20070128859A1 (en) 2007-06-07
KR20080071597A (ko) 2008-08-04
CN101313250A (zh) 2008-11-26
US7871933B2 (en) 2011-01-18
JP2009517872A (ja) 2009-04-30
WO2007062962A1 (en) 2007-06-07
EP1955113A1 (de) 2008-08-13

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Legal Events

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