ATE527576T1 - Drucklithographie unter verwendung des flüssig- /fest-übergangs von metallen und ihren legierungen - Google Patents

Drucklithographie unter verwendung des flüssig- /fest-übergangs von metallen und ihren legierungen

Info

Publication number
ATE527576T1
ATE527576T1 AT05757746T AT05757746T ATE527576T1 AT E527576 T1 ATE527576 T1 AT E527576T1 AT 05757746 T AT05757746 T AT 05757746T AT 05757746 T AT05757746 T AT 05757746T AT E527576 T1 ATE527576 T1 AT E527576T1
Authority
AT
Austria
Prior art keywords
liquid
alloys
metals
solid transition
patternable layer
Prior art date
Application number
AT05757746T
Other languages
English (en)
Inventor
Yong Chen
Original Assignee
Hewlett Packard Development Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Development Co filed Critical Hewlett Packard Development Co
Application granted granted Critical
Publication of ATE527576T1 publication Critical patent/ATE527576T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Laminated Bodies (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
AT05757746T 2004-06-16 2005-06-08 Drucklithographie unter verwendung des flüssig- /fest-übergangs von metallen und ihren legierungen ATE527576T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/870,664 US7141275B2 (en) 2004-06-16 2004-06-16 Imprinting lithography using the liquid/solid transition of metals and their alloys
PCT/US2005/020351 WO2006009626A2 (en) 2004-06-16 2005-06-08 Imprinting lithography using the liquid/solid transition of metals and their alloys

Publications (1)

Publication Number Publication Date
ATE527576T1 true ATE527576T1 (de) 2011-10-15

Family

ID=34978708

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05757746T ATE527576T1 (de) 2004-06-16 2005-06-08 Drucklithographie unter verwendung des flüssig- /fest-übergangs von metallen und ihren legierungen

Country Status (5)

Country Link
US (2) US7141275B2 (de)
EP (1) EP1756669B1 (de)
JP (1) JP2008503873A (de)
AT (1) ATE527576T1 (de)
WO (1) WO2006009626A2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
MXPA06006738A (es) 2003-12-19 2006-08-31 Univ North Carolina Metodos para fabricar micro- y nano-estructuras aisladas utilizando litografia suave o de impresion.
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
WO2007133235A2 (en) * 2005-08-08 2007-11-22 Liquidia Technologies, Inc. Micro and nano-structure metrology
WO2009041510A1 (ja) * 2007-09-25 2009-04-02 Panasonic Electric Works Co., Ltd. 樹脂成形体の製造方法、その製造方法により得られる樹脂成形体、光デバイス、マイクロレンズ、マイクロレンズアレイ、及びマイクロ流体デバイス
JP5783714B2 (ja) * 2010-12-17 2015-09-24 キヤノン株式会社 光学素子の製造方法
DE102013111372B4 (de) * 2013-10-15 2016-06-30 Technische Universität Braunschweig Verfahren zur Herstellung eines oberflächenstrukturierten Gegenstands

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB189717969A (en) * 1897-07-31 1898-06-04 New Press Printing Company Han A New Method of Embossing Paper, Boards, Leather, Tin, and like Substances.
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
JPH1096808A (ja) * 1996-09-24 1998-04-14 Nippon Telegr & Teleph Corp <Ntt> 微細パタン形成法
US6048623A (en) * 1996-12-18 2000-04-11 Kimberly-Clark Worldwide, Inc. Method of contact printing on gold coated films
US5920848A (en) 1997-02-12 1999-07-06 Citibank, N.A. Method and system for using intelligent agents for financial transactions, services, accounting, and advice
WO1999064642A1 (en) 1998-06-08 1999-12-16 Borealis Technical Limited Method for fabricating metal nanostructures
US6680214B1 (en) * 1998-06-08 2004-01-20 Borealis Technical Limited Artificial band gap
US7074498B2 (en) * 2002-03-22 2006-07-11 Borealis Technical Limited Influence of surface geometry on metal properties
EP1003078A3 (de) * 1998-11-17 2001-11-07 Corning Incorporated Verfahren zur Vervielfältigung eines Nanomusters
US6518156B1 (en) * 1999-03-29 2003-02-11 Hewlett-Packard Company Configurable nanoscale crossbar electronic circuits made by electrochemical reaction
US6165911A (en) * 1999-12-29 2000-12-26 Calveley; Peter Braden Method of patterning a metal layer
SE516194C2 (sv) * 2000-04-18 2001-12-03 Obducat Ab Substrat för samt process vid tillverkning av strukturer
JP2004505273A (ja) 2000-08-01 2004-02-19 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィのための透明テンプレートと基板の間のギャップおよび配向を高精度でセンシングするための方法
US6964793B2 (en) * 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US6432740B1 (en) * 2001-06-28 2002-08-13 Hewlett-Packard Company Fabrication of molecular electronic circuit by imprinting
US6946410B2 (en) * 2002-04-05 2005-09-20 E. I. Du Pont De Nemours And Company Method for providing nano-structures of uniform length
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US20040112862A1 (en) * 2002-12-12 2004-06-17 Molecular Imprints, Inc. Planarization composition and method of patterning a substrate using the same
TW556031B (en) * 2003-01-17 2003-10-01 Chunghwa Picture Tubes Ltd Non-rubbing liquid crystal alignment method

Also Published As

Publication number Publication date
US20050282388A1 (en) 2005-12-22
US7141275B2 (en) 2006-11-28
EP1756669B1 (de) 2011-10-05
WO2006009626A3 (en) 2006-03-09
EP1756669A2 (de) 2007-02-28
JP2008503873A (ja) 2008-02-07
US20050280147A1 (en) 2005-12-22
WO2006009626A2 (en) 2006-01-26

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties