ATE532102T1 - Polymerisierbare verbindung und damit erhaltene polymerverbindung - Google Patents

Polymerisierbare verbindung und damit erhaltene polymerverbindung

Info

Publication number
ATE532102T1
ATE532102T1 AT09178831T AT09178831T ATE532102T1 AT E532102 T1 ATE532102 T1 AT E532102T1 AT 09178831 T AT09178831 T AT 09178831T AT 09178831 T AT09178831 T AT 09178831T AT E532102 T1 ATE532102 T1 AT E532102T1
Authority
AT
Austria
Prior art keywords
obtained therefrom
polymerizable compound
compound
polymer compound
compound obtained
Prior art date
Application number
AT09178831T
Other languages
English (en)
Inventor
Shuji Hirano
Kaoru Iwato
Hiroshi Saegusa
Yusuke Iizuka
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE532102T1 publication Critical patent/ATE532102T1/de

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D493/00Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/12Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains three hetero rings
    • C07D493/14Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07HSUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
    • C07H13/00Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids
    • C07H13/02Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids by carboxylic acids
    • C07H13/04Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids by carboxylic acids having the esterifying carboxyl radicals attached to acyclic carbon atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • Biotechnology (AREA)
  • General Health & Medical Sciences (AREA)
  • Genetics & Genomics (AREA)
  • Molecular Biology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT09178831T 2008-12-12 2009-12-11 Polymerisierbare verbindung und damit erhaltene polymerverbindung ATE532102T1 (de)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP2008317753 2008-12-12
JP2008317752 2008-12-12
JP2008317754 2008-12-12
JP2009054291 2009-03-06
JP2009091616 2009-04-03
JP2009122470 2009-05-20
JP2009131275 2009-05-29
JP2009251478 2009-10-30

Publications (1)

Publication Number Publication Date
ATE532102T1 true ATE532102T1 (de) 2011-11-15

Family

ID=41505717

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09178831T ATE532102T1 (de) 2008-12-12 2009-12-11 Polymerisierbare verbindung und damit erhaltene polymerverbindung

Country Status (2)

Country Link
EP (2) EP2196853B1 (de)
AT (1) ATE532102T1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102311344B (zh) * 2010-06-25 2014-05-28 锦湖石油化学株式会社 化合物、包含所述化合物的共聚物和包含所述共聚物的抗蚀剂保护膜组合物
EP2926802B1 (de) 2014-04-02 2017-09-27 Noxell Corporation Haarfärbezusammensetzungen, Kits, Verfahren, und ihre Verwendung

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4669745B2 (ja) 2004-06-28 2011-04-13 富士フイルム株式会社 感光性組成物及びそれを用いたパターン形成方法
TWI375121B (en) * 2004-06-28 2012-10-21 Fujifilm Corp Photosensitive composition and method for forming pattern using the same
JP4533756B2 (ja) * 2005-01-07 2010-09-01 富士フイルム株式会社 イオン注入工程用ポジ型レジスト組成物及びそれを用いたイオン注入方法
JP2006276444A (ja) * 2005-03-29 2006-10-12 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いたパターン形成方法
JP4861767B2 (ja) * 2005-07-26 2012-01-25 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
JP2008074805A (ja) * 2006-09-25 2008-04-03 Daicel Chem Ind Ltd 高純度(メタ)アクリル酸エステルの製造方法
JP2009054291A (ja) 2007-08-23 2009-03-12 Toyota Motor Corp 燃料電池
JP5493260B2 (ja) 2007-10-09 2014-05-14 Jfeスチール株式会社 溶融金属めっき鋼帯製造装置及び溶融金属めっき鋼帯の製造方法
JP2009122470A (ja) 2007-11-16 2009-06-04 Sumitomo Chemical Co Ltd 集光層付き光拡散板
JP2009251478A (ja) 2008-04-10 2009-10-29 Ricoh Co Ltd 現像装置、プロセスユニット及び画像形成装置
JP5227223B2 (ja) 2009-03-11 2013-07-03 株式会社セルシード 細胞培養支持体

Also Published As

Publication number Publication date
EP2299326A1 (de) 2011-03-23
EP2196853A1 (de) 2010-06-16
EP2196853B1 (de) 2011-11-02

Similar Documents

Publication Publication Date Title
EA201100919A1 (ru) Спирогетероциклические n-оксипиперидины в качестве пестицидов
MY150609A (en) Spiroheterocyclic pyrrolidine dione derivatives useful as pesticides
EA201170132A1 (ru) 5-гетероциклилалкил-3-гидрокси-2-фенилциклопент-2-еноны в качестве гербицидов
EA201000396A1 (ru) Новые фунгициды
EA201000395A1 (ru) Фунгицидные производные 2-алкилтио-2-хинолинилоксиацетамида
CR9113A (es) Compuestos acetamida como fungicidas
EA201000269A1 (ru) Новые гербициды
CY1112467T1 (el) Παραγωγα 1-θειο-d-γλυκιτολης
DE602006008459D1 (de) Pflanzen gegen hypoxische bedingungen
ATE537145T1 (de) Aminbasierte verbindung, organische lichtemittierende vorrichtung mit der aminbasierten verbindung und flachbildschirmanzeigenvorrichtung mit der organischen lichtemittierenden vorrichtung
EP2578587A4 (de) Pyrazolderivate
UY31688A1 (es) Plaguicidas
TW200637837A (en) Fungicides
DK1841423T3 (da) Anvendelse af 1-benzyl-1-hydroxy-2,3-diamino-propylaminer, 3-benzyl-3-hydroxy-2-aminopropionsyre-amider og beslægtede forbindelser som analgetika
ATE483000T1 (de) Naphtalin-amidin-imide
EA201100920A1 (ru) Новые гербициды
EA201101146A1 (ru) Новые гербициды
CR10637A (es) Fungicidas
EP2505613A4 (de) Zusammensetzung, gehärtetes produkt und elektronische vorrichtung
ATE532102T1 (de) Polymerisierbare verbindung und damit erhaltene polymerverbindung
ATE549313T1 (de) Verbindungen mit antitumorwirkung
MX2010002246A (es) Nuevos herbicidas.
ATE502918T1 (de) Arylsulfonamide mit analgetischer wirkung
DE602006017060D1 (de) Azaperylene als organische halbleiter
UA105372C2 (en) Normal;heading 1;heading 2;heading 3;SPIROHETEROCYCLIC N-OXYPIPERIDINES AS PESTICIDES