ATE538491T1 - Mehrschichtiger filmreflexionsspiegel, herstellungsverfahren für einen mehrschichtigen filmreflexionsspiegel und belichtungssystem - Google Patents

Mehrschichtiger filmreflexionsspiegel, herstellungsverfahren für einen mehrschichtigen filmreflexionsspiegel und belichtungssystem

Info

Publication number
ATE538491T1
ATE538491T1 AT04792501T AT04792501T ATE538491T1 AT E538491 T1 ATE538491 T1 AT E538491T1 AT 04792501 T AT04792501 T AT 04792501T AT 04792501 T AT04792501 T AT 04792501T AT E538491 T1 ATE538491 T1 AT E538491T1
Authority
AT
Austria
Prior art keywords
multilayer
reflectivity
layer film
reflection mirror
film reflection
Prior art date
Application number
AT04792501T
Other languages
English (en)
Inventor
Noriaki Kandaka
Katsuhiko Murakami
Takaharu Komiya
Masayuki Shiraishi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34468462&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE538491(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE538491T1 publication Critical patent/ATE538491T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epidemiology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AT04792501T 2003-10-15 2004-10-15 Mehrschichtiger filmreflexionsspiegel, herstellungsverfahren für einen mehrschichtigen filmreflexionsspiegel und belichtungssystem ATE538491T1 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2003354989 2003-10-15
JP2003354568 2003-10-15
JP2003354561 2003-10-15
JP2004094633 2004-03-29
PCT/JP2004/015284 WO2005038886A1 (ja) 2003-10-15 2004-10-15 多層膜反射鏡、多層膜反射鏡の製造方法、及び露光装置

Publications (1)

Publication Number Publication Date
ATE538491T1 true ATE538491T1 (de) 2012-01-15

Family

ID=34468462

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04792501T ATE538491T1 (de) 2003-10-15 2004-10-15 Mehrschichtiger filmreflexionsspiegel, herstellungsverfahren für einen mehrschichtigen filmreflexionsspiegel und belichtungssystem

Country Status (6)

Country Link
US (3) US7382527B2 (de)
EP (1) EP1675164B2 (de)
JP (1) JP4466566B2 (de)
KR (1) KR101083466B1 (de)
AT (1) ATE538491T1 (de)
WO (1) WO2005038886A1 (de)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4532991B2 (ja) * 2004-05-26 2010-08-25 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
US8542443B2 (en) * 2004-12-17 2013-09-24 Yupo Corporation Light reflector and planar light source device
JP4703353B2 (ja) * 2005-10-14 2011-06-15 Ｈｏｙａ株式会社 多層反射膜付き基板、その製造方法、反射型マスクブランクおよび反射型マスク
JP4703354B2 (ja) * 2005-10-14 2011-06-15 Ｈｏｙａ株式会社 多層反射膜付き基板、その製造方法、反射型マスクブランクおよび反射型マスク
JP2007140105A (ja) * 2005-11-18 2007-06-07 Nikon Corp 多層膜反射鏡及び露光装置
JP2007258625A (ja) * 2006-03-27 2007-10-04 Nikon Corp 露光装置及びレチクル
JP2008083189A (ja) * 2006-09-26 2008-04-10 Matsushita Electric Ind Co Ltd 位相シフトマスクおよび集光素子の製造方法
EP3159912A1 (de) * 2007-01-25 2017-04-26 Nikon Corporation Optisches element, belichtungsvorrichtung mit verwendung davon und vorrichtungsherstellungsverfahren
US20080266651A1 (en) * 2007-04-24 2008-10-30 Katsuhiko Murakami Optical apparatus, multilayer-film reflective mirror, exposure apparatus, and device
DE102008002403A1 (de) * 2008-06-12 2009-12-17 Carl Zeiss Smt Ag Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung
WO2010004482A1 (en) * 2008-07-07 2010-01-14 Philips Intellectual Property & Standards Gmbh Extreme uv radiation reflecting element comprising a sputter-resistant material
JP2010118437A (ja) * 2008-11-12 2010-05-27 Dainippon Printing Co Ltd 多層膜反射鏡、多層膜反射マスク及びそれらを用いたｅｕｖ露光装置
DE102009017095A1 (de) * 2009-04-15 2010-10-28 Carl Zeiss Smt Ag Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
US20100271693A1 (en) * 2009-04-24 2010-10-28 Manuela Vidal Dasilva Narrowband filters for the extreme ultraviolet
DE102009032779A1 (de) * 2009-07-10 2011-01-13 Carl Zeiss Smt Ag Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
DE102009054986B4 (de) * 2009-12-18 2015-11-12 Carl Zeiss Smt Gmbh Reflektive Maske für die EUV-Lithographie
DE102011004615A1 (de) * 2010-03-17 2011-09-22 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
CN103229248B (zh) * 2010-09-27 2016-10-12 卡尔蔡司Smt有限责任公司 反射镜，包含这种反射镜的投射物镜，以及包含这种投射物镜的用于微光刻的投射曝光设备
DE102010062597A1 (de) * 2010-12-08 2012-06-14 Carl Zeiss Smt Gmbh Reflektives optisches Abbildungssystem
DE102011015141A1 (de) * 2011-03-16 2012-09-20 Carl Zeiss Laser Optics Gmbh Verfahren zum Herstellen eines reflektiven optischen Bauelements für eine EUV-Projektionsbelichtungsanlage und derartiges Bauelement
DE102011075579A1 (de) 2011-05-10 2012-11-15 Carl Zeiss Smt Gmbh Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel
DE102011077234A1 (de) 2011-06-08 2012-12-13 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
WO2012126954A1 (en) 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
DE102011005940A1 (de) 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
DE102011076011A1 (de) * 2011-05-18 2012-11-22 Carl Zeiss Smt Gmbh Reflektives optisches Element und optisches System für die EUV-Lithographie
FR2984584A1 (fr) * 2011-12-20 2013-06-21 Commissariat Energie Atomique Dispositif de filtrage des rayons x
US9322964B2 (en) * 2012-01-19 2016-04-26 Supriya Jaiswal Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications
DE102012203633A1 (de) 2012-03-08 2013-09-12 Carl Zeiss Smt Gmbh Spiegel für den EUV-Wellenlängenbereich, Herstellungsverfahren für einen solchen Spiegel und Projektionsbelichtungsanlage mit einem solchen Spiegel
DE102012105369B4 (de) * 2012-06-20 2015-07-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Multilayer-Spiegel für den EUV-Spektralbereich
DE102013200294A1 (de) * 2013-01-11 2014-07-17 Carl Zeiss Smt Gmbh EUV-Spiegel und optisches System mit EUV-Spiegel
JP2014160752A (ja) 2013-02-20 2014-09-04 Asahi Glass Co Ltd Ｅｕｖリソグラフィ用反射型マスクブランクおよび該マスクブランク用反射層付基板
DE102013203364A1 (de) * 2013-02-28 2014-09-11 Carl Zeiss Smt Gmbh Reflektierende Beschichtung mit optimierter Dicke
KR20170027862A (ko) 2013-05-09 2017-03-10 가부시키가이샤 니콘 광학 소자, 투영 광학계, 노광 장치 및 디바이스 제조 방법
DE102013212462A1 (de) * 2013-06-27 2015-01-15 Carl Zeiss Smt Gmbh Oberflächenkorrektur von Spiegeln mit Entkopplungsbeschichtung
JP6112201B2 (ja) 2013-07-05 2017-04-12 株式会社ニコン 多層膜反射鏡、多層膜反射鏡の製造方法、投影光学系、露光装置、デバイスの製造方法
WO2015039705A1 (en) * 2013-09-23 2015-03-26 Carl Zeiss Smt Gmbh Multilayer mirror
CN108886076B (zh) * 2016-04-15 2021-07-13 亮锐控股有限公司 宽带反射镜
US11662509B2 (en) * 2017-03-02 2023-05-30 3M Innovative Properties Company Dynamic reflected color film with low optical caliper sensitivity
DE102017206118A1 (de) 2017-04-10 2018-04-19 Carl Zeiss Smt Gmbh Reflektives optisches Element und optisches System
JP7118962B2 (ja) * 2017-06-21 2022-08-16 Hoya株式会社 多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法
WO2020153228A1 (ja) 2019-01-21 2020-07-30 Ａｇｃ株式会社 反射型マスクブランク、反射型マスク、および反射型マスクブランクの製造方法
KR102511751B1 (ko) 2019-11-05 2023-03-21 주식회사 에스앤에스텍 극자외선 리소그래피용 블랭크마스크 및 포토마스크
KR102525928B1 (ko) 2020-09-02 2023-04-28 주식회사 에스앤에스텍 극자외선용 반사형 블랭크 마스크 및 그 제조방법
TWI805022B (zh) * 2020-10-30 2023-06-11 美商希瑪有限責任公司 用於深紫外線光源之光學組件
CN117091809B (zh) * 2023-08-23 2024-02-23 同济大学 一种间接标定窄带多层膜反射峰位的方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08262198A (ja) * 1995-03-27 1996-10-11 Toyota Gakuen Ｘ線多層膜反射鏡
JP4238390B2 (ja) 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
US6295164B1 (en) * 1998-09-08 2001-09-25 Nikon Corporation Multi-layered mirror
US6228512B1 (en) 1999-05-26 2001-05-08 The Regents Of The University Of California MoRu/Be multilayers for extreme ultraviolet applications
TWI267704B (en) * 1999-07-02 2006-12-01 Asml Netherlands Bv Capping layer for EUV optical elements
JP2001057328A (ja) * 1999-08-18 2001-02-27 Nikon Corp 反射マスク、露光装置および集積回路の製造方法
FR2802311B1 (fr) 1999-12-08 2002-01-18 Commissariat Energie Atomique Dispositif de lithographie utilisant une source de rayonnement dans le domaine extreme ultraviolet et des miroirs multicouches a large bande spectrale dans ce domaine
JP2002134385A (ja) * 2000-10-20 2002-05-10 Nikon Corp 多層膜反射鏡および露光装置
TW519574B (en) 2000-10-20 2003-02-01 Nikon Corp Multilayer mirror and method for making the same, and EUV optical system comprising the same, and EUV microlithography system comprising the same
JP2002323599A (ja) * 2001-04-27 2002-11-08 Nikon Corp 多層膜反射鏡の製造方法及び露光装置
KR100725859B1 (ko) 2001-05-23 2007-06-08 학교법인 한양학원 극자외선 노광 공정용 Ｒｕ/Ｍｏ/Ｓｉ 반사형 다층 박막미러
JP3600849B2 (ja) * 2001-06-11 2004-12-15 理学電機工業株式会社 ホウ素蛍光ｘ線分析用多層膜分光素子
JP2003015040A (ja) 2001-07-04 2003-01-15 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2003172858A (ja) 2001-12-06 2003-06-20 Nikon Corp 光学部品保持装置及び露光装置
US6643353B2 (en) * 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
US20050111083A1 (en) * 2002-03-27 2005-05-26 Yakshin Andrey E. Optical broad band element and process for its production
JP4144301B2 (ja) * 2002-09-03 2008-09-03 株式会社ニコン 多層膜反射鏡、反射型マスク、露光装置及び反射型マスクの製造方法
JP2005056943A (ja) * 2003-08-08 2005-03-03 Canon Inc Ｘ線多層ミラーおよびｘ線露光装置
US7522335B2 (en) * 2004-03-29 2009-04-21 Intel Corporation Broad-angle multilayer mirror design

Also Published As

Publication number Publication date
JP4466566B2 (ja) 2010-05-26
KR101083466B1 (ko) 2011-11-16
EP1675164B2 (de) 2019-07-03
US7382527B2 (en) 2008-06-03
KR20070017476A (ko) 2007-02-12
HK1099603A1 (en) 2007-08-17
US20080049307A1 (en) 2008-02-28
EP1675164B1 (de) 2011-12-21
EP1675164A4 (de) 2010-01-06
US7440182B2 (en) 2008-10-21
US7706058B2 (en) 2010-04-27
EP1675164A1 (de) 2006-06-28
US20090097104A1 (en) 2009-04-16
JPWO2005038886A1 (ja) 2007-11-22
US20060192147A1 (en) 2006-08-31
WO2005038886A1 (ja) 2005-04-28

Similar Documents

Publication Publication Date Title
ATE538491T1 (de) Mehrschichtiger filmreflexionsspiegel, herstellungsverfahren für einen mehrschichtigen filmreflexionsspiegel und belichtungssystem
TWI536125B (zh) 光學元件、包括光學元件之微影裝置、器件製造方法以及從其製造之器件
KR101288782B1 (ko) Ｕｖ 또는 ｅｕｖ 리소그래피용 광학 소자
JP2003503755A5 (de)
WO2009062665A3 (en) Optical element for the reflection of uv radiation, method for manufacturing the same and projection exposure apparatus comprising the same
JP4382037B2 (ja) 光学要素、このような光学要素を含むリソグラフィ装置、デバイス製造方法およびそれによって製造したデバイス
KR20180057813A (ko) 극자외선 리소그래피용 위상 반전 마스크
TW200908083A (en) Exposure apparatus and semiconductor device fabrication method
JP2008027992A (ja) Ｅｕｖｌマスク用基板の製造方法及びその基板を用いたｅｕｖｌマスクの製造方法
KR20090032876A (ko) 리소그래피 장치 및 이를 이용한 반도체 소자의 형성 방법
JP6560670B2 (ja) 特にマイクロリソグラフィ投影露光装置のミラー
KR102340280B1 (ko) 척 어셈블리를 갖는 극자외선 리소그래피 시스템 및 그 제조 방법
TWI754009B (zh) 光罩基底
TW201543137A (zh) 光刻之光罩
JP2004134743A (ja) リソグラフ装置およびデバイス製造方法
RU2004103474A (ru) Материал подложки для рентгенооптических компонентов
JP2007057450A (ja) 多層膜反射鏡および露光装置
JP2002311209A (ja) 反射防止膜、光学素子およびそれを搭載した露光装置
JP2009052998A (ja) 多層膜反射鏡、多層膜反射マスク及びそれらを用いたｅｕｖ露光装置
JP2004133418A5 (de)
US8289499B2 (en) Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
JP4343895B2 (ja) 軟ｘ線用多層膜ミラー
US7105255B2 (en) EUV reflection mask and lithographic process using the same
JP2005300249A (ja) 多層膜反射鏡、多層膜反射鏡の製造方法、及びｅｕｖ露光装置
JPH0772313A (ja) 光学装置及び光ピックアップ