ATE541239T1 - Lichtempfindliche zusammensetzung - Google Patents
Lichtempfindliche zusammensetzungInfo
- Publication number
- ATE541239T1 ATE541239T1 AT06014591T AT06014591T ATE541239T1 AT E541239 T1 ATE541239 T1 AT E541239T1 AT 06014591 T AT06014591 T AT 06014591T AT 06014591 T AT06014591 T AT 06014591T AT E541239 T1 ATE541239 T1 AT E541239T1
- Authority
- AT
- Austria
- Prior art keywords
- photosensitive composition
- radical
- acid
- base
- compound capable
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 abstract 3
- 239000002253 acid Substances 0.000 abstract 2
- 239000003999 initiator Substances 0.000 abstract 1
- 230000001235 sensitizing effect Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005204539 | 2005-07-13 | ||
| JP2005204538 | 2005-07-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE541239T1 true ATE541239T1 (de) | 2012-01-15 |
Family
ID=37398971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT06014591T ATE541239T1 (de) | 2005-07-13 | 2006-07-13 | Lichtempfindliche zusammensetzung |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20070015087A1 (de) |
| EP (1) | EP1744212B1 (de) |
| AT (1) | ATE541239T1 (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009079550A1 (en) * | 2007-12-17 | 2009-06-25 | Flexplay Technologies, Inc. | Limited life optical media |
| CN101983188A (zh) * | 2008-04-01 | 2011-03-02 | 安斯泰来制药有限公司 | 吲哚啉酮化合物 |
| US9886368B2 (en) * | 2016-05-23 | 2018-02-06 | International Business Machines Corporation | Runtime detection of uninitialized variable across functions |
| CN109283793B (zh) | 2018-10-16 | 2021-02-23 | 武汉华星光电半导体显示技术有限公司 | 光刻胶及其制备方法 |
| CN111410705B (zh) * | 2020-05-21 | 2021-07-06 | 北京航空航天大学 | 多组分光引发体系及光致聚合物材料 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4239848A (en) * | 1979-02-26 | 1980-12-16 | Eastman Kodak Company | Photocrosslinkable carbonyl-containing polymeric composition and element with cobalt complex |
| JP4130030B2 (ja) * | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物 |
| US6335144B1 (en) * | 1999-04-27 | 2002-01-01 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition for short wavelength semiconductor laser exposure |
| JP2003043673A (ja) * | 2001-07-26 | 2003-02-13 | Fuji Photo Film Co Ltd | 光重合性平版印刷版の製版方法 |
| JP4581387B2 (ja) * | 2003-02-21 | 2010-11-17 | 三菱化学株式会社 | 感光性樹脂組成物、並びにそれを用いた感光性画像形成材料及び感光性画像形成材 |
| JP4570857B2 (ja) * | 2003-03-31 | 2010-10-27 | 富士フイルム株式会社 | 感光性組成物及び平版印刷版原版 |
-
2006
- 2006-07-13 AT AT06014591T patent/ATE541239T1/de active
- 2006-07-13 EP EP06014591A patent/EP1744212B1/de not_active Not-in-force
- 2006-07-13 US US11/485,490 patent/US20070015087A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| EP1744212A2 (de) | 2007-01-17 |
| EP1744212B1 (de) | 2012-01-11 |
| US20070015087A1 (en) | 2007-01-18 |
| EP1744212A3 (de) | 2011-02-09 |
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