ATE541242T1 - Positiv-lichtempfindliche harzzusammensetzung - Google Patents

Positiv-lichtempfindliche harzzusammensetzung

Info

Publication number
ATE541242T1
ATE541242T1 AT08703494T AT08703494T ATE541242T1 AT E541242 T1 ATE541242 T1 AT E541242T1 AT 08703494 T AT08703494 T AT 08703494T AT 08703494 T AT08703494 T AT 08703494T AT E541242 T1 ATE541242 T1 AT E541242T1
Authority
AT
Austria
Prior art keywords
component
resin composition
group
photosensitive resin
positive photosensitive
Prior art date
Application number
AT08703494T
Other languages
English (en)
Inventor
Tadashi Hatanaka
Original Assignee
Nissan Chemical Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Ind Ltd filed Critical Nissan Chemical Ind Ltd
Application granted granted Critical
Publication of ATE541242T1 publication Critical patent/ATE541242T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT08703494T 2007-01-22 2008-01-18 Positiv-lichtempfindliche harzzusammensetzung ATE541242T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007011414 2007-01-22
PCT/JP2008/050644 WO2008090827A1 (ja) 2007-01-22 2008-01-18 ポジ型感光性樹脂組成物

Publications (1)

Publication Number Publication Date
ATE541242T1 true ATE541242T1 (de) 2012-01-15

Family

ID=39644404

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08703494T ATE541242T1 (de) 2007-01-22 2008-01-18 Positiv-lichtempfindliche harzzusammensetzung

Country Status (7)

Country Link
US (1) US8168371B2 (de)
EP (1) EP2109001B1 (de)
JP (1) JP5083568B2 (de)
KR (1) KR101401564B1 (de)
AT (1) ATE541242T1 (de)
TW (1) TWI403849B (de)
WO (1) WO2008090827A1 (de)

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JP5635449B2 (ja) * 2011-03-11 2014-12-03 富士フイルム株式会社 樹脂パターン及びその製造方法、ｍｅｍｓ構造体の製造方法、半導体素子の製造方法、並びに、メッキパターン製造方法
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CN103902801B (zh) * 2012-12-30 2017-12-22 上海联影医疗科技有限公司 肝灌注的仿真方法和肝灌注的定量测试方法
JP6492444B2 (ja) 2013-09-04 2019-04-03 Jsr株式会社 感放射線性樹脂組成物、硬化膜、その形成方法、及び電子デバイス
CN106465508B (zh) * 2014-06-09 2018-05-25 旭硝子株式会社 拒墨剂、负型感光性树脂组合物、分隔壁和光学元件
TW201612250A (en) * 2014-09-29 2016-04-01 Fujifilm Corp Photosensitive resin composition, manufacturing method for cured film, cured film, liquid crystal display device, organic electroluminescence display device and touch panel
WO2017126610A1 (ja) * 2016-01-20 2017-07-27 日産化学工業株式会社 ポジ型感光性樹脂組成物
WO2018079449A1 (ja) * 2016-10-27 2018-05-03 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
KR102601182B1 (ko) * 2017-04-21 2023-11-09 닛산 가가쿠 가부시키가이샤 감광성 수지 조성물
JPWO2022009676A1 (de) * 2020-07-06 2022-01-13
US20240132730A1 (en) * 2021-02-08 2024-04-25 Central Glass Company, Limited Liquid-repelling agent, curable composition, cured product, dividing wall, organic electroluminescent element, method for producing fluorine-containing coating film, and fluorine-containing coating film
JP2024052274A (ja) * 2022-09-30 2024-04-11 富士フイルム株式会社 組成物、転写フィルム、積層体の製造方法、硬化膜及びデバイス

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Also Published As

Publication number Publication date
TW200903170A (en) 2009-01-16
EP2109001A4 (de) 2010-11-24
EP2109001A1 (de) 2009-10-14
KR20090109538A (ko) 2009-10-20
JPWO2008090827A1 (ja) 2010-05-20
TWI403849B (zh) 2013-08-01
WO2008090827A1 (ja) 2008-07-31
US8168371B2 (en) 2012-05-01
JP5083568B2 (ja) 2012-11-28
US20100028805A1 (en) 2010-02-04
KR101401564B1 (ko) 2014-06-03
EP2109001B1 (de) 2012-01-11

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