ATE541242T1 - Positiv-lichtempfindliche harzzusammensetzung - Google Patents

Positiv-lichtempfindliche harzzusammensetzung

Info

Publication number
ATE541242T1
ATE541242T1 AT08703494T AT08703494T ATE541242T1 AT E541242 T1 ATE541242 T1 AT E541242T1 AT 08703494 T AT08703494 T AT 08703494T AT 08703494 T AT08703494 T AT 08703494T AT E541242 T1 ATE541242 T1 AT E541242T1
Authority
AT
Austria
Prior art keywords
component
resin composition
group
photosensitive resin
positive photosensitive
Prior art date
Application number
AT08703494T
Other languages
English (en)
Inventor
Tadashi Hatanaka
Original Assignee
Nissan Chemical Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Ind Ltd filed Critical Nissan Chemical Ind Ltd
Application granted granted Critical
Publication of ATE541242T1 publication Critical patent/ATE541242T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT08703494T 2007-01-22 2008-01-18 Positiv-lichtempfindliche harzzusammensetzung ATE541242T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007011414 2007-01-22
PCT/JP2008/050644 WO2008090827A1 (ja) 2007-01-22 2008-01-18 ポジ型感光性樹脂組成物

Publications (1)

Publication Number Publication Date
ATE541242T1 true ATE541242T1 (de) 2012-01-15

Family

ID=39644404

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08703494T ATE541242T1 (de) 2007-01-22 2008-01-18 Positiv-lichtempfindliche harzzusammensetzung

Country Status (7)

Country Link
US (1) US8168371B2 (de)
EP (1) EP2109001B1 (de)
JP (1) JP5083568B2 (de)
KR (1) KR101401564B1 (de)
AT (1) ATE541242T1 (de)
TW (1) TWI403849B (de)
WO (1) WO2008090827A1 (de)

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JP5729565B2 (ja) * 2010-02-02 2015-06-03 日産化学工業株式会社 ポジ型感光性樹脂組成物及び撥液性被膜
JP5635449B2 (ja) * 2011-03-11 2014-12-03 富士フイルム株式会社 樹脂パターン及びその製造方法、ｍｅｍｓ構造体の製造方法、半導体素子の製造方法、並びに、メッキパターン製造方法
WO2013141265A1 (ja) * 2012-03-23 2013-09-26 Jsr株式会社 フォトレジスト組成物、レジストパターン形成方法及び重合体
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CN103902801B (zh) * 2012-12-30 2017-12-22 上海联影医疗科技有限公司 肝灌注的仿真方法和肝灌注的定量测试方法
JP6492444B2 (ja) * 2013-09-04 2019-04-03 Jsr株式会社 感放射線性樹脂組成物、硬化膜、その形成方法、及び電子デバイス
KR102372955B1 (ko) * 2014-06-09 2022-03-10 에이지씨 가부시키가이샤 발잉크제, 네거티브형 감광성 수지 조성물, 격벽 및 광학 소자
TW201612250A (en) * 2014-09-29 2016-04-01 Fujifilm Corp Photosensitive resin composition, manufacturing method for cured film, cured film, liquid crystal display device, organic electroluminescence display device and touch panel
CN108475016B (zh) * 2016-01-20 2021-09-10 日产化学工业株式会社 正型感光性树脂组合物
WO2018079449A1 (ja) * 2016-10-27 2018-05-03 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
JP7045001B2 (ja) * 2017-04-21 2022-03-31 日産化学株式会社 感光性樹脂組成物
CN115867867A (zh) * 2020-07-06 2023-03-28 昭和电工株式会社 感光性树脂组合物及其树脂固化膜
CN116829674A (zh) * 2021-02-08 2023-09-29 中央硝子株式会社 拒液剂、固化性组合物、固化物、分隔壁、有机电致发光元件、含氟涂膜的制造方法及含氟涂膜
JP2024052274A (ja) * 2022-09-30 2024-04-11 富士フイルム株式会社 組成物、転写フィルム、積層体の製造方法、硬化膜及びデバイス

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Also Published As

Publication number Publication date
EP2109001A4 (de) 2010-11-24
JPWO2008090827A1 (ja) 2010-05-20
US8168371B2 (en) 2012-05-01
TW200903170A (en) 2009-01-16
US20100028805A1 (en) 2010-02-04
TWI403849B (zh) 2013-08-01
KR101401564B1 (ko) 2014-06-03
KR20090109538A (ko) 2009-10-20
WO2008090827A1 (ja) 2008-07-31
EP2109001A1 (de) 2009-10-14
JP5083568B2 (ja) 2012-11-28
EP2109001B1 (de) 2012-01-11

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