ATE545858T1 - Röntgenstrahlvorrichtung - Google Patents

Röntgenstrahlvorrichtung

Info

Publication number
ATE545858T1
ATE545858T1 AT07291646T AT07291646T ATE545858T1 AT E545858 T1 ATE545858 T1 AT E545858T1 AT 07291646 T AT07291646 T AT 07291646T AT 07291646 T AT07291646 T AT 07291646T AT E545858 T1 ATE545858 T1 AT E545858T1
Authority
AT
Austria
Prior art keywords
designed
optical element
focal spot
ray
focus
Prior art date
Application number
AT07291646T
Other languages
English (en)
Inventor
Blandine Lantz
Peter Hoghoj
Original Assignee
Xenocs S A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xenocs S A filed Critical Xenocs S A
Application granted granted Critical
Publication of ATE545858T1 publication Critical patent/ATE545858T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT07291646T 2007-12-31 2007-12-31 Röntgenstrahlvorrichtung ATE545858T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP07291646A EP2075569B1 (de) 2007-12-31 2007-12-31 Röntgenstrahlvorrichtung

Publications (1)

Publication Number Publication Date
ATE545858T1 true ATE545858T1 (de) 2012-03-15

Family

ID=39493934

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07291646T ATE545858T1 (de) 2007-12-31 2007-12-31 Röntgenstrahlvorrichtung

Country Status (4)

Country Link
US (1) US8422633B2 (de)
EP (1) EP2075569B1 (de)
AT (1) ATE545858T1 (de)
WO (1) WO2009083605A1 (de)

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* Cited by examiner, † Cited by third party
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US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
US9269468B2 (en) * 2012-04-30 2016-02-23 Jordan Valley Semiconductors Ltd. X-ray beam conditioning
US9570265B1 (en) 2013-12-05 2017-02-14 Sigray, Inc. X-ray fluorescence system with high flux and high flux density
US9448190B2 (en) * 2014-06-06 2016-09-20 Sigray, Inc. High brightness X-ray absorption spectroscopy system
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US9449781B2 (en) * 2013-12-05 2016-09-20 Sigray, Inc. X-ray illuminators with high flux and high flux density
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
EP3152554B1 (de) * 2014-06-06 2019-07-24 Sigray Inc. Röntgenabsorptionsmesssystem
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10151713B2 (en) 2015-05-21 2018-12-11 Industrial Technology Research Institute X-ray reflectometry apparatus for samples with a miniscule measurement area and a thickness in nanometers and method thereof
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
JP6322172B2 (ja) * 2015-09-11 2018-05-09 株式会社リガク Ｘ線小角光学系装置
JP6632852B2 (ja) * 2015-10-06 2020-01-22 浜松ホトニクス株式会社 Ｘ線撮像装置及びｘ線撮像方法
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
CN106556461B (zh) * 2016-12-08 2018-04-06 中国科学院光电技术研究所 一种基于自适应光学的光谱成像装置
JP6937380B2 (ja) 2017-03-22 2021-09-22 シグレイ、インコーポレイテッド Ｘ線分光を実施するための方法およびｘ線吸収分光システム
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
JP2019191167A (ja) 2018-04-23 2019-10-31 ブルカー ジェイヴィ イスラエル リミテッドＢｒｕｋｅｒ Ｊｖ Ｉｓｒａｅｌ Ｌｔｄ． 小角ｘ線散乱測定用のｘ線源光学系
EP3612821B1 (de) * 2018-05-15 2021-07-07 Xenocs SAS Verfahren und vorrichtung zur röntgenstreuenden materialanalyse
WO2019236384A1 (en) 2018-06-04 2019-12-12 Sigray, Inc. Wavelength dispersive x-ray spectrometer
US11181490B2 (en) 2018-07-05 2021-11-23 Bruker Technologies Ltd. Small-angle x-ray scatterometry
DE112019003777B4 (de) 2018-07-26 2025-09-11 Sigray, Inc. Röntgenreflexionsquelle mit hoher helligkeit
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
JP7237210B2 (ja) * 2019-06-24 2023-03-10 エス・エム・エス・グループ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング 多結晶製品の材料特性を特定するための方法および装置
WO2021162947A1 (en) 2020-02-10 2021-08-19 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles
CN112649453B (zh) * 2020-12-09 2021-11-12 北京大学 一种测量待测样品四维电子能量损失谱的方法
US11781999B2 (en) 2021-09-05 2023-10-10 Bruker Technologies Ltd. Spot-size control in reflection-based and scatterometry-based X-ray metrology systems
US12249059B2 (en) 2022-03-31 2025-03-11 Bruker Technologies Ltd. Navigation accuracy using camera coupled with detector assembly

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3032656A (en) * 1957-08-15 1962-05-01 Licentia Gmbh X-ray refracting optical element
US5802137A (en) * 1993-08-16 1998-09-01 Commonwealth Scientific And Industrial Research X-ray optics, especially for phase contrast imaging
US6278764B1 (en) * 1999-07-22 2001-08-21 The Regents Of The Unviersity Of California High efficiency replicated x-ray optics and fabrication method
JP3741411B2 (ja) * 1999-10-01 2006-02-01 株式会社リガク Ｘ線集光装置及びｘ線装置
US6704390B2 (en) * 2000-05-29 2004-03-09 Vladimir Kogan X-ray analysis apparatus provided with a multilayer mirror and an exit collimator
US20020027972A1 (en) * 2000-08-07 2002-03-07 Joy Marshall K. Microfocus-polycapillary optic x-ray system for x-ray analysis
US6625251B2 (en) * 2000-09-22 2003-09-23 Ntt Advanced Technology Corporation Laser plasma x-ray generation apparatus
FR2850171B1 (fr) * 2003-01-21 2005-04-08 Xenocs Dispositif optique pour applications rayons x
US7248670B2 (en) * 2002-06-19 2007-07-24 Xenocs Optical unit and associated method

Also Published As

Publication number Publication date
US8422633B2 (en) 2013-04-16
WO2009083605A1 (en) 2009-07-09
US20100272239A1 (en) 2010-10-28
EP2075569A1 (de) 2009-07-01
EP2075569B1 (de) 2012-02-15

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