ATE546825T1 - Plasmastromversorgungsvorrichtung - Google Patents

Plasmastromversorgungsvorrichtung

Info

Publication number
ATE546825T1
ATE546825T1 AT09160865T AT09160865T ATE546825T1 AT E546825 T1 ATE546825 T1 AT E546825T1 AT 09160865 T AT09160865 T AT 09160865T AT 09160865 T AT09160865 T AT 09160865T AT E546825 T1 ATE546825 T1 AT E546825T1
Authority
AT
Austria
Prior art keywords
plasma
power supply
supply device
plasma power
generation apparatus
Prior art date
Application number
AT09160865T
Other languages
English (en)
Inventor
Jun Choi
Jae Koo Lee
Jae Yoon Sim
Original Assignee
Postech Acad Ind Found
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Postech Acad Ind Found filed Critical Postech Acad Ind Found
Application granted granted Critical
Publication of ATE546825T1 publication Critical patent/ATE546825T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65F—GATHERING OR REMOVAL OF DOMESTIC OR LIKE REFUSE
    • B65F5/00—Gathering or removal of refuse otherwise than by receptacles or vehicles
    • B65F5/005—Gathering or removal of refuse otherwise than by receptacles or vehicles by pneumatic means, e.g. by suction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32825—Working under atmospheric pressure or higher
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B09—DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
    • B09B—DISPOSAL OF SOLID WASTE NOT OTHERWISE PROVIDED FOR
    • B09B5/00—Operations not covered by a single other subclass or by a single other group in this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G53/00—Conveying materials in bulk through troughs, pipes or tubes by floating the materials or by flow of gas, liquid or foam
    • B65G53/04—Conveying materials in bulk pneumatically through pipes or tubes; Air slides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G53/00—Conveying materials in bulk through troughs, pipes or tubes by floating the materials or by flow of gas, liquid or foam
    • B65G53/34—Details
    • B65G53/40—Feeding or discharging devices
    • B65G53/50—Pneumatic devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32201—Generating means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma Technology (AREA)
  • Radiation-Therapy Devices (AREA)
  • Surgical Instruments (AREA)
AT09160865T 2009-02-18 2009-05-21 Plasmastromversorgungsvorrichtung ATE546825T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020090013574A KR101124419B1 (ko) 2009-02-18 2009-02-18 마이크로파 플라즈마 생성을 위한 휴대용 전력 공급 장치

Publications (1)

Publication Number Publication Date
ATE546825T1 true ATE546825T1 (de) 2012-03-15

Family

ID=41134648

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09160865T ATE546825T1 (de) 2009-02-18 2009-05-21 Plasmastromversorgungsvorrichtung

Country Status (6)

Country Link
US (1) US8212428B2 (de)
EP (1) EP2221850B1 (de)
JP (1) JP5313786B2 (de)
KR (1) KR101124419B1 (de)
CN (1) CN101808458B (de)
AT (1) ATE546825T1 (de)

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JP5514089B2 (ja) * 2010-11-30 2014-06-04 株式会社 オリエントマイクロウェーブ マイクロ波手術器
GB201021032D0 (en) * 2010-12-10 2011-01-26 Creo Medical Ltd Electrosurgical apparatus
JP5534365B2 (ja) * 2012-06-18 2014-06-25 株式会社京三製作所 高周波電力供給装置、及び反射波電力制御方法
KR101290702B1 (ko) * 2012-07-05 2013-07-31 주식회사 메디플 마이크로파 플라즈마 전력 공급 장치 및 그의 주파수 자동 추적 방법
JP6072462B2 (ja) * 2012-08-07 2017-02-01 株式会社日立ハイテクノロジーズ プラズマ処理装置およびマイクロ波出力装置
CN103040519B (zh) * 2012-12-21 2015-01-14 成都美创电子科技有限公司 应用在手术中的低温等离子体发生器及受其控制的刀系统
JP2014141710A (ja) * 2013-01-24 2014-08-07 Y S Denshi Kogyo Kk プラズマ処理装置
DE102013210577A1 (de) 2013-05-02 2014-11-06 Magna Powertrain Ag & Co. Kg Rotationsventil
CN103239293B (zh) * 2013-05-16 2015-01-14 上海顶信医疗设备股份有限公司 牙科半导体激光治疗仪
CN103537012A (zh) * 2013-10-16 2014-01-29 刘朋 一种多功能低频微波脉冲治疗仪
CN103607835A (zh) * 2013-11-19 2014-02-26 安徽理工大学 一种大气压低功率脉冲微波冷等离子体射流发生器
CN103656863A (zh) * 2013-11-29 2014-03-26 南京航空航天大学 一体化浮动电极等离子体美容仪
CN103731141A (zh) * 2013-12-24 2014-04-16 电子科技大学 一种基于锁相环的微波等离子体灯扫频源系统
JP6754665B2 (ja) * 2016-10-18 2020-09-16 東京エレクトロン株式会社 マイクロ波出力装置及びプラズマ処理装置
JP6718788B2 (ja) * 2016-10-18 2020-07-08 東京エレクトロン株式会社 マイクロ波出力装置及びプラズマ処理装置
WO2019055476A2 (en) * 2017-09-14 2019-03-21 Cellencor, Inc. HIGH POWER SEMICONDUCTOR MICROWAVE GENERATOR FOR RADIO FREQUENCY ENERGY APPLICATIONS
US11275050B2 (en) * 2017-12-05 2022-03-15 Femtodx, Inc. Semiconductor-based biosensor and detection methods
US10510512B2 (en) * 2018-01-25 2019-12-17 Tokyo Electron Limited Methods and systems for controlling plasma performance
US10955864B2 (en) * 2018-03-06 2021-03-23 Arm Limited Context-aware power network
US11393661B2 (en) 2018-04-20 2022-07-19 Applied Materials, Inc. Remote modular high-frequency source
CN108721791A (zh) * 2018-05-31 2018-11-02 合肥大族科瑞达激光设备有限公司 一种光治疗仪的能量精确控制系统及其控制方法
JP7093552B2 (ja) * 2018-09-13 2022-06-30 株式会社ニッシン マイクロ波プラズマ処理装置
CN112702828B (zh) * 2019-10-22 2024-08-09 核工业西南物理研究院 一种低混杂波电流驱动系统高反射主动回避装置及方法
CN113202708B (zh) * 2021-05-16 2023-01-31 兰州空间技术物理研究所 一种离子电推进系统在全寿命周期下的工作方法
KR102863658B1 (ko) * 2024-02-15 2025-09-24 알에프에이치아이씨 주식회사 고상 마이크로파 발생 모듈, 마이크로파 발생을 제어하는 제어 모듈, 및 이들 모듈을 포함하는 고상 마이크로파 발생 시스템

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JP5426811B2 (ja) * 2006-11-22 2014-02-26 パール工業株式会社 高周波電源装置
CN101287327B (zh) * 2007-04-13 2011-07-20 中微半导体设备(上海)有限公司 射频功率源系统及使用该射频功率源系统的等离子体反应腔室
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Also Published As

Publication number Publication date
US20100207528A1 (en) 2010-08-19
EP2221850A1 (de) 2010-08-25
CN101808458A (zh) 2010-08-18
JP5313786B2 (ja) 2013-10-09
KR101124419B1 (ko) 2012-03-20
EP2221850B1 (de) 2012-02-22
US8212428B2 (en) 2012-07-03
JP2010192421A (ja) 2010-09-02
KR20100094245A (ko) 2010-08-26
CN101808458B (zh) 2013-03-06

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