ATE549614T1 - Verfahren zur optischen kennzeichnung - Google Patents

Verfahren zur optischen kennzeichnung

Info

Publication number
ATE549614T1
ATE549614T1 AT10169992T AT10169992T ATE549614T1 AT E549614 T1 ATE549614 T1 AT E549614T1 AT 10169992 T AT10169992 T AT 10169992T AT 10169992 T AT10169992 T AT 10169992T AT E549614 T1 ATE549614 T1 AT E549614T1
Authority
AT
Austria
Prior art keywords
patterns
optical response
porous material
determined
geometrical
Prior art date
Application number
AT10169992T
Other languages
English (en)
Inventor
Christophe Licitra
Maxime Besacier
Regis Bouyssou
Thierry Chevolleau
Kodadi Mohamed El
Original Assignee
Commissariat Energie Atomique
Centre Nat Rech Scient
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique, Centre Nat Rech Scient filed Critical Commissariat Energie Atomique
Application granted granted Critical
Publication of ATE549614T1 publication Critical patent/ATE549614T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/08—Investigating permeability, pore-volume, or surface area of porous materials
    • G01N2015/0846—Investigating permeability, pore-volume, or surface area of porous materials by use of radiation, e.g. transmitted or reflected light

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Glass Compositions (AREA)
AT10169992T 2009-07-20 2010-07-19 Verfahren zur optischen kennzeichnung ATE549614T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0955027A FR2948192B1 (fr) 2009-07-20 2009-07-20 Procede de caracterisation optique

Publications (1)

Publication Number Publication Date
ATE549614T1 true ATE549614T1 (de) 2012-03-15

Family

ID=41582096

Family Applications (1)

Application Number Title Priority Date Filing Date
AT10169992T ATE549614T1 (de) 2009-07-20 2010-07-19 Verfahren zur optischen kennzeichnung

Country Status (5)

Country Link
US (1) US8248621B2 (de)
EP (1) EP2278299B1 (de)
JP (1) JP2011039044A (de)
AT (1) ATE549614T1 (de)
FR (1) FR2948192B1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7907264B1 (en) * 2007-09-07 2011-03-15 Kla-Tencor Corporation Measurement of thin film porosity
CN102590139B (zh) * 2012-02-21 2014-01-22 中国工程物理研究院流体物理研究所 高压下透明流体折射率测量装置
US9546943B1 (en) * 2015-03-21 2017-01-17 J.A. Woollam Co., Inc System and method for investigating change in optical properties of a porous effective substrate surface as a function of a sequence of solvent partial pressures at atmospheric pressure
FR3049472B1 (fr) 2016-03-31 2021-05-21 Oleon N V Procede d'extraction de glycolipides et glycolipides obtenus
US10145674B2 (en) 2016-05-02 2018-12-04 Kla-Tencor Corporation Measurement of semiconductor structures with capillary condensation
US10281263B2 (en) * 2016-05-02 2019-05-07 Kla-Tencor Corporation Critical dimension measurements with gaseous adsorption
US10041873B2 (en) * 2016-05-02 2018-08-07 Kla-Tencor Corporation Porosity measurement of semiconductor structures
WO2017192406A1 (en) * 2016-05-02 2017-11-09 Kla-Tencor Corporation Measurement of semiconductor structures with capillary condensation
US11313809B1 (en) * 2016-05-04 2022-04-26 Kla-Tencor Corporation Process control metrology
CN107552258B (zh) * 2016-07-01 2019-06-07 江苏鲁汶仪器有限公司 气体喷射装置
FR3054053B1 (fr) * 2016-07-18 2018-07-27 Commissariat Energie Atomique Procede de caracterisation parametrique

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0733269B1 (de) * 1993-12-06 2002-01-16 QinetiQ Limited Poröses halbleitermaterial
JP4869478B2 (ja) * 1998-08-28 2012-02-08 アイメック 間隙率を求める装置及び方法
US6891627B1 (en) * 2000-09-20 2005-05-10 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension and overlay of a specimen
WO2002025708A2 (en) * 2000-09-20 2002-03-28 Kla-Tencor-Inc. Methods and systems for semiconductor fabrication processes
US6986280B2 (en) * 2002-01-22 2006-01-17 Fei Company Integrated measuring instrument
DE10227663A1 (de) * 2002-06-20 2004-01-15 Infineon Technologies Ag Verfahren zum Versiegeln poröser Materialien bei der Chipherstellung und Verbindungen hierfür
WO2005114148A2 (en) * 2004-05-14 2005-12-01 Kla-Tencor Technologies Corp. Systems and methods for measurement or analysis of a specimen
US7238382B2 (en) * 2004-07-30 2007-07-03 Tokyo Electron Limited Method and system for characterizing porous materials
FR2886015B1 (fr) * 2005-05-18 2007-07-13 Commissariat Energie Atomique Procede de mesure de la porosite par ellipsometrie et dispositif mettant en oeuvre un tel procede
JP2009147096A (ja) * 2007-12-14 2009-07-02 Panasonic Corp 半導体装置及びその製造方法

Also Published As

Publication number Publication date
US8248621B2 (en) 2012-08-21
US20110019207A1 (en) 2011-01-27
EP2278299B1 (de) 2012-03-14
EP2278299A1 (de) 2011-01-26
FR2948192A1 (fr) 2011-01-21
FR2948192B1 (fr) 2011-07-22
JP2011039044A (ja) 2011-02-24

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