ATE549794T1 - Tief-submikrometer-mos-vorverstärker mit dickoxid-eingabestufe-transistor - Google Patents
Tief-submikrometer-mos-vorverstärker mit dickoxid-eingabestufe-transistorInfo
- Publication number
- ATE549794T1 ATE549794T1 AT07150087T AT07150087T ATE549794T1 AT E549794 T1 ATE549794 T1 AT E549794T1 AT 07150087 T AT07150087 T AT 07150087T AT 07150087 T AT07150087 T AT 07150087T AT E549794 T1 ATE549794 T1 AT E549794T1
- Authority
- AT
- Austria
- Prior art keywords
- preamplifier
- input stage
- submicrometer
- mos
- low
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/01—Electrostatic transducers characterised by the use of electrets
- H04R19/016—Electrostatic transducers characterised by the use of electrets for microphones
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
- H03F1/52—Circuit arrangements for protecting such amplifiers
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
- H03F1/52—Circuit arrangements for protecting such amplifiers
- H03F1/523—Circuit arrangements for protecting such amplifiers for amplifiers using field-effect devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
- H03F1/56—Modifications of input or output impedances, not otherwise provided for
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/181—Low-frequency amplifiers, e.g. audio preamplifiers
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/181—Low-frequency amplifiers, e.g. audio preamplifiers
- H03F3/183—Low-frequency amplifiers, e.g. audio preamplifiers with semiconductor devices only
- H03F3/185—Low-frequency amplifiers, e.g. audio preamplifiers with semiconductor devices only with field-effect devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/181—Low-frequency amplifiers, e.g. audio preamplifiers
- H03F3/183—Low-frequency amplifiers, e.g. audio preamplifiers with semiconductor devices only
- H03F3/187—Low-frequency amplifiers, e.g. audio preamplifiers with semiconductor devices only in integrated circuits
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/005—Electrostatic transducers using semiconductor materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0144—Manufacturing their gate insulating layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/8314—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET] the IGFETs characterised by having gate insulating layers with different properties
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2200/00—Indexing scheme relating to amplifiers
- H03F2200/03—Indexing scheme relating to amplifiers the amplifier being designed for audio applications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2200/00—Indexing scheme relating to amplifiers
- H03F2200/18—Indexing scheme relating to amplifiers the bias of the gate of a FET being controlled by a control signal
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2200/00—Indexing scheme relating to amplifiers
- H03F2200/222—A circuit being added at the input of an amplifier to adapt the input impedance of the amplifier
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R2201/00—Details of transducers, loudspeakers or microphones covered by H04R1/00 but not provided for in any of its subgroups
- H04R2201/003—Mems transducers or their use
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Multimedia (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Amplifiers (AREA)
- Bipolar Transistors (AREA)
- Circuit For Audible Band Transducer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87545206P | 2006-12-18 | 2006-12-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE549794T1 true ATE549794T1 (de) | 2012-03-15 |
Family
ID=38529830
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT07150087T ATE549794T1 (de) | 2006-12-18 | 2007-12-18 | Tief-submikrometer-mos-vorverstärker mit dickoxid-eingabestufe-transistor |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8094846B2 (de) |
| EP (1) | EP1936689B1 (de) |
| KR (1) | KR101485067B1 (de) |
| CN (1) | CN101287304B (de) |
| AT (1) | ATE549794T1 (de) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8542850B2 (en) | 2007-09-12 | 2013-09-24 | Epcos Pte Ltd | Miniature microphone assembly with hydrophobic surface coating |
| DE102007058951B4 (de) * | 2007-12-07 | 2020-03-26 | Snaptrack, Inc. | MEMS Package |
| ITTO20090495A1 (it) | 2009-06-30 | 2011-01-01 | St Microelectronics Srl | Circuito preamplificatore per un trasduttore acustico capacitivo di tipo microelettromeccanico |
| DE102010006132B4 (de) | 2010-01-29 | 2013-05-08 | Epcos Ag | Miniaturisiertes elektrisches Bauelement mit einem Stapel aus einem MEMS und einem ASIC |
| US9181086B1 (en) | 2012-10-01 | 2015-11-10 | The Research Foundation For The State University Of New York | Hinged MEMS diaphragm and method of manufacture therof |
| US9331655B2 (en) * | 2013-07-10 | 2016-05-03 | Broadcom Corporation | Pop-click noise grounding switch design with deep sub-micron CMOS technology |
| US9608437B2 (en) * | 2013-09-12 | 2017-03-28 | Qualcomm Incorporated | Electro-static discharge protection for integrated circuits |
| US10158943B2 (en) | 2016-02-01 | 2018-12-18 | Knowles Electronics, Llc | Apparatus and method to bias MEMS motors |
| US12091313B2 (en) | 2019-08-26 | 2024-09-17 | The Research Foundation For The State University Of New York | Electrodynamically levitated actuator |
| CN112290899B (zh) * | 2020-10-26 | 2024-02-06 | 杭州爱华仪器有限公司 | 一种测量电路前置放大器 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03196677A (ja) | 1989-12-26 | 1991-08-28 | Nec Corp | 半導体装置 |
| US6426673B2 (en) | 1997-07-30 | 2002-07-30 | Programmable Silicon Solutions | High performance integrated radio frequency circuit devices |
| JP2001102875A (ja) | 1999-10-01 | 2001-04-13 | Hosiden Corp | 半導体増幅回路及び半導体エレクトレットコンデンサマイクロホン |
| US6181193B1 (en) * | 1999-10-08 | 2001-01-30 | International Business Machines Corporation | Using thick-oxide CMOS devices to interface high voltage integrated circuits |
| US6353344B1 (en) | 2000-05-22 | 2002-03-05 | Microtronic Us, Inc. | High impedance bias circuit |
| US6642543B1 (en) * | 2000-09-26 | 2003-11-04 | The Board Of Trustees Of The Leland Stanford Junior University | Thin and thick gate oxide transistors on a functional block of a CMOS circuit residing within the core of an IC chip |
| WO2002073792A2 (en) | 2001-03-09 | 2002-09-19 | Techtronic A/S | An electret condensor microphone preamplifier that is insensitive to leakage currents at the input |
| SE522714C2 (sv) | 2001-07-13 | 2004-03-02 | Ericsson Telefon Ab L M | Framställning av lågbrusig MOS-anordning |
| JP2003179071A (ja) * | 2001-10-25 | 2003-06-27 | Sharp Corp | Mddおよび選択cvdシリサイドを用いて深いサブミクロンcmosソース/ドレインを製造する方法 |
| JP2003230195A (ja) * | 2002-02-06 | 2003-08-15 | Hosiden Corp | エレクトレットコンデンサマイクロホン |
| CN1280881C (zh) * | 2002-03-25 | 2006-10-18 | 华邦电子股份有限公司 | 深亚微米mos装置及其制造方法 |
| US7149317B2 (en) * | 2002-04-18 | 2006-12-12 | Sonionmicrotronic Nederland B.V. | CMOS high impedance circuit |
| US6888408B2 (en) * | 2002-08-27 | 2005-05-03 | Sonion Tech A/S | Preamplifier for two terminal electret condenser microphones |
| US7142682B2 (en) | 2002-12-20 | 2006-11-28 | Sonion Mems A/S | Silicon-based transducer for use in hearing instruments and listening devices |
| US7466835B2 (en) * | 2003-03-18 | 2008-12-16 | Sonion A/S | Miniature microphone with balanced termination |
| US7787642B2 (en) | 2003-07-17 | 2010-08-31 | Massachusetts Institute Of Technology | Low-power high-PSRR current-mode microphone pre-amplifier system and method |
| US6977543B2 (en) * | 2003-08-26 | 2005-12-20 | Intel Corporation | Biasing technique using thin and thick oxide transistors |
| KR20060126526A (ko) | 2003-12-01 | 2006-12-07 | 아우디오아시스 에이/에스 | 전압 펌프를 구비한 마이크로폰 |
| DE602005010129D1 (de) * | 2004-01-12 | 2008-11-20 | Sonion As | Verstärkerschaltung für kapazitive Umformer |
| EP1599067B1 (de) | 2004-05-21 | 2013-05-01 | Epcos Pte Ltd | Detektion und Kontrolle des Membrankollaps in einem Kondensatormikrofon |
| US7271651B2 (en) * | 2005-06-17 | 2007-09-18 | Agere Systems Inc. | High performance differential amplifiers with thick oxide devices for high impedance nodes |
| EP1742506B1 (de) * | 2005-07-06 | 2013-05-22 | Epcos Pte Ltd | Mikrofonanordnung mit P-typ Vorverstärkerseingangsstufe |
-
2007
- 2007-12-17 US US11/958,103 patent/US8094846B2/en active Active
- 2007-12-17 CN CN2007101857943A patent/CN101287304B/zh not_active Expired - Fee Related
- 2007-12-18 AT AT07150087T patent/ATE549794T1/de active
- 2007-12-18 EP EP07150087A patent/EP1936689B1/de active Active
- 2007-12-18 KR KR20070133653A patent/KR101485067B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20080152171A1 (en) | 2008-06-26 |
| CN101287304B (zh) | 2013-02-06 |
| US8094846B2 (en) | 2012-01-10 |
| EP1936689A1 (de) | 2008-06-25 |
| CN101287304A (zh) | 2008-10-15 |
| KR20080056683A (ko) | 2008-06-23 |
| EP1936689B1 (de) | 2012-03-14 |
| KR101485067B1 (ko) | 2015-01-21 |
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