ATE550455T1 - Verfahren zur herstellung einer beschichtung mit verbesserter haftung - Google Patents

Verfahren zur herstellung einer beschichtung mit verbesserter haftung

Info

Publication number
ATE550455T1
ATE550455T1 AT07253060T AT07253060T ATE550455T1 AT E550455 T1 ATE550455 T1 AT E550455T1 AT 07253060 T AT07253060 T AT 07253060T AT 07253060 T AT07253060 T AT 07253060T AT E550455 T1 ATE550455 T1 AT E550455T1
Authority
AT
Austria
Prior art keywords
coating
producing
improved adhesion
defincd
intermixing
Prior art date
Application number
AT07253060T
Other languages
English (en)
Inventor
Andrew Fisk
Original Assignee
Pulse Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pulse Technologies Inc filed Critical Pulse Technologies Inc
Application granted granted Critical
Publication of ATE550455T1 publication Critical patent/ATE550455T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L31/00—Materials for other surgical articles, e.g. stents, stent-grafts, shunts, surgical drapes, guide wires, materials for adhesion prevention, occluding devices, surgical gloves, tissue fixation devices
    • A61L31/08—Materials for coatings
    • A61L31/082—Inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/342—Hollow targets
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00—Electrotherapy; Circuits therefor
    • A61N1/02—Details
    • A61N1/04—Electrodes
    • A61N1/05—Electrodes for implantation or insertion into the body, e.g. heart electrode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Vascular Medicine (AREA)
  • Surgery (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Materials For Medical Uses (AREA)
  • Prostheses (AREA)
AT07253060T 2007-05-29 2007-08-03 Verfahren zur herstellung einer beschichtung mit verbesserter haftung ATE550455T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/754,601 US20080299309A1 (en) 2007-05-29 2007-05-29 Method for producing a coating with improved adhesion

Publications (1)

Publication Number Publication Date
ATE550455T1 true ATE550455T1 (de) 2012-04-15

Family

ID=39735314

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07253060T ATE550455T1 (de) 2007-05-29 2007-08-03 Verfahren zur herstellung einer beschichtung mit verbesserter haftung

Country Status (3)

Country Link
US (1) US20080299309A1 (de)
EP (1) EP1997930B1 (de)
AT (1) ATE550455T1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080299289A1 (en) * 2007-05-29 2008-12-04 Fisk Andrew E Optimum Surface Texture Geometry
RU2470091C1 (ru) * 2011-11-17 2012-12-20 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный индустриальный университет" Способ ионной имплантации поверхностей деталей из титановых сплавов
RU2700228C1 (ru) * 2018-08-20 2019-09-13 Научно-производственная ассоциация "Технопарк Авиационных Технологий" Способ ионно-имплантационной обработки лопаток моноколеса компрессора
DE102020118371A1 (de) 2020-07-13 2022-01-13 Heraeus Deutschland GmbH & Co. KG Mehrlagige Ringelektrode mit mehreren Öffnungen
DE102020118373B4 (de) * 2020-07-13 2023-11-02 Heraeus Deutschland GmbH & Co. KG Mehrlagige Ringelektrode mit mehreren Öffnungen und niedrigschmelzenden Innenstrukturen
DE102020118372B3 (de) 2020-07-13 2021-09-02 Heraeus Deutschland GmbH & Co. KG Mehrlagige Ringelektrode mit mehreren Öffnungen und Diffusionszwischenschicht
CN114540789B (zh) * 2022-02-25 2024-04-19 中国科学院金属研究所 一种钛合金表面耐蚀涂层的制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994025637A1 (en) 1993-04-23 1994-11-10 Etex Corporation Method of coating medical devices and devices coated thereby
US6342133B2 (en) 2000-03-14 2002-01-29 Novellus Systems, Inc. PVD deposition of titanium and titanium nitride layers in the same chamber without use of a collimator or a shutter
WO2002066693A1 (en) * 2001-02-19 2002-08-29 Isotis N.V. Porous metals and metal coatings for implants
DE10227048A1 (de) 2002-06-17 2004-01-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Beschichtung von Substraten mittels physikalischer Dampfabscheidung über den Hohlkathodeneffekt
WO2006004645A2 (en) * 2004-06-28 2006-01-12 Isoflux, Inc. Porous coatings for biomedical implants
WO2006017273A2 (en) * 2004-07-13 2006-02-16 Isoflux, Inc. Porous coatings on electrodes for biomedical implants

Also Published As

Publication number Publication date
EP1997930B1 (de) 2012-03-21
EP1997930A1 (de) 2008-12-03
US20080299309A1 (en) 2008-12-04

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