ATE550692T1 - Ionische fotosäure erzeugende verbindungen mit segmentierten fluorkohlenstoff-kohlenwasserstoff sulfonatanionen - Google Patents
Ionische fotosäure erzeugende verbindungen mit segmentierten fluorkohlenstoff-kohlenwasserstoff sulfonatanionenInfo
- Publication number
- ATE550692T1 ATE550692T1 AT03777730T AT03777730T ATE550692T1 AT E550692 T1 ATE550692 T1 AT E550692T1 AT 03777730 T AT03777730 T AT 03777730T AT 03777730 T AT03777730 T AT 03777730T AT E550692 T1 ATE550692 T1 AT E550692T1
- Authority
- AT
- Austria
- Prior art keywords
- segmented
- fluorocarbon
- generating compounds
- sulfonate anions
- photoacid generating
- Prior art date
Links
- 239000004215 Carbon black (E152) Substances 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 title 1
- 125000002091 cationic group Chemical group 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000001393 microlithography Methods 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
- Catalysts (AREA)
- Polymerisation Methods In General (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/286,330 US6841333B2 (en) | 2002-11-01 | 2002-11-01 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions |
| PCT/US2003/033309 WO2004042473A2 (en) | 2002-11-01 | 2003-10-10 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE550692T1 true ATE550692T1 (de) | 2012-04-15 |
Family
ID=32175425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03777730T ATE550692T1 (de) | 2002-11-01 | 2003-10-10 | Ionische fotosäure erzeugende verbindungen mit segmentierten fluorkohlenstoff-kohlenwasserstoff sulfonatanionen |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US6841333B2 (de) |
| EP (1) | EP1556740B1 (de) |
| JP (1) | JP2006504785A (de) |
| KR (1) | KR101010405B1 (de) |
| AT (1) | ATE550692T1 (de) |
| AU (1) | AU2003286528A1 (de) |
| WO (1) | WO2004042473A2 (de) |
Families Citing this family (66)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6147205A (en) * | 1995-12-15 | 2000-11-14 | Affymetrix, Inc. | Photocleavable protecting groups and methods for their use |
| US20110028350A1 (en) * | 1995-12-15 | 2011-02-03 | Affymetrix, Inc. | Photocleavable protecting groups |
| US7176114B2 (en) * | 2000-06-06 | 2007-02-13 | Simon Fraser University | Method of depositing patterned films of materials using a positive imaging process |
| CA2421732A1 (en) * | 2000-09-11 | 2002-03-14 | Affymetrix, Inc. | Photocleavable protecting groups |
| TWI246525B (en) * | 2001-11-06 | 2006-01-01 | Wako Pure Chem Ind Ltd | Hybrid onium salt |
| KR100582275B1 (ko) * | 2002-11-06 | 2006-05-23 | 삼성코닝 주식회사 | 플라즈마 디스플레이 패널용 필터 및, 그것의 제조 방법 |
| US7169530B2 (en) * | 2003-10-02 | 2007-01-30 | Matsushita Electric Industrial Co., Ltd. | Polymer compound, resist material and pattern formation method |
| US7449573B2 (en) * | 2004-02-16 | 2008-11-11 | Fujifilm Corporation | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition |
| WO2005082596A1 (en) * | 2004-02-23 | 2005-09-09 | 3M Innovative Properties Company | Method of molding for microneedle arrays |
| US7393627B2 (en) * | 2004-03-16 | 2008-07-01 | Cornell Research Foundation, Inc. | Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS) |
| JP3978216B2 (ja) * | 2004-05-27 | 2007-09-19 | 松下電器産業株式会社 | レジスト材料及びパターン形成方法 |
| US20050271974A1 (en) * | 2004-06-08 | 2005-12-08 | Rahman M D | Photoactive compounds |
| US8338093B2 (en) * | 2004-12-31 | 2012-12-25 | Affymetrix, Inc. | Primer array synthesis and validation |
| US7547775B2 (en) | 2004-12-31 | 2009-06-16 | Affymetrix, Inc. | Parallel preparation of high fidelity probes in an array format |
| JP4452632B2 (ja) | 2005-01-24 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法 |
| JP4562537B2 (ja) | 2005-01-28 | 2010-10-13 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法 |
| JP4816921B2 (ja) * | 2005-04-06 | 2011-11-16 | 信越化学工業株式会社 | 新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法 |
| TWI332122B (en) * | 2005-04-06 | 2010-10-21 | Shinetsu Chemical Co | Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process |
| JP4724465B2 (ja) * | 2005-05-23 | 2011-07-13 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| JP2007003619A (ja) * | 2005-06-21 | 2007-01-11 | Fujifilm Holdings Corp | 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いる化合物 |
| US7521170B2 (en) * | 2005-07-12 | 2009-04-21 | Az Electronic Materials Usa Corp. | Photoactive compounds |
| JP4695941B2 (ja) * | 2005-08-19 | 2011-06-08 | 富士フイルム株式会社 | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| US7654637B2 (en) * | 2005-09-30 | 2010-02-02 | Lexmark International, Inc | Photoimageable nozzle members and methods relating thereto |
| US7678528B2 (en) * | 2005-11-16 | 2010-03-16 | Az Electronic Materials Usa Corp. | Photoactive compounds |
| US20070129273A1 (en) * | 2005-12-07 | 2007-06-07 | Clark Philip G | In situ fluoride ion-generating compositions and uses thereof |
| US8426101B2 (en) * | 2005-12-21 | 2013-04-23 | Fujifilm Corporation | Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition |
| US7951601B2 (en) * | 2005-12-28 | 2011-05-31 | Affymetrix, Inc. | Oxide layers on silicon substrates for effective confocal laser microscopy |
| US7618683B2 (en) * | 2006-01-12 | 2009-11-17 | Fujifilm Corporation | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate |
| JP2007293250A (ja) * | 2006-03-27 | 2007-11-08 | Fujifilm Corp | ポジ型レジスト組成物およびそれを用いたパターン形成方法 |
| WO2007124092A2 (en) | 2006-04-21 | 2007-11-01 | Cornell Research Foundation, Inc. | Photoacid generator compounds and compositions |
| GB2439734A (en) | 2006-06-30 | 2008-01-09 | Peter Andrew Reath Bennett | Coating for a lithographic precursor and use thereof |
| TWI412888B (zh) * | 2006-08-18 | 2013-10-21 | Sumitomo Chemical Co | 適合作為酸產生劑之鹽及含有該鹽之化學放大型正光阻組成物 |
| TWI402249B (zh) * | 2006-08-22 | 2013-07-21 | Sumitomo Chemical Co | 適合作為酸產生劑之鹽及含有該鹽之化學放大型正型光阻組成物 |
| US7491482B2 (en) * | 2006-12-04 | 2009-02-17 | Az Electronic Materials Usa Corp. | Photoactive compounds |
| US7390613B1 (en) * | 2006-12-04 | 2008-06-24 | Az Electronic Materials Usa Corp. | Photoactive compounds |
| US20080187868A1 (en) * | 2007-02-07 | 2008-08-07 | Munirathna Padmanaban | Photoactive Compounds |
| US8435717B2 (en) * | 2007-02-15 | 2013-05-07 | Central Glass Company, Limited | Compound for photoacid generator, resist composition using the same, and pattern-forming method |
| JP5238216B2 (ja) * | 2007-04-17 | 2013-07-17 | 東京応化工業株式会社 | 化合物、酸発生剤、レジスト組成物およびレジストパターン形成方法 |
| WO2008132966A1 (ja) * | 2007-04-17 | 2008-11-06 | Tokyo Ohka Kogyo Co., Ltd. | 化合物、酸発生剤、レジスト組成物およびレジストパターン形成方法 |
| US7651830B2 (en) * | 2007-06-01 | 2010-01-26 | 3M Innovative Properties Company | Patterned photoacid etching and articles therefrom |
| JP5205027B2 (ja) * | 2007-07-18 | 2013-06-05 | 東京応化工業株式会社 | 化合物の製造方法 |
| JP4925954B2 (ja) * | 2007-07-20 | 2012-05-09 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| US8292402B2 (en) * | 2008-02-13 | 2012-10-23 | Lexmark International, Inc. | Photoimageable dry film formulation |
| US8163461B2 (en) * | 2008-04-09 | 2012-04-24 | Cornell Research Foundation, Inc. | Photoacid generator compounds and compositions |
| JP2010094029A (ja) * | 2008-10-14 | 2010-04-30 | Ulvac Japan Ltd | 表面修飾基板、表面修飾基板の製造方法及び表面修飾基板の製造システム |
| JP2010094028A (ja) * | 2008-10-14 | 2010-04-30 | Ulvac Japan Ltd | 表面修飾基板、表面修飾基板の製造方法及び表面修飾基板の製造システム |
| JP5520515B2 (ja) * | 2009-04-15 | 2014-06-11 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| JP5658534B2 (ja) * | 2009-11-10 | 2015-01-28 | 住友化学株式会社 | レジスト組成物 |
| JP5851688B2 (ja) * | 2009-12-31 | 2016-02-03 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | 感光性組成物 |
| EP2383611A3 (de) * | 2010-04-27 | 2012-01-25 | Rohm and Haas Electronic Materials LLC | Fotosäureerzeuger und Fotolacke damit |
| KR101219723B1 (ko) * | 2010-09-07 | 2013-01-08 | (주) 에스엠씨 | 설포늄 염 및 이의 제조방법 |
| US9156785B2 (en) | 2010-11-15 | 2015-10-13 | Rohm And Haas Electronic Materials Llc | Base reactive photoacid generators and photoresists comprising same |
| KR101229312B1 (ko) | 2011-01-03 | 2013-02-04 | 금호석유화학 주식회사 | 술포늄 화합물, 광산발생제 및 이의 제조방법 |
| KR101229314B1 (ko) | 2011-02-07 | 2013-02-04 | 금호석유화학 주식회사 | 광산발생제, 이의 제조 방법 및 이를 포함하는 레지스트 조성물 |
| KR101332316B1 (ko) | 2011-02-07 | 2013-11-22 | 금호석유화학 주식회사 | 광산발생제, 이의 제조 방법 및 이를 포함하는 레지스트 조성물 |
| US8728715B2 (en) | 2012-01-13 | 2014-05-20 | Funai Electric Co., Ltd. | Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate |
| JP6195552B2 (ja) * | 2014-02-21 | 2017-09-13 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び、パターン形成方法、並びに、これらを用いた電子デバイスの製造方法 |
| US10345700B2 (en) | 2014-09-08 | 2019-07-09 | International Business Machines Corporation | Negative-tone resist compositions and multifunctional polymers therein |
| US9926476B2 (en) * | 2016-04-22 | 2018-03-27 | Addison Clear Wave Coatings Inc. | Dual cure epoxy adhesives |
| SG11202006176YA (en) * | 2018-01-12 | 2020-07-29 | Fujifilm Corp | Chemical solution and method for treating substrate |
| JP7297442B2 (ja) * | 2018-12-27 | 2023-06-26 | キヤノン株式会社 | 微細構造体の製造方法及び液体吐出ヘッドの製造方法 |
| CN109799291B (zh) * | 2018-12-27 | 2021-06-01 | 通标标准技术服务有限公司 | 测定样品中全氟化合物的方法 |
| JP2023010602A (ja) * | 2021-07-08 | 2023-01-20 | 信越化学工業株式会社 | ネガ型レジスト材料及びパターン形成方法 |
| JP7810073B2 (ja) * | 2021-07-16 | 2026-02-03 | 信越化学工業株式会社 | ネガ型レジスト材料及びパターン形成方法 |
| JP7791860B2 (ja) * | 2022-07-19 | 2025-12-24 | デュポン エレクトロニック マテリアルズ インターナショナル,エルエルシー | 光酸発生剤、フォトレジスト組成物及びパターン形成方法 |
| CN117457484A (zh) * | 2022-07-26 | 2024-01-26 | 罗门哈斯电子材料有限责任公司 | 金属化方法 |
Family Cites Families (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE295421C (de) | ||||
| US2732398A (en) | 1953-01-29 | 1956-01-24 | cafiicfzsojk | |
| US3708296A (en) | 1968-08-20 | 1973-01-02 | American Can Co | Photopolymerization of epoxy monomers |
| US4264703A (en) | 1974-05-02 | 1981-04-28 | General Electric Company | Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts |
| US4058400A (en) | 1974-05-02 | 1977-11-15 | General Electric Company | Cationically polymerizable compositions containing group VIa onium salts |
| GB1512982A (en) | 1974-05-02 | 1978-06-01 | Gen Electric | Salts |
| US4250311A (en) | 1974-05-02 | 1981-02-10 | General Electric Company | P, As, and Sb hexafluoride onium salts as photoinitiators |
| US4216288A (en) | 1978-09-08 | 1980-08-05 | General Electric Company | Heat curable cationically polymerizable compositions and method of curing same with onium salts and reducing agents |
| US4304705A (en) | 1980-01-02 | 1981-12-08 | Minnesota Mining And Manufacturing Company | Radiation-curable polymers containing pendant unsaturated peptide groups derived from azlactone polymers |
| JPS5710651A (en) | 1980-06-23 | 1982-01-20 | Asahi Denka Kogyo Kk | Coating material composition |
| US4329478A (en) | 1981-01-30 | 1982-05-11 | Minnesota Mining And Manufacturing Company | Cyclic perfluoroaliphaticdisulfonic acid anhydrides |
| US4423197A (en) | 1981-12-01 | 1983-12-27 | Minnesota Mining And Manufacturing Company | Cyclic perfluoroaliphatic-disulfonic acid anhydrides and sulfonamide derivatives thereof |
| EP0094914B1 (de) | 1982-05-19 | 1986-09-24 | Ciba-Geigy Ag | Photopolymerisation mittels organometallischer Salze |
| EP0094915B1 (de) | 1982-05-19 | 1987-01-21 | Ciba-Geigy Ag | Härtbare, Metallocenkomplexe enthaltende Zusammensetzungen, daraus erhältliche aktivierte Vorstufen und deren Verwendung |
| US5089536A (en) | 1982-11-22 | 1992-02-18 | Minnesota Mining And Manufacturing Company | Energy polmerizable compositions containing organometallic initiators |
| US5073476A (en) | 1983-05-18 | 1991-12-17 | Ciba-Geigy Corporation | Curable composition and the use thereof |
| US4503211A (en) | 1984-05-31 | 1985-03-05 | Minnesota Mining And Manufacturing Co. | Epoxy resin curing agent, process and composition |
| US4677137A (en) | 1985-05-31 | 1987-06-30 | Minnesota Mining And Manufacturing Company | Supported photoinitiator |
| ATE87105T1 (de) | 1987-06-05 | 1993-04-15 | Ciba Geigy Ag | Kationisch polymerisierbare gemische enthaltend ausgewaehlte haerter. |
| US4920182A (en) | 1987-12-18 | 1990-04-24 | Ciba-Geigy Corporation | Epoxy resin compositions containing polyester flexibilizer and metallocene complex initiator |
| US4933377A (en) | 1988-02-29 | 1990-06-12 | Saeva Franklin D | Novel sulfonium salts and the use thereof as photoinitiators |
| US4985340A (en) | 1988-06-01 | 1991-01-15 | Minnesota Mining And Manufacturing Company | Energy curable compositions: two component curing agents |
| US5215860A (en) | 1988-08-19 | 1993-06-01 | Minnesota Mining And Manufacturing Company | Energy-curable cyanate compositions |
| US5084586A (en) | 1990-02-12 | 1992-01-28 | Minnesota Mining And Manufacturing Company | Novel initiators for cationic polymerization |
| US5124417A (en) | 1990-02-12 | 1992-06-23 | Minnesota Mining And Manufacturing Company | Initiators for cationic polymerization |
| DD295421A5 (de) | 1990-06-19 | 1991-10-31 | Humboldt-Universitaet Zu Berlin,Direktorat Fuer Forschung,De | Positiv arbeitender photokopierlack mit chemischer verstaerkung |
| US5143785A (en) | 1990-08-20 | 1992-09-01 | Minnesota Mining And Manufacturing Company | Cyanate ester adhesives for electronic applications |
| US5627292A (en) * | 1992-02-21 | 1997-05-06 | Centre National De La Recherche Scientifique | Monomers derived from perhalogenated sultones and polymers obtained from these monomers |
| US5413785A (en) * | 1993-01-27 | 1995-05-09 | New England Deaconess Hospital Corp. | Methodology employing lactobacillus GG for reduction of plasma endotoxin levels circulating in-vivo |
| KR100230971B1 (ko) | 1994-01-28 | 1999-11-15 | 가나가와 지히로 | 술포늄 염 및 레지스트 조성물 (Sulfonium Salt and Resist Composition) |
| JP2964874B2 (ja) | 1994-06-10 | 1999-10-18 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料 |
| US5554664A (en) | 1995-03-06 | 1996-09-10 | Minnesota Mining And Manufacturing Company | Energy-activatable salts with fluorocarbon anions |
| US5688884A (en) | 1995-08-31 | 1997-11-18 | E. I. Du Pont De Nemours And Company | Polymerization process |
| US5731364A (en) | 1996-01-24 | 1998-03-24 | Shipley Company, L.L.C. | Photoimageable compositions comprising multiple arylsulfonium photoactive compounds |
| TWI250379B (en) | 1998-08-07 | 2006-03-01 | Az Electronic Materials Japan | Chemical amplified radiation-sensitive composition which contains onium salt and generator |
| KR20010040187A (ko) | 1999-10-28 | 2001-05-15 | 무네유키 가코우 | 포지티브 포토레지스트 조성물 |
| US6723483B1 (en) * | 1999-12-27 | 2004-04-20 | Wako Pure Chemical Industries, Ltd. | Sulfonium salt compounds |
| JP4023086B2 (ja) | 1999-12-27 | 2007-12-19 | 和光純薬工業株式会社 | スルホニウム塩化合物 |
| JP4262402B2 (ja) * | 2000-10-20 | 2009-05-13 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| US6749987B2 (en) * | 2000-10-20 | 2004-06-15 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
| AU2002239563A1 (en) | 2000-11-03 | 2002-06-03 | Shipley Company, L.L.C. | Photoacid generators and photoresists comprising same |
| JP3837066B2 (ja) * | 2000-12-15 | 2006-10-25 | サンアプロ株式会社 | スルホニウム塩の製造方法 |
| JP2002236364A (ja) * | 2001-02-08 | 2002-08-23 | Fuji Photo Film Co Ltd | 電子線又はx線用ネガ型レジスト組成物 |
| JP2002255930A (ja) * | 2001-03-01 | 2002-09-11 | Fuji Photo Film Co Ltd | 光酸発生化合物、及びポジ型レジスト組成物 |
| JP2002265436A (ja) * | 2001-03-08 | 2002-09-18 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| WO2002082185A1 (en) | 2001-04-05 | 2002-10-17 | Arch Specialty Chemicals, Inc. | Perfluoroalkylsulfonic acid compounds for photoresists |
| SG120873A1 (en) | 2001-06-29 | 2006-04-26 | Jsr Corp | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition |
-
2002
- 2002-11-01 US US10/286,330 patent/US6841333B2/en not_active Expired - Lifetime
-
2003
- 2003-10-10 WO PCT/US2003/033309 patent/WO2004042473A2/en not_active Ceased
- 2003-10-10 JP JP2004550062A patent/JP2006504785A/ja active Pending
- 2003-10-10 EP EP03777730A patent/EP1556740B1/de not_active Expired - Lifetime
- 2003-10-10 AU AU2003286528A patent/AU2003286528A1/en not_active Abandoned
- 2003-10-10 AT AT03777730T patent/ATE550692T1/de active
- 2003-10-10 KR KR1020057007575A patent/KR101010405B1/ko not_active Expired - Fee Related
-
2005
- 2005-01-05 US US11/029,975 patent/US7078444B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20050158655A1 (en) | 2005-07-21 |
| WO2004042473A2 (en) | 2004-05-21 |
| US6841333B2 (en) | 2005-01-11 |
| AU2003286528A8 (en) | 2004-06-07 |
| US20040087690A1 (en) | 2004-05-06 |
| KR20050071645A (ko) | 2005-07-07 |
| EP1556740B1 (de) | 2012-03-21 |
| AU2003286528A1 (en) | 2004-06-07 |
| WO2004042473A3 (en) | 2004-07-01 |
| US7078444B2 (en) | 2006-07-18 |
| EP1556740A2 (de) | 2005-07-27 |
| KR101010405B1 (ko) | 2011-01-21 |
| JP2006504785A (ja) | 2006-02-09 |
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