ATE551614T1 - Magnetischer sensor und verfahren zur herstellung eines magnetischen sensors - Google Patents

Magnetischer sensor und verfahren zur herstellung eines magnetischen sensors

Info

Publication number
ATE551614T1
ATE551614T1 AT10169288T AT10169288T ATE551614T1 AT E551614 T1 ATE551614 T1 AT E551614T1 AT 10169288 T AT10169288 T AT 10169288T AT 10169288 T AT10169288 T AT 10169288T AT E551614 T1 ATE551614 T1 AT E551614T1
Authority
AT
Austria
Prior art keywords
magnetic sensor
detection elements
magnetic detection
protective film
substrate
Prior art date
Application number
AT10169288T
Other languages
English (en)
Inventor
Yoichi Ishizaki
Original Assignee
Tokai Rika Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokai Rika Co Ltd filed Critical Tokai Rika Co Ltd
Application granted granted Critical
Publication of ATE551614T1 publication Critical patent/ATE551614T1/de

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/0052Manufacturing aspects; Manufacturing of single devices, i.e. of semiconductor magnetic sensor chips
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/0005Geometrical arrangement of magnetic sensor elements; Apparatus combining different magnetic sensor types
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • G01R33/091Constructional adaptation of the sensor to specific applications
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Measuring Magnetic Variables (AREA)
  • Hall/Mr Elements (AREA)
AT10169288T 2009-07-23 2010-07-12 Magnetischer sensor und verfahren zur herstellung eines magnetischen sensors ATE551614T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009172012A JP5249150B2 (ja) 2009-07-23 2009-07-23 磁気センサの製造方法及び磁気センサ

Publications (1)

Publication Number Publication Date
ATE551614T1 true ATE551614T1 (de) 2012-04-15

Family

ID=42829546

Family Applications (1)

Application Number Title Priority Date Filing Date
AT10169288T ATE551614T1 (de) 2009-07-23 2010-07-12 Magnetischer sensor und verfahren zur herstellung eines magnetischen sensors

Country Status (4)

Country Link
US (1) US20110018531A1 (de)
EP (1) EP2278350B1 (de)
JP (1) JP5249150B2 (de)
AT (1) ATE551614T1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6887686B2 (ja) 2016-08-31 2021-06-16 国立大学法人東北大学 磁気トンネル接合素子を備える磁気メモリの製造方法
CN106871778B (zh) * 2017-02-23 2019-11-22 江苏多维科技有限公司 一种单芯片双轴磁电阻角度传感器
CN107064829B (zh) * 2017-05-04 2023-02-21 江苏多维科技有限公司 一种单芯片高灵敏度磁电阻线性传感器
CN110581216B (zh) * 2019-08-02 2021-08-31 潍坊歌尔微电子有限公司 一种磁传感器的制造方法、磁传感器及电子设备
JP7407041B2 (ja) 2020-03-24 2023-12-28 株式会社東海理化電機製作所 磁気センサ
JP7173104B2 (ja) * 2020-07-21 2022-11-16 Tdk株式会社 磁気センサ
JP7782115B2 (ja) * 2021-11-11 2025-12-09 ミネベアミツミ株式会社 ひずみゲージ
JP7767941B2 (ja) * 2022-01-25 2025-11-12 株式会社ジェイテクト 基板およびセンサ装置

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JP3305211B2 (ja) * 1996-09-10 2002-07-22 松下電器産業株式会社 半導体装置及びその製造方法
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US6110607A (en) * 1998-02-20 2000-08-29 The Regents Of The University Of California High reflectance-low stress Mo-Si multilayer reflective coatings
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JP4276645B2 (ja) * 2005-08-05 2009-06-10 株式会社東海理化電機製作所 センサ装置
JP5015498B2 (ja) 2006-06-15 2012-08-29 株式会社東海理化電機製作所 センサ装置
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Also Published As

Publication number Publication date
EP2278350A1 (de) 2011-01-26
JP2011027495A (ja) 2011-02-10
US20110018531A1 (en) 2011-01-27
EP2278350A8 (de) 2011-03-23
EP2278350B1 (de) 2012-03-28
JP5249150B2 (ja) 2013-07-31

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