ATE554065T1 - Sulfoniumsalz-fotoinitiatoren - Google Patents

Sulfoniumsalz-fotoinitiatoren

Info

Publication number
ATE554065T1
ATE554065T1 AT07820481T AT07820481T ATE554065T1 AT E554065 T1 ATE554065 T1 AT E554065T1 AT 07820481 T AT07820481 T AT 07820481T AT 07820481 T AT07820481 T AT 07820481T AT E554065 T1 ATE554065 T1 AT E554065T1
Authority
AT
Austria
Prior art keywords
sulfonium salt
photo initiators
salt photo
c20alkyl
hydrogen
Prior art date
Application number
AT07820481T
Other languages
English (en)
Inventor
Pascal Hayoz
Jean-Luc Birbaum
Stephan Ilg
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Application granted granted Critical
Publication of ATE554065T1 publication Critical patent/ATE554065T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37—Thiols
    • C08K5/375—Thiols containing six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
AT07820481T 2006-10-04 2007-09-24 Sulfoniumsalz-fotoinitiatoren ATE554065T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06121699 2006-10-04
PCT/EP2007/060074 WO2008040648A1 (en) 2006-10-04 2007-09-24 Sulphonium salt photoinitiators

Publications (1)

Publication Number Publication Date
ATE554065T1 true ATE554065T1 (de) 2012-05-15

Family

ID=37865787

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07820481T ATE554065T1 (de) 2006-10-04 2007-09-24 Sulfoniumsalz-fotoinitiatoren

Country Status (7)

Country Link
US (1) US8012672B2 (de)
EP (1) EP2125713B1 (de)
JP (1) JP5290183B2 (de)
CN (1) CN101522613B (de)
AT (1) ATE554065T1 (de)
TW (1) TWI435864B (de)
WO (1) WO2008040648A1 (de)

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EP2197840B1 (de) 2007-10-10 2013-11-06 Basf Se Sulfoniumsalzinitiatoren
KR20110025211A (ko) * 2008-06-12 2011-03-09 바스프 에스이 술포늄 유도체 및 잠재성 산으로서의 그의 용도
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CN102566277B (zh) * 2010-12-21 2013-11-06 北京师范大学 一种用于高感度光聚合版材的阳离子聚合成像组合物
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TW201335295A (zh) 2011-11-30 2013-09-01 西克帕控股公司 經標記之塗層組成物及其認證之方法
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EP2882597B1 (de) 2012-08-01 2017-02-01 Sicpa Holding SA Optisch variable sicherheitsfäden und -streifen
MX366092B (es) 2012-10-29 2019-06-27 Sicpa Holding Sa Revestimientos protectores para documentos de seguridad.
JP5638106B2 (ja) * 2013-05-08 2014-12-10 東京応化工業株式会社 新規な化合物および酸発生剤
JP6621271B2 (ja) * 2014-09-26 2019-12-18 東京応化工業株式会社 ビニル基含有化合物を含有する硬化性組成物
TW201703879A (zh) 2015-06-02 2017-02-01 西克帕控股有限公司 用於生產光學效應層之製程
JP6861950B2 (ja) * 2015-07-23 2021-04-21 三菱瓦斯化学株式会社 新規化合物及びその製造方法
EP3185655B8 (de) * 2015-12-22 2024-01-03 Heraeus Electronics GmbH & Co. KG Verfahren zur individuellen codierung von metall-keramik-substraten
CN105712917B (zh) * 2016-03-29 2017-12-26 同济大学 具有光引发剂与光敏化剂双重功能的共轭型硫鎓盐光引发剂、制备方法及其应用
CN107698477B (zh) 2016-08-08 2020-05-12 常州强力电子新材料股份有限公司 一种新型阳离子型光引发剂及其制备方法和应用
CN109456242B (zh) 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
KR20210006384A (ko) * 2018-04-25 2021-01-18 녹사노 아이엔씨. 광활성화 기체 신호 전달물질 생성 조성물
UA127504C2 (uk) 2018-05-15 2023-09-13 Сікпа Холдінг Са Машинозчитувані захисні ознаки
KR102707718B1 (ko) * 2018-05-28 2024-09-19 도오꾜오까고오교 가부시끼가이샤 레지스트 조성물, 레지스트 패턴 형성 방법, 화합물, 산 발생제 및 화합물의 제조 방법
CN111978224B (zh) * 2019-05-22 2022-10-28 中国科学院理化技术研究所 含硫单分子树脂及其光刻胶组合物
CN111978228B (zh) * 2019-05-22 2021-10-12 中国科学院理化技术研究所 基于硫鎓盐的单分子树脂产酸剂及其光刻胶组合物
TWI829917B (zh) 2019-05-28 2024-01-21 瑞士商西克帕控股有限公司 安全性墨水以及機器可讀式安全性特徵
CN112794649B (zh) * 2021-02-11 2022-07-05 福州大学 一种防雾薄膜及其制备方法
JP2022123840A (ja) * 2021-02-12 2022-08-24 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7790991B2 (ja) * 2021-02-12 2025-12-23 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
CN112961085B (zh) * 2021-02-18 2022-02-01 同济大学 Led可激发分子内敏化型硫鎓盐类化合物及制备方法和应用
AR130228A1 (es) 2022-08-23 2024-11-20 Sicpa Holding Sa Composición de tinta de seguridad y característica de seguridad legible por máquina derivada de la misma
KR20250042818A (ko) * 2022-08-31 2025-03-27 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 패턴 형성 방법, 및 전자 디바이스의 제조 방법
JP2024151731A (ja) 2023-04-13 2024-10-25 信越化学工業株式会社 分子レジスト組成物及びパターン形成方法
CN117326999B (zh) * 2023-09-12 2025-11-18 辽宁靖帆新材料有限公司 一种二苯基[4-(苯硫基)苯基]全氟丁基磺酸锍盐的合成方法

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Also Published As

Publication number Publication date
CN101522613B (zh) 2013-03-06
JP2010505787A (ja) 2010-02-25
CN101522613A (zh) 2009-09-02
EP2125713A1 (de) 2009-12-02
TWI435864B (zh) 2014-05-01
JP5290183B2 (ja) 2013-09-18
EP2125713B1 (de) 2012-04-18
TW200831452A (en) 2008-08-01
US8012672B2 (en) 2011-09-06
US20100087563A1 (en) 2010-04-08
WO2008040648A1 (en) 2008-04-10

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