ATE556354T1 - Vermeidung der schrumpfung von linienenden bei transistoren durch zusätzliche phasenschiebermuster - Google Patents

Vermeidung der schrumpfung von linienenden bei transistoren durch zusätzliche phasenschiebermuster

Info

Publication number
ATE556354T1
ATE556354T1 AT02709485T AT02709485T ATE556354T1 AT E556354 T1 ATE556354 T1 AT E556354T1 AT 02709485 T AT02709485 T AT 02709485T AT 02709485 T AT02709485 T AT 02709485T AT E556354 T1 ATE556354 T1 AT E556354T1
Authority
AT
Austria
Prior art keywords
line end
phase shifter
transistors
additional phase
endcap
Prior art date
Application number
AT02709485T
Other languages
English (en)
Inventor
Melody Ma
Hua-Yu Liu
Original Assignee
Synopsys Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Synopsys Inc filed Critical Synopsys Inc
Application granted granted Critical
Publication of ATE556354T1 publication Critical patent/ATE556354T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microwave Amplifiers (AREA)
  • Amplifiers (AREA)
AT02709485T 2001-04-03 2002-02-11 Vermeidung der schrumpfung von linienenden bei transistoren durch zusätzliche phasenschiebermuster ATE556354T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US28132501P 2001-04-03 2001-04-03
US09/872,620 US6553560B2 (en) 2001-04-03 2001-05-31 Alleviating line end shortening in transistor endcaps by extending phase shifters
PCT/US2002/004119 WO2002082182A2 (en) 2001-04-03 2002-02-11 Alleviating line end shortening in transistor endcaps by extending phase shifters

Publications (1)

Publication Number Publication Date
ATE556354T1 true ATE556354T1 (de) 2012-05-15

Family

ID=26960832

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02709485T ATE556354T1 (de) 2001-04-03 2002-02-11 Vermeidung der schrumpfung von linienenden bei transistoren durch zusätzliche phasenschiebermuster

Country Status (7)

Country Link
US (2) US6553560B2 (de)
EP (1) EP1410105B1 (de)
JP (2) JP4700898B2 (de)
AT (1) ATE556354T1 (de)
AU (1) AU2002243967A1 (de)
TW (1) TW521322B (de)
WO (1) WO2002082182A2 (de)

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Also Published As

Publication number Publication date
AU2002243967A1 (en) 2002-10-21
EP1410105B1 (de) 2012-05-02
EP1410105A2 (de) 2004-04-21
TW521322B (en) 2003-02-21
WO2002082182A2 (en) 2002-10-17
US20030066038A1 (en) 2003-04-03
JP4700898B2 (ja) 2011-06-15
US6553560B2 (en) 2003-04-22
WO2002082182A3 (en) 2004-02-19
US6859918B2 (en) 2005-02-22
JP2004527790A (ja) 2004-09-09
JP2009271550A (ja) 2009-11-19
US20020144232A1 (en) 2002-10-03

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