ATE66306T1 - Strahlungsempfindliche vorrichtung. - Google Patents

Strahlungsempfindliche vorrichtung.

Info

Publication number
ATE66306T1
ATE66306T1 AT87900185T AT87900185T ATE66306T1 AT E66306 T1 ATE66306 T1 AT E66306T1 AT 87900185 T AT87900185 T AT 87900185T AT 87900185 T AT87900185 T AT 87900185T AT E66306 T1 ATE66306 T1 AT E66306T1
Authority
AT
Austria
Prior art keywords
radiation sensitive
sensitive device
layer
exposure
covering layer
Prior art date
Application number
AT87900185T
Other languages
English (en)
Inventor
Graham Philip Cooper
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of ATE66306T1 publication Critical patent/ATE66306T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Light Receiving Elements (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Thermistors And Varistors (AREA)
  • Input Circuits Of Receivers And Coupling Of Receivers And Audio Equipment (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Luminescent Compositions (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
AT87900185T 1985-12-05 1986-12-05 Strahlungsempfindliche vorrichtung. ATE66306T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB858529958A GB8529958D0 (en) 1985-12-05 1985-12-05 Radiation sensitive devices
PCT/GB1986/000743 WO1987003706A2 (en) 1985-12-05 1986-12-05 Improvements in or relating to radiation sensitive devices
EP87900185A EP0248872B1 (de) 1985-12-05 1986-12-05 Strahlungsempfindliche vorrichtung

Publications (1)

Publication Number Publication Date
ATE66306T1 true ATE66306T1 (de) 1991-08-15

Family

ID=10589280

Family Applications (1)

Application Number Title Priority Date Filing Date
AT87900185T ATE66306T1 (de) 1985-12-05 1986-12-05 Strahlungsempfindliche vorrichtung.

Country Status (14)

Country Link
EP (1) EP0248872B1 (de)
JP (1) JP2573274B2 (de)
AT (1) ATE66306T1 (de)
AU (1) AU583698B2 (de)
CA (1) CA1317147C (de)
DE (1) DE3680914D1 (de)
DK (1) DK405987A (de)
ES (1) ES2002217A6 (de)
FI (1) FI873397L (de)
GB (2) GB8529958D0 (de)
NO (1) NO873262L (de)
NZ (1) NZ218519A (de)
WO (1) WO1987003706A2 (de)
ZA (1) ZA869241B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8813154D0 (en) * 1988-06-03 1988-07-06 Vickers Plc Improvements in/relating to radiation sensitive devices
US5362597A (en) * 1991-05-30 1994-11-08 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester
JPH10171124A (ja) * 1996-12-11 1998-06-26 Konica Corp 感光性印刷版の製造方法
JP2000347397A (ja) 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE627691C (de) * 1931-03-06 1936-03-21 Amira Trust Fa Verfahren zur Herstellung eines photographischen Materials, bei dem die Schicht durch Tiefdruck aufgebracht wird
US2080965A (en) * 1932-02-25 1937-05-18 Funck Harry Process of photoengraving
AT296345B (de) * 1968-12-09 1972-02-10 Kalle Ag Lichtempfindliches Kopiermaterial zum Herstellen einer Druckform
JPS5229302A (en) * 1975-08-28 1977-03-05 Fuji Photo Film Co Ltd Photoosensitive printing plate
JPS5921540B2 (ja) * 1977-10-26 1984-05-21 セイコーエプソン株式会社 フオトレジストパタ−ンの形成方法
JPS5646230A (en) * 1979-09-21 1981-04-27 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposing method
JPS5785048A (en) * 1980-11-17 1982-05-27 Daicel Chem Ind Ltd Exposed photosensitive diazo film for making screen plate
JPS5811943A (ja) * 1981-07-16 1983-01-22 Ricoh Co Ltd スクリ−ンレス平版印刷原版
DE3433247A1 (de) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung

Also Published As

Publication number Publication date
DK405987D0 (da) 1987-08-04
GB8629131D0 (en) 1987-01-14
WO1987003706A2 (en) 1987-06-18
ZA869241B (en) 1987-07-29
GB2184857B (en) 1989-10-11
NZ218519A (en) 1989-03-29
EP0248872A1 (de) 1987-12-16
DE3680914D1 (de) 1991-09-19
FI873397A0 (fi) 1987-08-05
FI873397A7 (fi) 1987-08-05
WO1987003706A3 (en) 1987-09-11
NO873262D0 (no) 1987-08-04
JP2573274B2 (ja) 1997-01-22
AU6727487A (en) 1987-06-30
DK405987A (da) 1987-08-04
GB8529958D0 (en) 1986-01-15
CA1317147C (en) 1993-05-04
NO873262L (no) 1987-10-05
GB2184857A (en) 1987-07-01
FI873397L (fi) 1987-08-05
AU583698B2 (en) 1989-05-04
JPS63502141A (ja) 1988-08-18
ES2002217A6 (es) 1988-07-16
EP0248872B1 (de) 1991-08-14

Similar Documents

Publication Publication Date Title
DE3068974D1 (en) Unsubbed organic film coated with an opaque antistatic backing layer, and method of manufacturing
JPS52109926A (en) Metallic image forming material
EP0151985A3 (de) Reflektorfläche
DE3680914D1 (de) Strahlungsempfindliche vorrichtung.
FR2511043B1 (fr) Revetement de surface a forte teneur en yttrium
ATE35323T1 (de) Photolithographie.
JPS5651736A (en) Substrateecopying film deposition system* negative resist* and substrate covered with same resist film
DE3577622D1 (de) Verfahren zur herstellung integrierter schaltungen unter einbeziehung von schritten zum nachweis von getterstellen.
DE3689002D1 (de) An der Oberfläche modifizierte Halbleiter mit chemisch empfindlicher Lumineszenz.
JPS54118175A (en) Method of exposing radiation sensitive layer with xxray
JPS53120527A (en) Forming method of positive type radiation sensitive material layer
EP0049623A3 (de) Lichtempfindliches Bildherstellungselement
JPS52121325A (en) Electrophotographic light sensitive material
EP0136534A3 (en) Method of forming a large surface area integrated circuit
KR910005101A (ko) 레지스트패턴 형성방법
EP0003155A3 (en) Method of manufacturing a device using a gold layer masking against a proton bombardment and device manufactured by means of the method
JPS6420471A (en) Glass beads dosimeter
JPS5633874A (en) Semiconductor device builtin with photocell
JPS5478662A (en) Semiconductor device and its manufacture
JPS52129522A (en) Adherence exposure method
JPS5469072A (en) Photo mask for adhesion exposure
JPS5737785A (en) Leader tape
TW230820B (en) Method for eliminating standing wave effect on photoresist exposure
ES2004930A6 (es) Un metodo para el tratamiento de inversion de placas de impresion litografica y aparato correspondiente
JPS5382272A (en) Production of semiconductor device

Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee