ATE97591T1 - Regulierungsverfahren fuer ein chemisches medium. - Google Patents
Regulierungsverfahren fuer ein chemisches medium.Info
- Publication number
- ATE97591T1 ATE97591T1 AT86400653T AT86400653T ATE97591T1 AT E97591 T1 ATE97591 T1 AT E97591T1 AT 86400653 T AT86400653 T AT 86400653T AT 86400653 T AT86400653 T AT 86400653T AT E97591 T1 ATE97591 T1 AT E97591T1
- Authority
- AT
- Austria
- Prior art keywords
- parameters
- value
- function
- optimum
- medium
- Prior art date
Links
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
- G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
- G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
- B01J19/0033—Optimalisation processes, i.e. processes with adaptive control systems
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/73—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process
- C23C22/77—Controlling or regulating of the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Software Systems (AREA)
- Artificial Intelligence (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Medical Informatics (AREA)
- Evolutionary Computation (AREA)
- General Chemical & Material Sciences (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Health & Medical Sciences (AREA)
- Feedback Control In General (AREA)
- Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
- Investigating Or Analysing Biological Materials (AREA)
- Coloring (AREA)
- Paper (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Treatment Of Metals (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8504503A FR2579784B1 (fr) | 1985-03-26 | 1985-03-26 | Procede et installation permettant, d'une part, de connaitre d'avance a un instant donne le resultat auquel conduit necessairement un milieu chimique evolutif donne et, d'autre part, d'assurer la regulation de ce milieu pour parvenir a un resultat determine fixe a l'avance |
| EP86400653A EP0196259B1 (de) | 1985-03-26 | 1986-03-26 | Regulierungsverfahren für ein chemisches Medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE97591T1 true ATE97591T1 (de) | 1993-12-15 |
Family
ID=9317598
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT86400653T ATE97591T1 (de) | 1985-03-26 | 1986-03-26 | Regulierungsverfahren fuer ein chemisches medium. |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0196259B1 (de) |
| JP (1) | JPS621883A (de) |
| AT (1) | ATE97591T1 (de) |
| CA (1) | CA1223943A (de) |
| DE (1) | DE3689316T2 (de) |
| FR (1) | FR2579784B1 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04115530A (ja) * | 1990-09-05 | 1992-04-16 | Fujitsu Ltd | 半導体装置の製造方法 |
| WO1995001591A1 (en) * | 1993-06-29 | 1995-01-12 | H.E.R.C. Incorporated | Water control system |
| DE19730573B4 (de) * | 1997-07-17 | 2005-10-06 | Degussa Ag | Verfahren zur vollautomatischen Regelung der Karbonisierung von Kalilauge zu Pottaschelauge |
| ATE274718T1 (de) * | 2000-06-26 | 2004-09-15 | Siemens Ag | Universelles verfahren zur vorausberechnung von parametern industrieller prozesse |
| DE10109223C1 (de) | 2001-02-26 | 2002-08-01 | Siemens Ag | Verfahren zum Betreiben einer Gießwalzanlage |
| DE10155976A1 (de) * | 2001-11-14 | 2003-05-22 | Henkel Kgaa | Steuerung der Beschleunigerkonzentration in Phosphatierbäder |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2198187B1 (de) * | 1972-08-30 | 1977-04-01 | Tacussel Jacque2 | |
| AU565673B2 (en) * | 1981-10-21 | 1987-09-24 | Honeywell Inc. | Computer to minimize process operation |
| EP0128491B1 (de) * | 1983-06-03 | 1989-12-13 | Omron Tateisi Electronics Co. | Zeitdiskret selbstanpassender Ein/Aus-Schaltregler |
-
1985
- 1985-03-26 FR FR8504503A patent/FR2579784B1/fr not_active Expired
-
1986
- 1986-03-25 CA CA000505073A patent/CA1223943A/en not_active Expired
- 1986-03-26 JP JP61066064A patent/JPS621883A/ja active Pending
- 1986-03-26 AT AT86400653T patent/ATE97591T1/de active
- 1986-03-26 EP EP86400653A patent/EP0196259B1/de not_active Expired - Lifetime
- 1986-03-26 DE DE3689316T patent/DE3689316T2/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP0196259A1 (de) | 1986-10-01 |
| EP0196259B1 (de) | 1993-11-24 |
| DE3689316T2 (de) | 1994-06-16 |
| JPS621883A (ja) | 1987-01-07 |
| FR2579784B1 (fr) | 1987-06-19 |
| CA1223943A (en) | 1987-07-07 |
| FR2579784A1 (fr) | 1986-10-03 |
| DE3689316D1 (de) | 1994-01-05 |
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