ATE98401T1 - Verfahren zum anbringen duenner schichten aus oxidischem supraleitendem material. - Google Patents

Verfahren zum anbringen duenner schichten aus oxidischem supraleitendem material.

Info

Publication number
ATE98401T1
ATE98401T1 AT88201513T AT88201513T ATE98401T1 AT E98401 T1 ATE98401 T1 AT E98401T1 AT 88201513 T AT88201513 T AT 88201513T AT 88201513 T AT88201513 T AT 88201513T AT E98401 T1 ATE98401 T1 AT E98401T1
Authority
AT
Austria
Prior art keywords
thin layers
superconductive
oxide superconducting
superconducting material
applying thin
Prior art date
Application number
AT88201513T
Other languages
English (en)
Inventor
Maritza Gerarda Joseph Heijman
Peter Cornelis Zalm
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Application granted granted Critical
Publication of ATE98401T1 publication Critical patent/ATE98401T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
AT88201513T 1987-07-21 1988-07-14 Verfahren zum anbringen duenner schichten aus oxidischem supraleitendem material. ATE98401T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8701718A NL8701718A (nl) 1987-07-21 1987-07-21 Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal.
EP88201513A EP0300567B1 (de) 1987-07-21 1988-07-14 Verfahren zum Anbringen dünner Schichten aus oxidischem supraleitendem Material

Publications (1)

Publication Number Publication Date
ATE98401T1 true ATE98401T1 (de) 1993-12-15

Family

ID=19850351

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88201513T ATE98401T1 (de) 1987-07-21 1988-07-14 Verfahren zum anbringen duenner schichten aus oxidischem supraleitendem material.

Country Status (8)

Country Link
US (2) US4900709A (de)
EP (1) EP0300567B1 (de)
JP (1) JPS6441282A (de)
KR (1) KR970005156B1 (de)
AT (1) ATE98401T1 (de)
DE (1) DE3886115T2 (de)
NL (1) NL8701718A (de)
SU (1) SU1738104A3 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3884511T2 (de) * 1987-07-27 1994-02-03 Ovonic Synthetic Materials Verfahren zum Stabilisieren eines hoch-Tc-supraleitenden Materials und so stabilisiertes Material.
JPS6457438A (en) * 1987-08-28 1989-03-03 Mitsubishi Electric Corp Recording medium
JPH01171247A (ja) * 1987-12-25 1989-07-06 Mitsubishi Metal Corp 超伝導体配線の構造
GB2215548B (en) * 1988-02-26 1991-10-23 Gen Electric Co Plc A method of fabricating superconducting electronic devices
JPH0244784A (ja) * 1988-08-05 1990-02-14 Canon Inc 超伝導パターンの形成方法
US5246916A (en) * 1989-03-22 1993-09-21 Sri International Method of forming shaped superconductor materials by electrophoretic deposition of superconductor particulate coated with fusible binder
US5229360A (en) * 1989-07-24 1993-07-20 The Furukawa Electric Co., Ltd. Method for forming a multilayer superconducting circuit
US5135908A (en) * 1989-08-07 1992-08-04 The Trustees Of Columbia University In The City Of New York Method of patterning superconducting films
EP0450394A3 (de) * 1990-03-20 1991-10-23 Fujitsu Limited Verfahren und Vorrichtung zur Herstellung von supraleitenden Schichten
US5856275A (en) * 1990-11-01 1999-01-05 Sumitomo Electric Industries, Ltd. Superconducting wiring lines and process for fabricating the same
JPH0697522A (ja) * 1990-11-30 1994-04-08 Internatl Business Mach Corp <Ibm> 超伝導材料の薄膜の製造方法
US5252551A (en) * 1991-12-27 1993-10-12 The United States Of America As Represented By The Department Of Energy Superconducting composite with multilayer patterns and multiple buffer layers
US5593918A (en) * 1994-04-22 1997-01-14 Lsi Logic Corporation Techniques for forming superconductive lines
JP3076503B2 (ja) * 1994-12-08 2000-08-14 株式会社日立製作所 超電導素子およびその製造方法
DE102006030787B4 (de) * 2006-06-30 2008-11-27 Zenergy Power Gmbh Negativstrukturierung von Dünnschicht Hochtemperatur-Supraleitern

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4316785A (en) * 1979-11-05 1982-02-23 Nippon Telegraph & Telephone Public Corporation Oxide superconductor Josephson junction and fabrication method therefor
US4255474A (en) * 1980-01-04 1981-03-10 Rockwell International Corporation Composite having transparent conductor pattern
US4290843A (en) * 1980-02-19 1981-09-22 Texas Instruments Incorporated Epitaxial growth of magnetic memory film on implanted substrate
EP0282012A3 (de) * 1987-03-09 1989-09-13 Semiconductor Energy Laboratory Co., Ltd. Supraleitende Halbleiteranordnung
US4960751A (en) * 1987-04-01 1990-10-02 Semiconductor Energy Laboratory Co., Ltd. Electric circuit having superconducting multilayered structure and manufacturing method for same
JPS63291485A (ja) * 1987-05-25 1988-11-29 Fujikura Ltd 酸化物超電導回路の製造方法
CN1017110B (zh) * 1987-08-13 1992-06-17 株式会社半导体能源研究所 一种超导器件

Also Published As

Publication number Publication date
KR890003053A (ko) 1989-04-12
DE3886115D1 (de) 1994-01-20
KR970005156B1 (ko) 1997-04-12
JPS6441282A (en) 1989-02-13
EP0300567A3 (en) 1989-05-10
SU1738104A3 (ru) 1992-05-30
US4957899A (en) 1990-09-18
EP0300567A2 (de) 1989-01-25
EP0300567B1 (de) 1993-12-08
US4900709A (en) 1990-02-13
DE3886115T2 (de) 1994-06-09
NL8701718A (nl) 1989-02-16

Similar Documents

Publication Publication Date Title
ATE98401T1 (de) Verfahren zum anbringen duenner schichten aus oxidischem supraleitendem material.
ATE202431T1 (de) Verfahren zur herstellung von schichtigen supergittermaterialien.
EP0513642A3 (en) Method of making thin polyimide protection layers on ceramic superconductors or high temperature superconductors
IT1143766B (it) Processo per applicare uno strato ceramico e rivestimento doppio ad un substrato e prodotto cosi&#39; ottenuto
DE68924630D1 (de) Hochfrequenz-Substrat-Material für Dünnschichtlagen perovskitischer Supraleiter.
DE69016283D1 (de) Substrat mit einer supraleitenden Schicht.
KR860002135A (ko) 반도체기판의 주표면에 凹형 도랑이 형성된 반도체장치 및 그 제조방법
MX164984B (es) Composicion de revestimiento y proceso para aplicar el mismo a un sustrato
SU1632382A3 (ru) Способ получени сверхпровод щего тонкого сло
JPS6414814A (en) Manufacture of oxide superconductive thin film
EP0660428A3 (de) Verfahren zum Herstellen einer Stufe auf die Beschichtigungsoberfläche eines Substrats für eine supraleitende Anordnung die ein Oxyd-Supraleiter enthält.
DE3064426D1 (en) A method of applying a layer in accordance with a pattern on a substrate
DE68918746D1 (de) Halbleitersubstrat mit dünner Supraleiterschicht.
JPS5748249A (en) Semiconductor device
JPS5331964A (en) Production of semiconductor substrates
DE69315736D1 (de) Verfahren zur Herstellung von supraleitenden dünnen Schichten aus supraleitendem Oxidmaterial
JPS6431312A (en) Manufacture of ceramic superconducting wire material
JPS6411378A (en) Formation of josephson element
JPS5420671A (en) Production of semiconductor devices
NL7504118A (nl) Werkwijze voor het aanbrengen van naast elkaar liggende, dicht aan elkaar aansluitende, ver- schillende lagen op een transparante onderlaag.
JPS5350979A (en) Method of treatment of thin oxide layer on silicon substrate
JPS5688384A (en) Manufacture of josephson junction element
DE68922919D1 (de) Verfahren zur Herstellung von dünnen Schichten aus Hochtemperatur-Supraleiteroxyd.
JPS5629383A (en) Manufacture of tunnel-junction type josephson element
JPS6450315A (en) Superconductor material

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties