BE1002932A5 - Dispersion aqueuse colloidale de fumee de silice sans stabilisant. - Google Patents

Dispersion aqueuse colloidale de fumee de silice sans stabilisant. Download PDF

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Publication number
BE1002932A5
BE1002932A5 BE9000320A BE9000320A BE1002932A5 BE 1002932 A5 BE1002932 A5 BE 1002932A5 BE 9000320 A BE9000320 A BE 9000320A BE 9000320 A BE9000320 A BE 9000320A BE 1002932 A5 BE1002932 A5 BE 1002932A5
Authority
BE
Belgium
Prior art keywords
silica smoke
colloidal aqueous
stabilizer
aqueous silica
dispersion
Prior art date
Application number
BE9000320A
Other languages
English (en)
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Application granted granted Critical
Publication of BE1002932A5 publication Critical patent/BE1002932A5/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/1415—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
    • C01B33/1417—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water an aqueous dispersion being obtained
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Silicon Compounds (AREA)
  • Colloid Chemistry (AREA)

Abstract

Dispersion aqueuse colloïdale de fumée de silice stable, non dilatante, peu visqueuse et filtrable, sans alcali stabilisant, ayant une concentration en fumée de silice d'au moins environ 35 % en poids, obtenue en mélangeant de la fumée de silice avec de l'eau dans un mélangeur en quantité telle que la concentration de la fumée de silice excède celle requise dans la dispersion finale, puis en diluant le mélange avec un supplément d'eau pour que la dispersion aqueuse colloïdale résultante ait la concentration voulue en fumée de silice.
BE9000320A 1989-03-21 1990-03-21 Dispersion aqueuse colloidale de fumee de silice sans stabilisant. BE1002932A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/326,891 US5116535A (en) 1989-03-21 1989-03-21 Aqueous colloidal dispersion of fumed silica without a stabilizer

Publications (1)

Publication Number Publication Date
BE1002932A5 true BE1002932A5 (fr) 1991-08-27

Family

ID=23274180

Family Applications (1)

Application Number Title Priority Date Filing Date
BE9000320A BE1002932A5 (fr) 1989-03-21 1990-03-21 Dispersion aqueuse colloidale de fumee de silice sans stabilisant.

Country Status (13)

Country Link
US (1) US5116535A (fr)
JP (1) JP2935125B2 (fr)
KR (1) KR0145729B1 (fr)
CN (1) CN1028166C (fr)
AU (1) AU631847B2 (fr)
BE (1) BE1002932A5 (fr)
BR (1) BR9001239A (fr)
CA (1) CA2012718C (fr)
DE (1) DE4006393A1 (fr)
FR (1) FR2644769B1 (fr)
GB (1) GB2229715B (fr)
IT (1) IT1241073B (fr)
MY (1) MY116453A (fr)

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US6546939B1 (en) 1990-11-05 2003-04-15 Ekc Technology, Inc. Post clean treatment
US5888587A (en) * 1992-07-07 1999-03-30 Alcatel N.V. Method of manufacturing silica powder and use of such powder in making an optical fiber preform
FR2693451B1 (fr) * 1992-07-07 1994-08-19 Alcatel Nv Procédé de fabrication d'une poudre de silice et application d'une telle poudre à la réalisation d'une préforme pour fibre optique.
IL107932A0 (en) * 1992-12-08 1994-04-12 Miroevski Piotr Ravilevich Method and apparatus for producing a silicon based binding composition and product prepared therefrom
EP0727478A3 (fr) * 1995-02-14 1997-06-25 Toyota Motor Co Ltd Composition dilatante
US6343490B1 (en) * 1996-05-14 2002-02-05 Lucent Technologies, Inc. Processing entailing sol-gel fabrication of silica glass
EP0807610B1 (fr) * 1996-05-14 2001-06-20 Lucent Technologies Inc. Procédé entraínant la production de verre de silice par la méthode sol-gel
KR100510815B1 (ko) * 1997-05-07 2005-10-24 제이에스알 가부시끼가이샤 무기입자의 수성분산체 및 그의 제조방법
KR19990023544A (ko) * 1997-08-19 1999-03-25 마쯔모또 에이찌 무기 입자의 수성 분산체와 그의 제조 방법
US6036873A (en) * 1997-11-26 2000-03-14 Eastman Kodak Company Process for generating precision polished non-plannar aspherical surfaces
AU6281399A (en) 1998-10-02 2000-04-26 Cabot Corporation Silica dispersion, coating composition and recording medium
JP4428473B2 (ja) * 1999-01-18 2010-03-10 株式会社東芝 気相法無機酸化物粒子の含水固体状物質及び研磨用スラリーの製造方法
JP3721497B2 (ja) * 1999-07-15 2005-11-30 株式会社フジミインコーポレーテッド 研磨用組成物の製造方法
DE19936478A1 (de) * 1999-08-03 2001-02-15 Degussa Sinterwerkstoffe
EP1148026B1 (fr) * 2000-04-12 2016-08-10 Evonik Degussa GmbH Dispersions
EP1182168B1 (fr) * 2000-08-21 2004-05-12 Degussa AG Dioxyde de silicium pyrogéniquement préparé
US6679945B2 (en) * 2000-08-21 2004-01-20 Degussa Ag Pyrogenically prepared silicon dioxide
DE60133411T2 (de) * 2000-11-15 2009-04-16 Cabot Corp., Boston Verfahren zur herstellung einer dispersion pyrogener metalloxide
US6571582B2 (en) * 2001-04-19 2003-06-03 Fitel Usa Corp. Manufacture of silica bodies using sol-gel techniques
WO2004005189A1 (fr) * 2002-07-10 2004-01-15 Lanewood Inc. Dispersion aqueuse stable de microsilice
US20040094026A1 (en) * 2002-11-19 2004-05-20 Integrity Testing Laboratory Inc. Method of making a protective material and articles made therefrom
JP4426192B2 (ja) * 2003-02-14 2010-03-03 ニッタ・ハース株式会社 研磨用組成物の製造方法
EP1613787A4 (fr) * 2003-04-02 2007-09-26 Univ Northwestern Methodes de controle de l'etirement de nanoparticules
JP2005286048A (ja) * 2004-03-29 2005-10-13 Nitta Haas Inc 半導体研磨用組成物
JP2005286047A (ja) * 2004-03-29 2005-10-13 Nitta Haas Inc 半導体研磨用組成物
GB0407198D0 (en) * 2004-03-30 2004-05-05 British Telecomm Joint fault detection
EP1586614B1 (fr) 2004-04-12 2010-09-15 JSR Corporation Suspension aqueuse pour polissage mécano-chimique et procédé de polissage mécano-chimique
DE602005021639D1 (de) * 2004-05-04 2010-07-15 Cabot Corp Verfahren zur herstellung einer dispersion von metalloxid-aggregatteilchen mit einem gewünschten aggregatteilchendurchmesser
DE102004054392A1 (de) * 2004-08-28 2006-03-02 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zum Verbinden von Bauteilen aus hochkieselsäurehaltigem Werkstoff, sowie aus derartigen Bauteilen zusammengefügter Bauteil-Verbund
KR100497413B1 (ko) * 2004-11-26 2005-06-23 에이스하이텍 주식회사 텅스텐-화학적 기계적 연마에 유용한 슬러리 및 그 제조방법
US20070209288A1 (en) * 2005-03-28 2007-09-13 Yoshiharu Ohta Semiconductor Polishing Composition
DE102006002545A1 (de) * 2006-01-18 2007-07-19 Ewald Dörken Ag Siliziumbasiertes Korrosionsschutzmittel
US7989506B2 (en) * 2007-04-04 2011-08-02 Eastman Kodak Company Method and apparatus for dispersion of high-surface-area, low-bulk-density fumed silica
KR101673692B1 (ko) * 2014-11-07 2016-11-07 현대자동차주식회사 건식 실리카 입자를 포함하는 상변이 현탁 유체 조성물 및 이의 제조방법
CN109942002B (zh) * 2017-12-20 2020-08-28 中国地质大学（北京） 一种生产氧化锆的副产物硅灰中二氧化硅微球解聚方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2984629A (en) * 1957-11-04 1961-05-16 Cabot Corp Aqueous dispersions of pyrogenic silica
FR2094790A5 (fr) * 1970-11-24 1972-02-04 Degussa Procede pour la preparation de dispersions aqueuses stables de dioxydes de silicium par voie ignee
US4042361A (en) * 1976-04-26 1977-08-16 Corning Glass Works Method of densifying metal oxides

Family Cites Families (7)

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US2884629A (en) * 1945-11-29 1959-04-28 Samuel J Mason Metal-plate lens microwave antenna
DE1667460B1 (de) * 1967-10-12 1971-07-08 Degussa Verfahren zur herstellung stabiler dispersionen von pyrogen gewonnener kieselsaeure
GB1326574A (en) * 1970-10-30 1973-08-15 Degussa Production of stabilised dispersions of pyrogenic silica
US4200445A (en) * 1977-04-28 1980-04-29 Corning Glass Works Method of densifying metal oxides
US4321243A (en) * 1980-08-05 1982-03-23 Cornwell Charles E Method of producing stabilized aqueous dispersions of silica fume
US4613454A (en) * 1983-06-30 1986-09-23 Nalco Chemical Company Metal oxide/silica sols
JPS60129132A (ja) * 1983-12-14 1985-07-10 Denki Kagaku Kogyo Kk シリカヒユ−ム水分散体の製法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2984629A (en) * 1957-11-04 1961-05-16 Cabot Corp Aqueous dispersions of pyrogenic silica
FR2094790A5 (fr) * 1970-11-24 1972-02-04 Degussa Procede pour la preparation de dispersions aqueuses stables de dioxydes de silicium par voie ignee
US4042361A (en) * 1976-04-26 1977-08-16 Corning Glass Works Method of densifying metal oxides

Also Published As

Publication number Publication date
FR2644769B1 (fr) 1994-02-04
CA2012718C (fr) 1996-12-03
CN1045753A (zh) 1990-10-03
IT1241073B (it) 1993-12-29
FR2644769A1 (fr) 1990-09-28
KR0145729B1 (ko) 1998-08-17
US5116535A (en) 1992-05-26
IT9019747A1 (it) 1991-09-21
GB2229715A (en) 1990-10-03
CA2012718A1 (fr) 1990-09-21
AU5200990A (en) 1990-09-27
BR9001239A (pt) 1991-03-26
MY116453A (en) 2004-02-28
AU631847B2 (en) 1992-12-10
CN1028166C (zh) 1995-04-12
GB9006121D0 (en) 1990-05-16
GB2229715B (en) 1992-10-14
IT9019747A0 (it) 1990-03-21
JPH0350112A (ja) 1991-03-04
KR900014249A (ko) 1990-10-23
JP2935125B2 (ja) 1999-08-16
DE4006393A1 (de) 1990-09-27

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Legal Events

Date Code Title Description
CA Change of address of the owner of the patent

Owner name: *CABOT CORP.; *CABOT MICROELECTRONICS CORP.:2 SEAP

Effective date: 20001207

RE Patent lapsed

Effective date: 20090331