BE744372A - Masques photographiques et leur procede de fabrication - Google Patents

Masques photographiques et leur procede de fabrication

Info

Publication number
BE744372A
BE744372A BE744372DA BE744372A BE 744372 A BE744372 A BE 744372A BE 744372D A BE744372D A BE 744372DA BE 744372 A BE744372 A BE 744372A
Authority
BE
Belgium
Prior art keywords
manufacturing process
photographic masks
masks
photographic
manufacturing
Prior art date
Application number
Other languages
English (en)
Inventor
A G F Dingwall
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of BE744372A publication Critical patent/BE744372A/fr

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Holders For Sensitive Materials And Originals (AREA)
BE744372D 1969-05-08 1970-01-13 Masques photographiques et leur procede de fabrication BE744372A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82305169A 1969-05-08 1969-05-08

Publications (1)

Publication Number Publication Date
BE744372A true BE744372A (fr) 1970-06-15

Family

ID=25237666

Family Applications (1)

Application Number Title Priority Date Filing Date
BE744372D BE744372A (fr) 1969-05-08 1970-01-13 Masques photographiques et leur procede de fabrication

Country Status (6)

Country Link
US (1) US3673018A (fr)
JP (1) JPS50187B1 (fr)
BE (1) BE744372A (fr)
DE (1) DE2005495A1 (fr)
FR (1) FR2046070A5 (fr)
GB (1) GB1294585A (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3922184A (en) * 1973-12-26 1975-11-25 Ibm Method for forming openings through insulative layers in the fabrication of integrated circuits
GB1530978A (en) * 1976-05-10 1978-11-01 Rca Corp Method for removing material from a substrate
US4174252A (en) * 1978-07-26 1979-11-13 Rca Corporation Method of defining contact openings in insulating layers on semiconductor devices without the formation of undesirable pinholes
DE2946235C3 (de) * 1979-11-16 1982-04-08 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Verfahren zur Erzeugung einer Belichtungsmaske zur Herstellung von mattstreuenden Strukturen neben opaken und/oder transparenten Strukturen
US5304437A (en) * 1992-04-03 1994-04-19 At&T Bell Laboratories Mask for x-ray pattern delineation
US6074571A (en) * 1997-09-30 2000-06-13 International Business Machines Corporation Cut and blast defect to avoid chrome roll over annealing
RU2206115C1 (ru) * 2002-01-08 2003-06-10 Закрытое акционерное общество "Элма-Фотма" Фотошаблонная заготовка

Also Published As

Publication number Publication date
GB1294585A (en) 1972-11-01
US3673018A (en) 1972-06-27
JPS50187B1 (fr) 1975-01-07
DE2005495A1 (de) 1970-11-12
FR2046070A5 (fr) 1971-03-05

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