BE761732A - Appareil de reaction a haut rendement pour le depot d'une pellicule - Google Patents

Appareil de reaction a haut rendement pour le depot d'une pellicule

Info

Publication number
BE761732A
BE761732A BE761732A BE761732A BE761732A BE 761732 A BE761732 A BE 761732A BE 761732 A BE761732 A BE 761732A BE 761732 A BE761732 A BE 761732A BE 761732 A BE761732 A BE 761732A
Authority
BE
Belgium
Prior art keywords
high efficiency
reaction apparatus
film deposit
efficiency reaction
deposit
Prior art date
Application number
BE761732A
Other languages
English (en)
Inventor
K Strater
W B Hall
E M Mihalick
W C Stever
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of BE761732A publication Critical patent/BE761732A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45506—Turbulent flow
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Fluid Mechanics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
BE761732A 1970-04-27 1971-01-18 Appareil de reaction a haut rendement pour le depot d'une pellicule BE761732A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3230170A 1970-04-27 1970-04-27

Publications (1)

Publication Number Publication Date
BE761732A true BE761732A (fr) 1971-07-01

Family

ID=21864192

Family Applications (1)

Application Number Title Priority Date Filing Date
BE761732A BE761732A (fr) 1970-04-27 1971-01-18 Appareil de reaction a haut rendement pour le depot d'une pellicule

Country Status (5)

Country Link
US (1) US3673983A (fr)
JP (1) JPS497796B1 (fr)
BE (1) BE761732A (fr)
SE (1) SE363355B (fr)
YU (1) YU33838B (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4084540A (en) * 1977-05-19 1978-04-18 Discwasher, Inc. Apparatus for applying lubricating and protective film to phonograph records
US4981102A (en) * 1984-04-12 1991-01-01 Ethyl Corporation Chemical vapor deposition reactor and process
US4709655A (en) * 1985-12-03 1987-12-01 Varian Associates, Inc. Chemical vapor deposition apparatus
US4796562A (en) * 1985-12-03 1989-01-10 Varian Associates, Inc. Rapid thermal cvd apparatus
KR101177983B1 (ko) 2007-10-11 2012-08-29 발렌스 프로세스 이큅먼트, 인코포레이티드 화학 기상 증착 반응기

Also Published As

Publication number Publication date
YU16471A (en) 1977-12-31
DE2102647B2 (de) 1977-06-02
JPS497796B1 (fr) 1974-02-22
US3673983A (en) 1972-07-04
DE2102647A1 (de) 1971-11-11
YU33838B (en) 1978-06-30
SE363355B (fr) 1974-01-14

Similar Documents

Publication Publication Date Title
BE794780A (fr) Appareil pour le moulage d'objets
IT955303B (it) Costipatore di rifiuti
FR2290945A1 (fr) Procede pour ameliorer le rendement energetique d'une reaction
BE816727A (fr) Appareil pour catheterisme sus-pubien
BE773570A (fr) Appareil de tassement pour ordures
FR2295568A1 (fr) Procede de depot heteroepitaxique pour la realisation de diodes gap/si
BE792236A (fr) Appareil pour la conversion d'hydrocarbures
BE806148A (fr) Enceinte de reaction pour le depot de matiere semi-conductrice sur des corps de support chauffes
BE771004A (fr) Procede pour l'adoucissement d'hydrocarbures
BE752982A (fr) Appareil pour amener une succession d'objets similaires, le long d'un parcours, a une succession de postes de travail
BE758027R (fr) Circuit de manipulation d'adresses pour un calculateur
OA03280A (fr) Procédé de conversion d'hydrocarbures.
CH530329A (fr) Appareil pour le transport successif d'objets allongés
BE761039A (fr) Procede pour convertir la sortie d'un processeur numerique
BE761732A (fr) Appareil de reaction a haut rendement pour le depot d'une pellicule
BE817066R (fr) Enceinte de reaction pour le depot de matiere semi-concuctrice sur des corps de support chauffes
SE383926B (sv) Reaktionsbehallare for isotermisk kalorimetri
BE775636A (fr) Appareil pour le guidage d'un transporteur
BE776929R (fr) Appareil pour l'emboutissage de pellicules par
BE765326A (fr) Chargeur pour produit photographique
CH533462A (fr) Catalyseur utilisable pour le reformage d'hydrocarbures
BE836015A (fr) Receptacle pour le depot d'ordures
BE798285A (fr) Reacteur pour la chlorolyse
CH546042A (fr) Dispositif pour constituer des groupes d'objets deplaces sur un transporteur en une suite monocouche.
BE758010A (fr) Bains pour le depot d'or par voie chimique