BE768897A - Semi-conducteurs a pellicules d'oxyde epaisses - Google Patents

Semi-conducteurs a pellicules d'oxyde epaisses

Info

Publication number
BE768897A
BE768897A BE768897A BE768897A BE768897A BE 768897 A BE768897 A BE 768897A BE 768897 A BE768897 A BE 768897A BE 768897 A BE768897 A BE 768897A BE 768897 A BE768897 A BE 768897A
Authority
BE
Belgium
Prior art keywords
oxide film
thick oxide
film semiconductors
semiconductors
thick
Prior art date
Application number
BE768897A
Other languages
English (en)
Inventor
E G Parks Jr
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of BE768897A publication Critical patent/BE768897A/fr

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302Non-deposition formation processes
    • H10P14/6304Formation by oxidation, e.g. oxidation of the substrate
    • H10P14/6306Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials
    • H10P14/6308Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors
    • H10P14/6309Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors of silicon in uncombined form, i.e. pure silicon
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302Non-deposition formation processes
    • H10P14/6322Formation by thermal treatments
BE768897A 1970-06-25 1971-06-23 Semi-conducteurs a pellicules d'oxyde epaisses BE768897A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4975470A 1970-06-25 1970-06-25

Publications (1)

Publication Number Publication Date
BE768897A true BE768897A (fr) 1971-11-03

Family

ID=21961529

Family Applications (1)

Application Number Title Priority Date Filing Date
BE768897A BE768897A (fr) 1970-06-25 1971-06-23 Semi-conducteurs a pellicules d'oxyde epaisses

Country Status (4)

Country Link
BE (1) BE768897A (fr)
DE (1) DE2127569A1 (fr)
FR (1) FR2096483A1 (fr)
NL (1) NL7108492A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3922184A (en) * 1973-12-26 1975-11-25 Ibm Method for forming openings through insulative layers in the fabrication of integrated circuits
JPS5955054A (ja) * 1982-09-24 1984-03-29 Hitachi Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
FR2096483A1 (fr) 1972-02-18
DE2127569A1 (de) 1971-12-30
NL7108492A (fr) 1971-12-28

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