BE769403A - Procede destine a produire un dessin sur film metallique - Google Patents

Procede destine a produire un dessin sur film metallique

Info

Publication number
BE769403A
BE769403A BE769403A BE769403A BE769403A BE 769403 A BE769403 A BE 769403A BE 769403 A BE769403 A BE 769403A BE 769403 A BE769403 A BE 769403A BE 769403 A BE769403 A BE 769403A
Authority
BE
Belgium
Prior art keywords
producing
metal film
film
metal
Prior art date
Application number
BE769403A
Other languages
English (en)
Inventor
R M Clinehens
J K Stewart Jr
R W Ditmer
Original Assignee
Ncr Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ncr Co filed Critical Ncr Co
Publication of BE769403A publication Critical patent/BE769403A/fr

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
BE769403A 1970-07-02 1971-07-02 Procede destine a produire un dessin sur film metallique BE769403A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US5180870A 1970-07-02 1970-07-02

Publications (1)

Publication Number Publication Date
BE769403A true BE769403A (fr) 1971-11-16

Family

ID=21973487

Family Applications (1)

Application Number Title Priority Date Filing Date
BE769403A BE769403A (fr) 1970-07-02 1971-07-02 Procede destine a produire un dessin sur film metallique

Country Status (8)

Country Link
US (1) US3674579A (fr)
BE (1) BE769403A (fr)
BR (1) BR7103942D0 (fr)
CH (1) CH544160A (fr)
DE (1) DE2132109A1 (fr)
FR (1) FR2100151A5 (fr)
GB (1) GB1286219A (fr)
ZA (1) ZA713875B (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5915394B2 (ja) * 1978-08-31 1984-04-09 富士通株式会社 厚膜微細パタ−ン生成方法
NL8204307A (nl) * 1982-11-08 1984-06-01 Philips Nv Werkwijze voor het etsen van holten en openingen in substraten en inrichting voor het uitvoeren van deze werkwijze.
US5185056A (en) * 1991-09-13 1993-02-09 International Business Machines Corporation Method and apparatus for etching semiconductor wafers and developing resists

Also Published As

Publication number Publication date
FR2100151A5 (fr) 1972-03-17
US3674579A (en) 1972-07-04
CH544160A (de) 1973-11-15
ZA713875B (en) 1972-01-26
GB1286219A (en) 1972-08-23
DE2132109A1 (de) 1972-02-10
BR7103942D0 (pt) 1973-04-12

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