BE769694A - Systemes photo-actifs - Google Patents
Systemes photo-actifsInfo
- Publication number
- BE769694A BE769694A BE769694A BE769694A BE769694A BE 769694 A BE769694 A BE 769694A BE 769694 A BE769694 A BE 769694A BE 769694 A BE769694 A BE 769694A BE 769694 A BE769694 A BE 769694A
- Authority
- BE
- Belgium
- Prior art keywords
- photo
- active systems
- active
- systems
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/56—Processes using photosensitive compositions covered by the groups G03C1/64 - G03C1/72 or agents therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5353770A | 1970-07-09 | 1970-07-09 | |
| US14462971A | 1971-05-18 | 1971-05-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE769694A true BE769694A (fr) | 1972-01-10 |
Family
ID=26731974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE769694A BE769694A (fr) | 1970-07-09 | 1971-07-08 | Systemes photo-actifs |
Country Status (4)
| Country | Link |
|---|---|
| BE (1) | BE769694A (fr) |
| DE (1) | DE2133460A1 (fr) |
| FR (1) | FR2100340A5 (fr) |
| GB (1) | GB1345434A (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3223104A1 (de) * | 1982-06-21 | 1983-12-22 | Hoechst Ag, 6230 Frankfurt | Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial |
-
1971
- 1971-07-06 DE DE19712133460 patent/DE2133460A1/de active Pending
- 1971-07-07 GB GB3188071A patent/GB1345434A/en not_active Expired
- 1971-07-07 FR FR7124822A patent/FR2100340A5/fr not_active Expired
- 1971-07-08 BE BE769694A patent/BE769694A/fr unknown
Also Published As
| Publication number | Publication date |
|---|---|
| GB1345434A (en) | 1974-01-30 |
| DE2133460A1 (de) | 1972-02-17 |
| FR2100340A5 (fr) | 1972-03-17 |
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