BE772619A - Procede de decapage de dessins, comportant l'emploi d'une photoreserve - Google Patents

Procede de decapage de dessins, comportant l'emploi d'une photoreserve

Info

Publication number
BE772619A
BE772619A BE772619A BE772619A BE772619A BE 772619 A BE772619 A BE 772619A BE 772619 A BE772619 A BE 772619A BE 772619 A BE772619 A BE 772619A BE 772619 A BE772619 A BE 772619A
Authority
BE
Belgium
Prior art keywords
photoreserve
pickling process
pickling
drawing pickling
Prior art date
Application number
BE772619A
Other languages
English (en)
Inventor
G L Christensen
D H Gittelman
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of BE772619A publication Critical patent/BE772619A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/949—Energy beam treating radiation resist on semiconductor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
BE772619A 1970-09-18 1971-09-15 Procede de decapage de dessins, comportant l'emploi d'une photoreserve BE772619A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7348670A 1970-09-18 1970-09-18

Publications (1)

Publication Number Publication Date
BE772619A true BE772619A (fr) 1972-01-17

Family

ID=22113977

Family Applications (1)

Application Number Title Priority Date Filing Date
BE772619A BE772619A (fr) 1970-09-18 1971-09-15 Procede de decapage de dessins, comportant l'emploi d'une photoreserve

Country Status (9)

Country Link
US (1) US3705055A (fr)
JP (1) JPS5417139B1 (fr)
BE (1) BE772619A (fr)
CA (1) CA944998A (fr)
DE (1) DE2145647C3 (fr)
FR (1) FR2107713A5 (fr)
GB (1) GB1361637A (fr)
IT (1) IT942608B (fr)
NL (1) NL7112810A (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3767490A (en) * 1971-06-29 1973-10-23 Ibm Process for etching organic coating layers
GB1513368A (en) * 1974-07-08 1978-06-07 Vickers Ltd Processing of radiation-sensitive members
US4012307A (en) * 1975-12-05 1977-03-15 General Dynamics Corporation Method for conditioning drilled holes in multilayer wiring boards
US4115184A (en) * 1975-12-29 1978-09-19 Northern Telecom Limited Method of plasma etching
US4243865A (en) * 1976-05-14 1981-01-06 Data General Corporation Process for treating material in plasma environment
DE2726813C2 (de) * 1976-06-17 1984-02-23 Motorola, Inc., 60196 Schaumburg, Ill. Verfahren zur Herstellung eines mit einem Muster versehenen Substrats
US5024918A (en) * 1976-12-23 1991-06-18 Texas Instruments Incorporated Heat activated dry development of photoresist by means of active oxygen atmosphere
US4092442A (en) * 1976-12-30 1978-05-30 International Business Machines Corporation Method of depositing thin films utilizing a polyimide mask
US4292384A (en) * 1977-09-30 1981-09-29 Horizons Research Incorporated Gaseous plasma developing and etching process employing low voltage DC generation
US4201579A (en) * 1978-06-05 1980-05-06 Motorola, Inc. Method for removing photoresist by hydrogen plasma
US4241165A (en) * 1978-09-05 1980-12-23 Motorola, Inc. Plasma development process for photoresist
US4277321A (en) * 1979-04-23 1981-07-07 Bell Telephone Laboratories, Incorporated Treating multilayer printed wiring boards
US4307178A (en) * 1980-04-30 1981-12-22 International Business Machines Corporation Plasma develoment of resists
US4509162A (en) * 1980-10-28 1985-04-02 Quixote Corporation High density recording medium
US4536271A (en) * 1983-12-29 1985-08-20 Mobil Oil Corporation Method of plasma treating a polymer film to change its properties
JPS62129846A (ja) * 1985-12-02 1987-06-12 Dainippon Screen Mfg Co Ltd フオトレジストの塗布方法及び塗布装置
US4749640A (en) * 1986-09-02 1988-06-07 Monsanto Company Integrated circuit manufacturing process
US5049408A (en) * 1989-11-07 1991-09-17 Gte Laboratories Incorporated Method for coating phosphor particles using aluminum isopropoxide precursors and an isothermal fluidized bed
US4999219A (en) * 1989-11-07 1991-03-12 Gte Laboratories Incorporated Method for coating phosphor particles using aluminum isopropoxide precursors and an isothermal fluidized bed
US5198634A (en) * 1990-05-21 1993-03-30 Mattson Brad S Plasma contamination removal process
US8029105B2 (en) * 2007-10-17 2011-10-04 Eastman Kodak Company Ambient plasma treatment of printer components

Also Published As

Publication number Publication date
CA944998A (en) 1974-04-09
US3705055A (en) 1972-12-05
DE2145647C3 (de) 1974-02-21
DE2145647B2 (de) 1973-08-02
NL7112810A (fr) 1972-03-21
DE2145647A1 (de) 1972-04-20
FR2107713A5 (fr) 1972-05-05
IT942608B (it) 1973-04-02
GB1361637A (en) 1974-07-30
JPS5417139B1 (fr) 1979-06-27

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: WESTERN ELECTRIC CY INC.

Effective date: 19890930