BE821564A - Dispositifs semi-conducteurs avec des couches metalliques refractaires - Google Patents

Dispositifs semi-conducteurs avec des couches metalliques refractaires

Info

Publication number
BE821564A
BE821564A BE149953A BE149953A BE821564A BE 821564 A BE821564 A BE 821564A BE 149953 A BE149953 A BE 149953A BE 149953 A BE149953 A BE 149953A BE 821564 A BE821564 A BE 821564A
Authority
BE
Belgium
Prior art keywords
semiconductor devices
metal layers
refractory metal
refractory
layers
Prior art date
Application number
BE149953A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE821564A publication Critical patent/BE821564A/fr

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/01Manufacture or treatment
    • H10D64/011Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H10D64/0111Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors
    • H10D64/0112Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors using conductive layers comprising silicides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0682Silicides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Silicon Compounds (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
BE149953A 1973-11-01 1974-10-28 Dispositifs semi-conducteurs avec des couches metalliques refractaires BE821564A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US41181973A 1973-11-01 1973-11-01

Publications (1)

Publication Number Publication Date
BE821564A true BE821564A (fr) 1975-02-17

Family

ID=23630455

Family Applications (1)

Application Number Title Priority Date Filing Date
BE149953A BE821564A (fr) 1973-11-01 1974-10-28 Dispositifs semi-conducteurs avec des couches metalliques refractaires

Country Status (9)

Country Link
JP (1) JPS5080790A (fr)
BE (1) BE821564A (fr)
DE (1) DE2450341A1 (fr)
FR (1) FR2250198B1 (fr)
GB (1) GB1448610A (fr)
IN (1) IN140056B (fr)
IT (1) IT1022138B (fr)
NL (1) NL7414233A (fr)
SE (1) SE7413660L (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53114366A (en) * 1977-03-16 1978-10-05 Toshiba Corp Semiconductor device
US4180596A (en) * 1977-06-30 1979-12-25 International Business Machines Corporation Method for providing a metal silicide layer on a substrate
US4359490A (en) * 1981-07-13 1982-11-16 Fairchild Camera & Instrument Corp. Method for LPCVD co-deposition of metal and silicon to form metal silicide
US4507851A (en) * 1982-04-30 1985-04-02 Texas Instruments Incorporated Process for forming an electrical interconnection system on a semiconductor
JPS58202553A (ja) * 1982-05-21 1983-11-25 Toshiba Corp 半導体装置
GB2139419A (en) * 1983-05-05 1984-11-07 Standard Telephones Cables Ltd Semiconductor devices
JPS6014852U (ja) * 1983-07-07 1985-01-31 屋敷 静雄 スベリドメ付きドライバ−
NL9000795A (nl) * 1990-04-04 1991-11-01 Imec Inter Uni Micro Electr Werkwijze voor het aanbrengen van metaalsilicides op silicium.

Also Published As

Publication number Publication date
DE2450341A1 (de) 1975-05-07
FR2250198B1 (fr) 1978-06-09
GB1448610A (en) 1976-09-08
IN140056B (fr) 1976-09-04
IT1022138B (it) 1978-03-20
JPS5080790A (fr) 1975-07-01
SE7413660L (fr) 1975-05-02
FR2250198A1 (fr) 1975-05-30
NL7414233A (nl) 1975-05-06

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