BE851024A - Composition photosensible non argentique - Google Patents

Composition photosensible non argentique

Info

Publication number
BE851024A
BE851024A BE174609A BE174609A BE851024A BE 851024 A BE851024 A BE 851024A BE 174609 A BE174609 A BE 174609A BE 174609 A BE174609 A BE 174609A BE 851024 A BE851024 A BE 851024A
Authority
BE
Belgium
Prior art keywords
argentic
photosensitive composition
photosensitive
composition
argentic photosensitive
Prior art date
Application number
BE174609A
Other languages
English (en)
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of BE851024A publication Critical patent/BE851024A/fr

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D311/00Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/06Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2
    • C07D311/08Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring
    • C07D311/16Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted in position 7
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/695Compositions containing azides as the photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/60Processes for obtaining vesicular images
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • G03F7/0085Azides characterised by the non-macromolecular additives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
BE174609A 1976-02-02 1977-02-02 Composition photosensible non argentique BE851024A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US65448576A 1976-02-02 1976-02-02

Publications (1)

Publication Number Publication Date
BE851024A true BE851024A (fr) 1977-08-02

Family

ID=24625047

Family Applications (1)

Application Number Title Priority Date Filing Date
BE174609A BE851024A (fr) 1976-02-02 1977-02-02 Composition photosensible non argentique

Country Status (3)

Country Link
BE (1) BE851024A (fr)
CA (1) CA1065177A (fr)
SE (1) SE419679B (fr)

Also Published As

Publication number Publication date
SE419679B (sv) 1981-08-17
SE7701110L (sv) 1977-08-03
CA1065177A (fr) 1979-10-30

Similar Documents

Publication Publication Date Title
FR2339881A1 (fr) Composition photosensible non argentique
MX144887A (es) Composicion fotosensible mejorada
SE7713361L (sv) Komposition
IT1075517B (it) Composizioni antitraspiranti anidre
IT1067967B (it) Composizione fotopolimerizzabile
FR2338927A1 (fr) Phenyl-amidines substituees
BE852727A (nl) Polypropyeencomposities
SE7712836L (sv) Polyfluoroallyloxiforeningar
IT1087502B (it) Complesso fotosensibile
DK175877A (da) Krystallinske forbindelser
SE7704946L (sv) Stannopyrofosfat-teknetium-99mm-kompositioner
BR7705002A (pt) Compostos fungicidas
BR7701889A (pt) Composicao aperfeicoada de plimistura
TR20136A (tr) Ensektisid terkipler
PT66442B (pt) Basisch substituierte xanthinderivate
FI773930A7 (fi) Staolstraengsgjutkokill foer tack- och raostaenger
BE858475A (fr) Compositions photoreticulables
DK384077A (da) Komposition
MX3553E (es) Composicion polumerica mejorada
SE7612936L (sv) Hygienisk-kosmetiska kompositioner
BE851237A (fr) Hydrazinophtalazines substituees
RO71904A (fr) Composition herbicide synergetique
SE7713303L (sv) Acetofenonforeningar
RO72715A (fr) Composition erbicide sinergetique
SE7708473L (sv) Limulus-amebocyt-lysat-reagenskompositioner

Legal Events

Date Code Title Description
RE20 Patent expired

Owner name: EASTMAN KODAK CY

Effective date: 19970202