BE883410A - Film de photoresist pouvant etre developpe par un solvant - Google Patents

Film de photoresist pouvant etre developpe par un solvant

Info

Publication number
BE883410A
BE883410A BE0/200701A BE200701A BE883410A BE 883410 A BE883410 A BE 883410A BE 0/200701 A BE0/200701 A BE 0/200701A BE 200701 A BE200701 A BE 200701A BE 883410 A BE883410 A BE 883410A
Authority
BE
Belgium
Prior art keywords
solvent
photoresist film
developable photoresist
developable
film
Prior art date
Application number
BE0/200701A
Other languages
English (en)
Inventor
C Cyr
N Hagan
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=21958614&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BE883410(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Du Pont filed Critical Du Pont
Publication of BE883410A publication Critical patent/BE883410A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0577—Double layer of resist having the same pattern

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
BE0/200701A 1979-06-15 1980-05-21 Film de photoresist pouvant etre developpe par un solvant BE883410A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4921079A 1979-06-15 1979-06-15

Publications (1)

Publication Number Publication Date
BE883410A true BE883410A (fr) 1980-11-21

Family

ID=21958614

Family Applications (1)

Application Number Title Priority Date Filing Date
BE0/200701A BE883410A (fr) 1979-06-15 1980-05-21 Film de photoresist pouvant etre developpe par un solvant

Country Status (5)

Country Link
EP (1) EP0025088B1 (fr)
JP (1) JPS5625732A (fr)
BE (1) BE883410A (fr)
CA (1) CA1298511C (fr)
DE (1) DE3066818D1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
US4612270A (en) * 1985-03-14 1986-09-16 Rca Corporation Two-layer negative resist
JPS62295046A (ja) * 1986-06-16 1987-12-22 Hitachi Chem Co Ltd 感光性樹脂組成物
JP2635353B2 (ja) * 1988-02-29 1997-07-30 日本合成化学工業株式会社 画像形成方法
EP0413863A1 (fr) * 1989-08-24 1991-02-27 Toyo Ink Manufacturing Co., Ltd. Procédé d'enregistrement de l'image et matériau
JPH0484136A (ja) * 1990-07-27 1992-03-17 Mitsubishi Rayon Co Ltd パターン形成方法
JPH0580503A (ja) * 1991-06-25 1993-04-02 Fuji Photo Film Co Ltd 感光性転写材料及び画像形成方法
JP2794242B2 (ja) * 1991-06-25 1998-09-03 富士写真フイルム株式会社 感光性転写材料及び画像形成方法
US6545575B1 (en) 1998-09-28 2003-04-08 Idec Izumi Corporation Relay and method of manufacture thereof
WO2006011548A1 (fr) * 2004-07-30 2006-02-02 Hitachi Chemical Company, Ltd. Film photosensible, film stratifié photosensible et rouleau de film photosensible

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4315066A (en) * 1979-03-29 1982-02-09 Bexford Limited Substrates suitable for the production of photopolymerizable elements

Also Published As

Publication number Publication date
EP0025088A2 (fr) 1981-03-18
EP0025088B1 (fr) 1984-03-07
DE3066818D1 (en) 1984-04-12
CA1298511C (fr) 1992-04-07
EP0025088A3 (en) 1981-05-27
JPS5625732A (en) 1981-03-12

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