BE905163A - Dispositif d'exposition-developpement pour long support. - Google Patents

Dispositif d'exposition-developpement pour long support.

Info

Publication number
BE905163A
BE905163A BE0/216967A BE216967A BE905163A BE 905163 A BE905163 A BE 905163A BE 0/216967 A BE0/216967 A BE 0/216967A BE 216967 A BE216967 A BE 216967A BE 905163 A BE905163 A BE 905163A
Authority
BE
Belgium
Prior art keywords
long
support
exposure
section
layer
Prior art date
Application number
BE0/216967A
Other languages
English (en)
Inventor
Kazuo Ohuchi
Chiharu Miyaake
Yutaka Yamamura
Original Assignee
Nitto Electric Ind Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Electric Ind Co filed Critical Nitto Electric Ind Co
Publication of BE905163A publication Critical patent/BE905163A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0097—Processing two or more printed circuits simultaneously, e.g. made from a common substrate, or temporarily stacked circuit boards
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0393—Flexible materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0264—Peeling insulating layer, e.g. foil, or separating mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1545—Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Le dispositif comprend : une section d'exposition, qui répète les opérations d'exposition d'un long support de formation d'image, dans l'état en grande longueur, et d'alimentation intermittente du long support, exposé; une section de liaison synchrone qui détecte une longueur du dit long support de formation d'image amené de manière intermittente depuis la dite section d'exposition et qui alimente en continu le dit long support de formation d'image; et une section de développement continu par décollement qui décolle en continu un support transparent et les parties non-exposées d'une couche de composition photopolymérisable du dit long support, pour y retenir les parties exposées de la couche de composition photopolymérisable.
BE0/216967A 1985-09-18 1986-07-24 Dispositif d'exposition-developpement pour long support. BE905163A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60206788A JPS6265046A (ja) 1985-09-18 1985-09-18 長尺基材用露光現像装置

Publications (1)

Publication Number Publication Date
BE905163A true BE905163A (fr) 1986-11-17

Family

ID=16529101

Family Applications (1)

Application Number Title Priority Date Filing Date
BE0/216967A BE905163A (fr) 1985-09-18 1986-07-24 Dispositif d'exposition-developpement pour long support.

Country Status (4)

Country Link
US (1) US4719495A (fr)
JP (1) JPS6265046A (fr)
BE (1) BE905163A (fr)
DE (1) DE3625182A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2892079B2 (ja) * 1990-02-21 1999-05-17 ウシオ電機株式会社 フィルム露光装置
JP3202935B2 (ja) * 1996-12-25 2001-08-27 日東電工株式会社 フレキシブル配線板及びその製造方法
JP3902169B2 (ja) * 2003-09-08 2007-04-04 日東電工株式会社 配線回路基板の製造方法および製造装置
US10349525B2 (en) 2013-10-30 2019-07-09 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Substrate comprising an electrical circuit pattern, method and system for providing same
WO2016035842A1 (fr) * 2014-09-04 2016-03-10 株式会社ニコン Système de traitement et procédé de fabrication de dispositif

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU470272B2 (en) * 1972-05-02 1976-03-11 Asahi Kasei Kogyo Kabushiki Kaisha Apparatus and process forthe production of photopolymer plates
JPS51116703A (en) * 1975-04-04 1976-10-14 Asahi Chemical Ind Method of producing photosensitive resin plate

Also Published As

Publication number Publication date
JPS6265046A (ja) 1987-03-24
DE3625182A1 (de) 1987-03-19
US4719495A (en) 1988-01-12

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: NITTO ELECTRIC INDUSTRIAL CO., LTD

Effective date: 19930731