BR0204352A - Processo para produzir um dispositivo micromecânico em multicamadas e dispositivo produzido pelo mesmo - Google Patents
Processo para produzir um dispositivo micromecânico em multicamadas e dispositivo produzido pelo mesmoInfo
- Publication number
- BR0204352A BR0204352A BR0204352-1A BR0204352A BR0204352A BR 0204352 A BR0204352 A BR 0204352A BR 0204352 A BR0204352 A BR 0204352A BR 0204352 A BR0204352 A BR 0204352A
- Authority
- BR
- Brazil
- Prior art keywords
- producing
- cavity
- produced
- multilayer
- sealing
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 5
- 239000000463 material Substances 0.000 abstract 4
- 238000007789 sealing Methods 0.000 abstract 3
- 239000011261 inert gas Substances 0.000 abstract 1
- 230000014759 maintenance of location Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00261—Processes for packaging MEMS devices
- B81C1/00277—Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS
- B81C1/00285—Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS using materials for controlling the level of pressure, contaminants or moisture inside of the package, e.g. getters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/01—Packaging MEMS
- B81C2203/0109—Bonding an individual cap on the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/03—Bonding two components
- B81C2203/031—Anodic bondings
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Micromachines (AREA)
- Pressure Sensors (AREA)
- Laminated Bodies (AREA)
Abstract
"PROCESSO PARA PRODUZIR UM DISPOSITIVO MICROMECâNICO EM MULTICAMADAS E DISPOSITIVO PRODUZIDO PELO MESMO". Um processo para produzir um dispositivo micromecânico em multicamadas. O dispositivo compreende uma cavidade interna contendo um componente micro-mecânico no seu interior. o processo compreende as etapas de formar o componente micro-mecânico de uma camada de um primeiro material, proporcionar uma camada de vedação sobre pelo menos uma superfície do primeiro material para definir a cavidade, proporcionar um material seq³estrante no interior da cavidade, selar o primeiro material às camadas de vedação por ligação anódica, fornecer um gás inerte à cavidade para regular a pressão no interior da cavidade. Um correspondente dispositivo produzido pelo processo é também apresentado.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP01309422A EP1310380A1 (en) | 2001-11-07 | 2001-11-07 | A micro-mechanical device and method for producing the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR0204352A true BR0204352A (pt) | 2003-09-16 |
Family
ID=8182435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR0204352-1A BR0204352A (pt) | 2001-11-07 | 2002-10-23 | Processo para produzir um dispositivo micromecânico em multicamadas e dispositivo produzido pelo mesmo |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20030085438A1 (pt) |
| EP (1) | EP1310380A1 (pt) |
| JP (1) | JP2003211399A (pt) |
| KR (1) | KR20030038353A (pt) |
| CN (1) | CN1417105A (pt) |
| BR (1) | BR0204352A (pt) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW533188B (en) | 2001-07-20 | 2003-05-21 | Getters Spa | Support for microelectronic, microoptoelectronic or micromechanical devices |
| TW583049B (en) * | 2001-07-20 | 2004-04-11 | Getters Spa | Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| KR100474455B1 (ko) * | 2002-11-08 | 2005-03-11 | 삼성전자주식회사 | 기판단위 mems 진공실장방법 및 장치 |
| EP1533270A1 (fr) | 2003-11-21 | 2005-05-25 | Asulab S.A. | Procédé de contrôle de l'herméticité d'une cavité close d'un composant micrométrique, et composant micrométrique pour sa mise en oeuvre |
| US7042076B2 (en) * | 2004-03-09 | 2006-05-09 | Northrop Grumman Corporation | Vacuum sealed microdevice packaging with getters |
| US7045885B1 (en) | 2004-12-09 | 2006-05-16 | Hewlett-Packard Development Company, L.P. | Placement of absorbing material in a semiconductor device |
| IL165948A0 (en) * | 2004-12-23 | 2006-01-15 | Rafael Armament Dev Authority | Chip packaging |
| EP1798196B1 (en) * | 2005-12-15 | 2017-08-09 | Infineon Technologies AG | Multi-layer device with reduced UV radiations during encapsulation |
| US8748206B2 (en) | 2010-11-23 | 2014-06-10 | Honeywell International Inc. | Systems and methods for a four-layer chip-scale MEMS device |
| US9171964B2 (en) | 2010-11-23 | 2015-10-27 | Honeywell International Inc. | Systems and methods for a three-layer chip-scale MEMS device |
| CN102556944B (zh) * | 2010-12-31 | 2014-11-05 | 中芯国际集成电路制造(上海)有限公司 | Mems装置的制作方法 |
| CN103502139B (zh) * | 2011-04-20 | 2016-04-27 | 卡文迪什动力有限公司 | 气态化学品向形成于中间介质层中的腔体内的注入以用于之后的热扩散释放 |
| US20130049143A1 (en) * | 2011-08-26 | 2013-02-28 | Qualcomm Mems Technologies, Inc. | Release activated thin film getter |
| US9557238B2 (en) * | 2014-07-25 | 2017-01-31 | Ams International Ag | Pressure sensor with geter embedded in membrane |
| CN112808344B (zh) * | 2021-03-03 | 2025-06-13 | 中国科学院理化技术研究所 | 一种真空低温装置的平衡调节结构和调节方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69409257T2 (de) * | 1993-12-13 | 1998-09-10 | Honeywell, Inc., Minneapolis, Minn. | Integrierte silizium-vakuum-mikropackung für infrarot-geräte |
| US5610438A (en) * | 1995-03-08 | 1997-03-11 | Texas Instruments Incorporated | Micro-mechanical device with non-evaporable getter |
| US5837935A (en) * | 1996-02-26 | 1998-11-17 | Ford Motor Company | Hermetic seal for an electronic component having a secondary chamber |
| US5701008A (en) * | 1996-11-29 | 1997-12-23 | He Holdings, Inc. | Integrated infrared microlens and gas molecule getter grating in a vacuum package |
| US6499354B1 (en) * | 1998-05-04 | 2002-12-31 | Integrated Sensing Systems (Issys), Inc. | Methods for prevention, reduction, and elimination of outgassing and trapped gases in micromachined devices |
-
2001
- 2001-11-07 EP EP01309422A patent/EP1310380A1/en not_active Withdrawn
-
2002
- 2002-09-30 US US10/260,913 patent/US20030085438A1/en not_active Abandoned
- 2002-10-02 KR KR1020020060182A patent/KR20030038353A/ko not_active Withdrawn
- 2002-10-23 BR BR0204352-1A patent/BR0204352A/pt not_active Application Discontinuation
- 2002-10-30 JP JP2002315617A patent/JP2003211399A/ja active Pending
- 2002-11-07 CN CN02149851A patent/CN1417105A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20030038353A (ko) | 2003-05-16 |
| EP1310380A1 (en) | 2003-05-14 |
| US20030085438A1 (en) | 2003-05-08 |
| CN1417105A (zh) | 2003-05-14 |
| JP2003211399A (ja) | 2003-07-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B11A | Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing | ||
| B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |