BR112018002995A2 - método e aparelho para derivar uma topografia de uma superfície de objeto - Google Patents
método e aparelho para derivar uma topografia de uma superfície de objetoInfo
- Publication number
- BR112018002995A2 BR112018002995A2 BR112018002995-5A BR112018002995A BR112018002995A2 BR 112018002995 A2 BR112018002995 A2 BR 112018002995A2 BR 112018002995 A BR112018002995 A BR 112018002995A BR 112018002995 A2 BR112018002995 A2 BR 112018002995A2
- Authority
- BR
- Brazil
- Prior art keywords
- object surface
- topography
- polarized light
- linearly polarized
- deriving
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02011—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal polarization variation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
- G01B9/02005—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using discrete frequency stepping or switching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02007—Two or more frequencies or sources used for interferometric measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
- G01B9/02078—Caused by ambiguity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02087—Combining two or more images of the same region
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/50—Depth or shape recovery
- G06T7/521—Depth or shape recovery from laser ranging, e.g. using interferometry; from the projection of structured light
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/50—Depth or shape recovery
- G06T7/55—Depth or shape recovery from multiple images
- G06T7/564—Depth or shape recovery from multiple images from contours
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/60—Analysis of geometric attributes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Theoretical Computer Science (AREA)
- Signal Processing (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
a presente invenção se refere a um método para derivar topografia de uma superfície de objeto (3). em concordância com a presente invenção, uma onda de luz linearmente polarizada (102a, 103a) é direcionada em direção da superfície de objeto (3) e de uma superfície de referência (2). imagens de onda de luz linearmente polarizada refletida (102b, 103b) para uma pluralidade de comprimentos de onda são obtidas. as imagens são obtidas para pelo menos quatro polarizações para cada uma da pluralidade de comprimentos de onda. a onda de luz linearmente polarizada refletida (102b, 103b) é um reflexo da onda de luz linearmente polarizada (102a, 103a) direcionada em direção da superfície de objeto (3) e da superfície de referência (2). a topografia da superfície de objeto (3) é obtida fundamentada sobre as imagens obtidas. a presente invenção também se refere a um aparelho (100) para derivar topografia de uma superfície de objeto (3).
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2015/068844 WO2017028896A1 (en) | 2015-08-17 | 2015-08-17 | Method and apparatus for deriving a topograpy of an object surface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR112018002995A2 true BR112018002995A2 (pt) | 2018-09-25 |
Family
ID=53887113
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR112018002995-5A BR112018002995A2 (pt) | 2015-08-17 | 2015-08-17 | método e aparelho para derivar uma topografia de uma superfície de objeto |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US11248899B2 (pt) |
| EP (1) | EP3338053B1 (pt) |
| JP (1) | JP2018525635A (pt) |
| KR (1) | KR20180041168A (pt) |
| CN (1) | CN107923735B (pt) |
| AU (1) | AU2015406086A1 (pt) |
| BR (1) | BR112018002995A2 (pt) |
| CA (1) | CA2995635A1 (pt) |
| WO (1) | WO2017028896A1 (pt) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2028788A (en) * | 2020-08-27 | 2022-04-29 | Asml Netherlands Bv | Compact dual pass interferometer for a plane mirror interferometer |
| EP4141379B1 (en) * | 2021-08-27 | 2025-10-01 | Mitutoyo Corporation | Method for improving a contrast of an interferogram in a polarizing fizeau interferometer |
| CN114739318A (zh) * | 2022-03-31 | 2022-07-12 | 杭州今誉信息科技有限公司 | 基于虚拟光学层析技术高速解析物体表面形貌的系统 |
| CN114577121B (zh) * | 2022-05-09 | 2022-09-06 | 中国科学技术大学 | 基于表面波定向性检测亚波长介质纳米线形貌的检测装置 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5488477A (en) * | 1993-11-15 | 1996-01-30 | Zygo Corporation | Methods and apparatus for profiling surfaces of transparent objects |
| US6028670A (en) * | 1998-01-19 | 2000-02-22 | Zygo Corporation | Interferometric methods and systems using low coherence illumination |
| US6188484B1 (en) * | 1998-10-29 | 2001-02-13 | Maxtor Corporation | Method and apparatus for measuring angular displacement of an actuator arm relative to a reference position |
| CA2277855A1 (fr) * | 1999-07-14 | 2001-01-14 | Solvision | Methode et systeme de mesure de la hauteur des billes de soudure d'un circuit imprime |
| US6304330B1 (en) * | 1999-10-06 | 2001-10-16 | Metrolaser, Inc. | Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry |
| US6788422B2 (en) * | 2001-04-17 | 2004-09-07 | Zygo Corporation | Method and apparatus for using quasi-stable light sources in interferometry applications |
| US6731380B2 (en) * | 2001-06-18 | 2004-05-04 | Applied Optics Center Of Delaware, Inc. | Method and apparatus for simultaneous measurement of the refractive index and thickness of thin films |
| US7158235B2 (en) * | 2001-12-05 | 2007-01-02 | Rudolph Technologies, Inc. | System and method for inspection using white light interferometry |
| NL1021457C2 (nl) * | 2002-09-13 | 2004-03-16 | Tno | Werkwijze voor het meten van contourvariaties. |
| US7230717B2 (en) * | 2003-08-28 | 2007-06-12 | 4D Technology Corporation | Pixelated phase-mask interferometer |
| JP2005189069A (ja) * | 2003-12-25 | 2005-07-14 | Sony Corp | 表面形状測定方法及び表面形状測定装置 |
| JP4357360B2 (ja) * | 2004-05-14 | 2009-11-04 | 富士通株式会社 | 表面形状測定方法及び表面形状測定装置 |
| CN100552375C (zh) | 2005-01-27 | 2009-10-21 | 4D技术公司 | 同时相移的斐索干涉仪 |
| JP4939765B2 (ja) * | 2005-03-28 | 2012-05-30 | 株式会社日立製作所 | 変位計測方法とその装置 |
| JP4538388B2 (ja) * | 2005-07-21 | 2010-09-08 | 株式会社ミツトヨ | 位相シフト干渉計 |
| JP2007114071A (ja) * | 2005-10-20 | 2007-05-10 | Omron Corp | 三次元形状計測装置、プログラム、コンピュータ読み取り可能な記録媒体、及び三次元形状計測方法 |
| GB2435092A (en) * | 2006-02-10 | 2007-08-15 | Taylor Hobson Ltd | Surface measurement instrument with adjustable sample support |
| US7619746B2 (en) * | 2007-07-19 | 2009-11-17 | Zygo Corporation | Generating model signals for interferometry |
| KR101294145B1 (ko) * | 2011-11-04 | 2013-08-16 | (주)마이크로모션텍 | 다파장을 이용한 위상 천이 간섭계 |
| US9377292B2 (en) * | 2013-08-06 | 2016-06-28 | Zygo Corporation | Interferometry employing refractive index dispersion broadening of interference signals |
-
2015
- 2015-08-17 CN CN201580082420.1A patent/CN107923735B/zh active Active
- 2015-08-17 CA CA2995635A patent/CA2995635A1/en not_active Abandoned
- 2015-08-17 US US15/753,177 patent/US11248899B2/en active Active
- 2015-08-17 JP JP2018508719A patent/JP2018525635A/ja active Pending
- 2015-08-17 AU AU2015406086A patent/AU2015406086A1/en not_active Abandoned
- 2015-08-17 WO PCT/EP2015/068844 patent/WO2017028896A1/en not_active Ceased
- 2015-08-17 EP EP15753009.8A patent/EP3338053B1/en active Active
- 2015-08-17 KR KR1020187007216A patent/KR20180041168A/ko not_active Withdrawn
- 2015-08-17 BR BR112018002995-5A patent/BR112018002995A2/pt not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2018525635A (ja) | 2018-09-06 |
| CA2995635A1 (en) | 2017-02-23 |
| AU2015406086A1 (en) | 2018-04-12 |
| CN107923735B (zh) | 2020-06-16 |
| US20180238676A1 (en) | 2018-08-23 |
| EP3338053B1 (en) | 2019-12-04 |
| WO2017028896A1 (en) | 2017-02-23 |
| KR20180041168A (ko) | 2018-04-23 |
| US11248899B2 (en) | 2022-02-15 |
| EP3338053A1 (en) | 2018-06-27 |
| CN107923735A (zh) | 2018-04-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
| B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |