BR112018002995A2 - método e aparelho para derivar uma topografia de uma superfície de objeto - Google Patents

método e aparelho para derivar uma topografia de uma superfície de objeto

Info

Publication number
BR112018002995A2
BR112018002995A2 BR112018002995-5A BR112018002995A BR112018002995A2 BR 112018002995 A2 BR112018002995 A2 BR 112018002995A2 BR 112018002995 A BR112018002995 A BR 112018002995A BR 112018002995 A2 BR112018002995 A2 BR 112018002995A2
Authority
BR
Brazil
Prior art keywords
object surface
topography
polarized light
linearly polarized
deriving
Prior art date
Application number
BR112018002995-5A
Other languages
English (en)
Inventor
Bååth Lars
Original Assignee
Qso Interferometer Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qso Interferometer Systems Ab filed Critical Qso Interferometer Systems Ab
Publication of BR112018002995A2 publication Critical patent/BR112018002995A2/pt

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02001Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02011Interferometers characterised by controlling or generating intrinsic radiation properties using temporal polarization variation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02001Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02005Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using discrete frequency stepping or switching
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02001Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007Two or more frequencies or sources used for interferometric measurement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056Passive reduction of errors
    • G01B9/02057Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078Caused by ambiguity
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02083Interferometers characterised by particular signal processing and presentation
    • G01B9/02087Combining two or more images of the same region
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/50Depth or shape recovery
    • G06T7/521Depth or shape recovery from laser ranging, e.g. using interferometry; from the projection of structured light
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/50Depth or shape recovery
    • G06T7/55Depth or shape recovery from multiple images
    • G06T7/564Depth or shape recovery from multiple images from contours
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/60Analysis of geometric attributes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Signal Processing (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

a presente invenção se refere a um método para derivar topografia de uma superfície de objeto (3). em concordância com a presente invenção, uma onda de luz linearmente polarizada (102a, 103a) é direcionada em direção da superfície de objeto (3) e de uma superfície de referência (2). imagens de onda de luz linearmente polarizada refletida (102b, 103b) para uma pluralidade de comprimentos de onda são obtidas. as imagens são obtidas para pelo menos quatro polarizações para cada uma da pluralidade de comprimentos de onda. a onda de luz linearmente polarizada refletida (102b, 103b) é um reflexo da onda de luz linearmente polarizada (102a, 103a) direcionada em direção da superfície de objeto (3) e da superfície de referência (2). a topografia da superfície de objeto (3) é obtida fundamentada sobre as imagens obtidas. a presente invenção também se refere a um aparelho (100) para derivar topografia de uma superfície de objeto (3).
BR112018002995-5A 2015-08-17 2015-08-17 método e aparelho para derivar uma topografia de uma superfície de objeto BR112018002995A2 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2015/068844 WO2017028896A1 (en) 2015-08-17 2015-08-17 Method and apparatus for deriving a topograpy of an object surface

Publications (1)

Publication Number Publication Date
BR112018002995A2 true BR112018002995A2 (pt) 2018-09-25

Family

ID=53887113

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112018002995-5A BR112018002995A2 (pt) 2015-08-17 2015-08-17 método e aparelho para derivar uma topografia de uma superfície de objeto

Country Status (9)

Country Link
US (1) US11248899B2 (pt)
EP (1) EP3338053B1 (pt)
JP (1) JP2018525635A (pt)
KR (1) KR20180041168A (pt)
CN (1) CN107923735B (pt)
AU (1) AU2015406086A1 (pt)
BR (1) BR112018002995A2 (pt)
CA (1) CA2995635A1 (pt)
WO (1) WO2017028896A1 (pt)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2028788A (en) * 2020-08-27 2022-04-29 Asml Netherlands Bv Compact dual pass interferometer for a plane mirror interferometer
EP4141379B1 (en) * 2021-08-27 2025-10-01 Mitutoyo Corporation Method for improving a contrast of an interferogram in a polarizing fizeau interferometer
CN114739318A (zh) * 2022-03-31 2022-07-12 杭州今誉信息科技有限公司 基于虚拟光学层析技术高速解析物体表面形貌的系统
CN114577121B (zh) * 2022-05-09 2022-09-06 中国科学技术大学 基于表面波定向性检测亚波长介质纳米线形貌的检测装置

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US5488477A (en) * 1993-11-15 1996-01-30 Zygo Corporation Methods and apparatus for profiling surfaces of transparent objects
US6028670A (en) * 1998-01-19 2000-02-22 Zygo Corporation Interferometric methods and systems using low coherence illumination
US6188484B1 (en) * 1998-10-29 2001-02-13 Maxtor Corporation Method and apparatus for measuring angular displacement of an actuator arm relative to a reference position
CA2277855A1 (fr) * 1999-07-14 2001-01-14 Solvision Methode et systeme de mesure de la hauteur des billes de soudure d'un circuit imprime
US6304330B1 (en) * 1999-10-06 2001-10-16 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
US6788422B2 (en) * 2001-04-17 2004-09-07 Zygo Corporation Method and apparatus for using quasi-stable light sources in interferometry applications
US6731380B2 (en) * 2001-06-18 2004-05-04 Applied Optics Center Of Delaware, Inc. Method and apparatus for simultaneous measurement of the refractive index and thickness of thin films
US7158235B2 (en) * 2001-12-05 2007-01-02 Rudolph Technologies, Inc. System and method for inspection using white light interferometry
NL1021457C2 (nl) * 2002-09-13 2004-03-16 Tno Werkwijze voor het meten van contourvariaties.
US7230717B2 (en) * 2003-08-28 2007-06-12 4D Technology Corporation Pixelated phase-mask interferometer
JP2005189069A (ja) * 2003-12-25 2005-07-14 Sony Corp 表面形状測定方法及び表面形状測定装置
JP4357360B2 (ja) * 2004-05-14 2009-11-04 富士通株式会社 表面形状測定方法及び表面形状測定装置
CN100552375C (zh) 2005-01-27 2009-10-21 4D技术公司 同时相移的斐索干涉仪
JP4939765B2 (ja) * 2005-03-28 2012-05-30 株式会社日立製作所 変位計測方法とその装置
JP4538388B2 (ja) * 2005-07-21 2010-09-08 株式会社ミツトヨ 位相シフト干渉計
JP2007114071A (ja) * 2005-10-20 2007-05-10 Omron Corp 三次元形状計測装置、プログラム、コンピュータ読み取り可能な記録媒体、及び三次元形状計測方法
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Also Published As

Publication number Publication date
JP2018525635A (ja) 2018-09-06
CA2995635A1 (en) 2017-02-23
AU2015406086A1 (en) 2018-04-12
CN107923735B (zh) 2020-06-16
US20180238676A1 (en) 2018-08-23
EP3338053B1 (en) 2019-12-04
WO2017028896A1 (en) 2017-02-23
KR20180041168A (ko) 2018-04-23
US11248899B2 (en) 2022-02-15
EP3338053A1 (en) 2018-06-27
CN107923735A (zh) 2018-04-17

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Legal Events

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B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B11B Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements