BR9814771A - Disposição para revestimento a vácuo de mancais deslizantes - Google Patents
Disposição para revestimento a vácuo de mancais deslizantesInfo
- Publication number
- BR9814771A BR9814771A BR9814771-4A BR9814771A BR9814771A BR 9814771 A BR9814771 A BR 9814771A BR 9814771 A BR9814771 A BR 9814771A BR 9814771 A BR9814771 A BR 9814771A
- Authority
- BR
- Brazil
- Prior art keywords
- coating
- several
- conveyance
- chambers
- slide bearings
- Prior art date
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract 2
- 238000000576 coating method Methods 0.000 abstract 5
- 239000011248 coating agent Substances 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 2
- 238000000889 atomisation Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 238000005496 tempering Methods 0.000 abstract 1
- 238000011144 upstream manufacturing Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
- F16C33/02—Parts of sliding-contact bearings
- F16C33/04—Brasses; Bushes; Linings
- F16C33/06—Sliding surface mainly made of metal
- F16C33/14—Special methods of manufacture; Running-in
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Sliding-Contact Bearings (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Compressor (AREA)
- Spray Control Apparatus (AREA)
Abstract
Patente de Invenção: <B>"DISPOSIçãO PARA REVESTIMENTO A VáCUO DE MANCAIS DESLIZANTES"<D>. As disposições conhecidas para revestimento a vácuo de substratos de forma diferente, quer como instalações de circulação ou de carga, estão equipadas de tal modo que várias camadas são aplicadas de acordo com um processo de revestimento. Os mancais deslizantes são dotados de várias camadas e os materiais de revestimento utilizados e as condições relacionadas aos mesmos requerem a aplicação de várias tecnologias de revestimento. Isto se refere, entre outros, aos parâmetros de transporte. Instalações conhecidas não permitem que essas exigências sejam atendidas. De acordo com a invenção, uma disposição desse tipo consiste em várias câmaras de processo, que estão enfileiradas. Pelas mesmas são movidos mancais deslizantes sustentados com fecho devido à forma e devido à força em corpos de suporte temperáveis, por uma câmara de tratamento prévio, de pulverização e de catodização, com um regime de transporte adaptado ao processo. Ao caminho de revestimento está ligado previamente um dispositivo de regulagem de temperatura para os corpos de suporte. Respectivamente uma passagem de entrada e de saída possibilitam o transporte de ar a ar.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19753656A DE19753656C1 (de) | 1997-12-03 | 1997-12-03 | Einrichtung zur Vakuumbeschichtung von Gleitlagern |
| PCT/DE1998/003455 WO1999028523A1 (de) | 1997-12-03 | 1998-11-19 | Einrichtung zur vakuumbeschichtung von gleitlagern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR9814771A true BR9814771A (pt) | 2000-10-03 |
Family
ID=7850630
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR9814771-4A BR9814771A (pt) | 1997-12-03 | 1998-11-19 | Disposição para revestimento a vácuo de mancais deslizantes |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US6444086B1 (pt) |
| EP (1) | EP1036212B1 (pt) |
| JP (1) | JP2001525490A (pt) |
| KR (1) | KR100532031B1 (pt) |
| CN (1) | CN1177950C (pt) |
| AT (2) | ATE202160T1 (pt) |
| BR (1) | BR9814771A (pt) |
| CZ (1) | CZ293929B6 (pt) |
| DE (2) | DE19753656C1 (pt) |
| ES (1) | ES2158704T3 (pt) |
| PL (1) | PL187394B1 (pt) |
| PT (1) | PT1036212E (pt) |
| RU (1) | RU2221080C2 (pt) |
| SK (1) | SK285253B6 (pt) |
| TR (1) | TR200001348T2 (pt) |
| WO (1) | WO1999028523A1 (pt) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10065709B4 (de) * | 2000-12-29 | 2005-10-27 | Sturm Jun., Wilhelm | Beschichtungsanlage |
| DE10205168A1 (de) * | 2002-02-07 | 2003-08-21 | Ardenne Anlagentech Gmbh | Verfahren zur Zwischenbehandlung von Substraten in einer In-Line-Vakuumbeschichtungsanlage |
| CN101469403B (zh) * | 2003-02-18 | 2011-11-23 | 松下电器产业株式会社 | 等离子体显示屏的基板保持件 |
| CN100479082C (zh) * | 2003-04-04 | 2009-04-15 | 松下电器产业株式会社 | 等离子体显示面板的制造方法 |
| DE10324570A1 (de) * | 2003-05-30 | 2004-12-23 | Daimlerchrysler Ag | Vorrichtung und Verfahren zur Oberflächenbehandlung einer metallischen Laufbahn einer Maschine mittels Plasmatechnologie |
| RU2006105789A (ru) * | 2004-05-25 | 2007-10-10 | Эпплайд Матириалз Гмбх Энд Ко.Кг (De) | Установка для обработки ленточного материала |
| CN1304628C (zh) * | 2004-08-31 | 2007-03-14 | 成建波 | 真空线源蒸发镀膜方法及其装置 |
| WO2006100968A1 (ja) | 2005-03-18 | 2006-09-28 | Ulvac, Inc. | 成膜方法及び成膜装置並びに永久磁石及び永久磁石の製造方法 |
| AT501722B1 (de) | 2005-07-12 | 2006-11-15 | Miba Gleitlager Gmbh | Beschichtungsverfahren |
| CN100595320C (zh) * | 2005-11-16 | 2010-03-24 | 比亚迪股份有限公司 | 一种真空镀膜方法和系统 |
| CN1970828B (zh) * | 2005-11-26 | 2010-05-26 | 鸿富锦精密工业(深圳)有限公司 | 在模具上形成多层镀膜的方法 |
| CN101144149B (zh) * | 2006-09-11 | 2010-12-22 | 柏腾科技股份有限公司 | 无时间延迟的连续式真空制程设备及真空加工方法 |
| JP5069956B2 (ja) * | 2007-06-25 | 2012-11-07 | 株式会社神戸製鋼所 | 成膜装置 |
| DE102007049669A1 (de) * | 2007-10-17 | 2009-04-23 | Sms Demag Ag | Schleusenvorrichtung und Verfahren zum Öffnen der Schleusenvorrichtung |
| RU2349829C1 (ru) * | 2007-12-27 | 2009-03-20 | Евгений Алексеевич Деулин | Устройство для нанесения защитных покрытий на внутреннюю поверхность магистральных трубопроводов |
| CN101608301B (zh) * | 2009-06-24 | 2011-12-07 | 江苏常松机械集团有限公司 | 连续真空等离子蒸发金属复合材料生产线 |
| JP5244723B2 (ja) * | 2009-07-10 | 2013-07-24 | 株式会社日立ハイテクノロジーズ | 成膜装置 |
| CN102703867A (zh) * | 2012-01-13 | 2012-10-03 | 东莞宏威数码机械有限公司 | 电子轰击镀膜机 |
| CN103866255B (zh) * | 2014-03-10 | 2016-04-27 | 江西沃格光电股份有限公司 | 磁控溅射镀膜系统 |
| US10371244B2 (en) | 2015-04-09 | 2019-08-06 | United Technologies Corporation | Additive manufactured gear for a geared architecture gas turbine engine |
| TWM557347U (zh) * | 2017-07-21 | 2018-03-21 | Guay Guay Trading Co Ltd | 彈匣氣體加熱結構 |
| CN117966103B (zh) * | 2024-02-04 | 2024-06-18 | 浙江晟霖益嘉科技有限公司 | 一种蒸发真空设备生产线 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4072985A (en) * | 1977-05-04 | 1978-02-07 | Rca Corporation | Video disc with a dielectric layer formed from styrene and nitrogen |
| JPH06105742B2 (ja) * | 1983-11-28 | 1994-12-21 | 株式会社日立製作所 | 真空処理方法及び装置 |
| JPS60141869A (ja) * | 1983-12-29 | 1985-07-26 | Nissin Electric Co Ltd | 膜形成方法および膜形成装置 |
| JPS61105853A (ja) * | 1984-10-30 | 1986-05-23 | Anelva Corp | オ−トロ−ダ− |
| JPS61106768A (ja) * | 1984-10-31 | 1986-05-24 | Anelva Corp | 基体処理装置 |
| DE3606529A1 (de) * | 1986-02-28 | 1987-09-03 | Glyco Metall Werke | Verfahren zur herstellung von schichtwerkstoff oder schichtwerkstuecken durch aufdampfen mindestens eines metallischen werkstoffes auf ein metallisches substrat |
| DE3717712A1 (de) * | 1987-05-26 | 1988-12-15 | Leybold Ag | Vorrichtung zur halterung von werkstuecken |
| US4904362A (en) | 1987-07-24 | 1990-02-27 | Miba Gleitlager Aktiengesellschaft | Bar-shaped magnetron or sputter cathode arrangement |
| AT392291B (de) * | 1987-09-01 | 1991-02-25 | Miba Gleitlager Ag | Stabfoermige sowie magnetron- bzw. sputterkathodenanordnung, sputterverfahren, und vorrichtung zur durchfuehrung des verfahrens |
| US4911810A (en) * | 1988-06-21 | 1990-03-27 | Brown University | Modular sputtering apparatus |
| JPH07110991B2 (ja) * | 1989-10-02 | 1995-11-29 | 株式会社日立製作所 | プラズマ処理装置およびプラズマ処理方法 |
| SU1751506A1 (ru) * | 1990-04-04 | 1992-07-30 | Харьковский авиационный институт им.Н.Е.Жуковского | Узел трени скольжени |
| US5236509A (en) * | 1992-02-06 | 1993-08-17 | Spire Corporation | Modular ibad apparatus for continuous coating |
| RU2038417C1 (ru) * | 1992-06-22 | 1995-06-27 | Бурков Сергей Геннадьевич | Устройство для нанесения покрытий на изделия в вакууме |
| US5377816A (en) * | 1993-07-15 | 1995-01-03 | Materials Research Corp. | Spiral magnetic linear translating mechanism |
| JP3654597B2 (ja) * | 1993-07-15 | 2005-06-02 | 株式会社ルネサステクノロジ | 製造システムおよび製造方法 |
| JP3732250B2 (ja) * | 1995-03-30 | 2006-01-05 | キヤノンアネルバ株式会社 | インライン式成膜装置 |
| DE19514836C2 (de) * | 1995-04-21 | 2000-06-08 | Fraunhofer Ges Forschung | Lagerschale |
| US5958134A (en) * | 1995-06-07 | 1999-09-28 | Tokyo Electron Limited | Process equipment with simultaneous or sequential deposition and etching capabilities |
| DE19537092C1 (de) * | 1995-10-05 | 1996-07-11 | Ardenne Anlagentech Gmbh | Elektronenstrahl-Bedampfungsanlage im Durchlaufbetrieb für thermisch hoch belastete Substrate |
| RU2095467C1 (ru) * | 1995-12-27 | 1997-11-10 | Государственный космический научно-производственный центр им.М.В.Хруничева | Многопучковая установка для ионно-плазменной обработки поверхности деталей |
-
1997
- 1997-12-03 DE DE19753656A patent/DE19753656C1/de not_active Expired - Fee Related
-
1998
- 1998-11-19 WO PCT/DE1998/003455 patent/WO1999028523A1/de not_active Ceased
- 1998-11-19 SK SK830-2000A patent/SK285253B6/sk unknown
- 1998-11-19 CN CNB988113120A patent/CN1177950C/zh not_active Expired - Fee Related
- 1998-11-19 JP JP2000523393A patent/JP2001525490A/ja active Pending
- 1998-11-19 PT PT81101988T patent/PT1036212E/pt unknown
- 1998-11-19 RU RU2000117466/02A patent/RU2221080C2/ru not_active IP Right Cessation
- 1998-11-19 AT AT98963374T patent/ATE202160T1/de not_active IP Right Cessation
- 1998-11-19 CZ CZ20001932A patent/CZ293929B6/cs not_active IP Right Cessation
- 1998-11-19 KR KR10-2000-7005948A patent/KR100532031B1/ko not_active Expired - Fee Related
- 1998-11-19 BR BR9814771-4A patent/BR9814771A/pt not_active IP Right Cessation
- 1998-11-19 US US09/555,905 patent/US6444086B1/en not_active Expired - Fee Related
- 1998-11-19 DE DE59800874T patent/DE59800874D1/de not_active Expired - Lifetime
- 1998-11-19 AT AT0912298A patent/AT407995B/de not_active IP Right Cessation
- 1998-11-19 PL PL98340722A patent/PL187394B1/pl not_active IP Right Cessation
- 1998-11-19 EP EP98963374A patent/EP1036212B1/de not_active Expired - Lifetime
- 1998-11-19 TR TR2000/01348T patent/TR200001348T2/xx unknown
- 1998-11-19 ES ES98963374T patent/ES2158704T3/es not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| KR20010032666A (ko) | 2001-04-25 |
| CN1177950C (zh) | 2004-12-01 |
| PL340722A1 (en) | 2001-02-26 |
| PL187394B1 (pl) | 2004-06-30 |
| WO1999028523A1 (de) | 1999-06-10 |
| SK285253B6 (sk) | 2006-09-07 |
| PT1036212E (pt) | 2001-11-30 |
| EP1036212B1 (de) | 2001-06-13 |
| CN1279728A (zh) | 2001-01-10 |
| DE19753656C1 (de) | 1998-12-03 |
| DE59800874D1 (de) | 2001-07-19 |
| ATA912298A (de) | 2000-12-15 |
| KR100532031B1 (ko) | 2005-11-29 |
| AT407995B (de) | 2001-07-25 |
| CZ293929B6 (cs) | 2004-08-18 |
| SK8302000A3 (en) | 2001-01-18 |
| TR200001348T2 (tr) | 2000-11-21 |
| ES2158704T3 (es) | 2001-09-01 |
| RU2221080C2 (ru) | 2004-01-10 |
| JP2001525490A (ja) | 2001-12-11 |
| CZ20001932A3 (cs) | 2000-09-13 |
| US6444086B1 (en) | 2002-09-03 |
| EP1036212A1 (de) | 2000-09-20 |
| ATE202160T1 (de) | 2001-06-15 |
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