BRPI0407697B1 - composição sensìvel á radiação, elemento sensìvel à radiação, processo para formar imagem em um elemento sensìvel à radiação, elemento convertido em imagem, processo para produzir um elemento sensìvel à radiação, e, uso de uma composição sensìvel à radiação. - Google Patents
composição sensìvel á radiação, elemento sensìvel à radiação, processo para formar imagem em um elemento sensìvel à radiação, elemento convertido em imagem, processo para produzir um elemento sensìvel à radiação, e, uso de uma composição sensìvel à radiação.Info
- Publication number
- BRPI0407697B1 BRPI0407697B1 BRPI0407697-4A BRPI0407697A BRPI0407697B1 BR PI0407697 B1 BRPI0407697 B1 BR PI0407697B1 BR PI0407697 A BRPI0407697 A BR PI0407697A BR PI0407697 B1 BRPI0407697 B1 BR PI0407697B1
- Authority
- BR
- Brazil
- Prior art keywords
- radiation sensitive
- image
- sensitive element
- composition
- produce
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title 5
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10307453A DE10307453B4 (de) | 2003-02-21 | 2003-02-21 | Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente |
| PCT/EP2004/001706 WO2004074930A2 (en) | 2003-02-21 | 2004-02-20 | Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BRPI0407697A BRPI0407697A (pt) | 2006-03-01 |
| BRPI0407697B1 true BRPI0407697B1 (pt) | 2012-05-15 |
Family
ID=32863853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0407697-4A BRPI0407697B1 (pt) | 2003-02-21 | 2004-02-20 | composição sensìvel á radiação, elemento sensìvel à radiação, processo para formar imagem em um elemento sensìvel à radiação, elemento convertido em imagem, processo para produzir um elemento sensìvel à radiação, e, uso de uma composição sensìvel à radiação. |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7442486B2 (pt) |
| EP (1) | EP1595183B1 (pt) |
| JP (1) | JP4598755B2 (pt) |
| CN (1) | CN1751270B (pt) |
| BR (1) | BRPI0407697B1 (pt) |
| DE (1) | DE10307453B4 (pt) |
| WO (1) | WO2004074930A2 (pt) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10356847B4 (de) * | 2003-12-05 | 2005-10-06 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente |
| JP4469741B2 (ja) * | 2005-03-03 | 2010-05-26 | 富士フイルム株式会社 | 平版印刷版原版 |
| KR101222947B1 (ko) | 2005-06-30 | 2013-01-17 | 엘지디스플레이 주식회사 | 인쇄용 용제, 및 그를 이용한 인쇄용 패턴 조성물 및 패턴 형성방법 |
| JP4820640B2 (ja) * | 2005-12-20 | 2011-11-24 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| WO2008129981A1 (ja) * | 2007-04-18 | 2008-10-30 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版材料 |
| WO2008145530A1 (en) * | 2007-05-25 | 2008-12-04 | Agfa Graphics Nv | A lithographic printing plate precursor |
| CN101681108B (zh) * | 2007-05-25 | 2013-05-01 | 爱克发印艺公司 | 平版印刷印版前体 |
| WO2009054238A1 (ja) * | 2007-10-23 | 2009-04-30 | Konica Minolta Medical & Graphic, Inc. | 平版印刷版材料 |
| US7858292B2 (en) | 2007-12-04 | 2010-12-28 | Eastman Kodak Company | Imageable elements with components having 1H-tetrazole groups |
| JP4982416B2 (ja) * | 2008-03-28 | 2012-07-25 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| US8124328B2 (en) | 2008-05-20 | 2012-02-28 | Eastman Kodak Company | Methods for imaging and processing positive-working imageable elements |
| CN102132218A (zh) | 2008-08-22 | 2011-07-20 | 富士胶片株式会社 | 制备平版印刷版的方法 |
| JP5364513B2 (ja) | 2008-09-12 | 2013-12-11 | 富士フイルム株式会社 | 平版印刷版原版用現像液及び平版印刷版の製造方法 |
| JP5466462B2 (ja) | 2008-09-18 | 2014-04-09 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の製造方法及び平版印刷版 |
| JP2010102322A (ja) | 2008-09-26 | 2010-05-06 | Fujifilm Corp | 平版印刷版の製版方法 |
| EP2194429A1 (en) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
| EP2196851A1 (en) | 2008-12-12 | 2010-06-16 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties |
| US20100151385A1 (en) | 2008-12-17 | 2010-06-17 | Ray Kevin B | Stack of negative-working imageable elements |
| US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
| US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
| US8318405B2 (en) | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
| US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
| US8257907B2 (en) | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
| EP2284005B1 (en) | 2009-08-10 | 2012-05-02 | Eastman Kodak Company | Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers |
| US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
| EP2293144B1 (en) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Method of drying lithographic printing plates after single-step-processing |
| US8329383B2 (en) | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
| US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
| US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
| US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8703381B2 (en) | 2011-08-31 | 2014-04-22 | Eastman Kodak Company | Lithographic printing plate precursors for on-press development |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| US8927197B2 (en) | 2012-11-16 | 2015-01-06 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| EP2735903B1 (en) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a hyperbranched binder material |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP2778782B1 (en) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| US20170021656A1 (en) | 2015-07-24 | 2017-01-26 | Kevin Ray | Lithographic imaging and printing with negative-working photoresponsive printing members |
| US11745840B1 (en) * | 2019-09-12 | 2023-09-05 | The United States Of America As Represented By The Secretary Of The Navy | Apparatus and method for joining modules in a field configurable autonomous vehicle |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1165570A (en) * | 1966-12-08 | 1969-10-01 | Agfa Gevaert Nv | Photopolymerization of Ethylenically Unsaturated Compounds |
| DE3021590A1 (de) * | 1980-06-09 | 1981-12-17 | Hoechst Ag, 6000 Frankfurt | 4-halogen-5-(halogenmethyl-phenyl)-oxazol-derivate, ein verfahren zu ihrer herstellung und sie enthaltenden strahlungsempfindliche massen |
| JPS62180355A (ja) | 1986-02-05 | 1987-08-07 | Daicel Chem Ind Ltd | 光重合性組成物 |
| DE3706880A1 (de) * | 1987-03-04 | 1988-09-15 | Hoechst Ag | 4-chloroxazol-derivate, verfahren zu ihrer herstellung und ihre verwendung |
| JPH01229003A (ja) * | 1988-03-09 | 1989-09-12 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| DE19518118C2 (de) * | 1995-05-17 | 1998-06-18 | Sun Chemical Corp | Lichtempfindliche Zusammensetzung |
| US6376144B1 (en) * | 2000-08-03 | 2002-04-23 | Kodak Polychrome Graphics, Llc | Organic photoconductive composition |
| JP3832248B2 (ja) * | 2001-01-26 | 2006-10-11 | 三菱化学株式会社 | 光重合性組成物及びカラーフィルター |
| DE10356847B4 (de) * | 2003-12-05 | 2005-10-06 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente |
-
2003
- 2003-02-21 DE DE10307453A patent/DE10307453B4/de not_active Expired - Fee Related
-
2004
- 2004-02-20 EP EP04713069A patent/EP1595183B1/en not_active Expired - Lifetime
- 2004-02-20 CN CN2004800048236A patent/CN1751270B/zh not_active Expired - Fee Related
- 2004-02-20 WO PCT/EP2004/001706 patent/WO2004074930A2/en not_active Ceased
- 2004-02-20 JP JP2006501915A patent/JP4598755B2/ja not_active Expired - Fee Related
- 2004-02-20 US US10/544,758 patent/US7442486B2/en not_active Expired - Lifetime
- 2004-02-20 BR BRPI0407697-4A patent/BRPI0407697B1/pt not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| BRPI0407697A (pt) | 2006-03-01 |
| JP4598755B2 (ja) | 2010-12-15 |
| WO2004074930A2 (en) | 2004-09-02 |
| DE10307453B4 (de) | 2005-07-21 |
| US7442486B2 (en) | 2008-10-28 |
| WO2004074930A3 (en) | 2005-02-03 |
| US20060234155A1 (en) | 2006-10-19 |
| JP2006519405A (ja) | 2006-08-24 |
| EP1595183A2 (en) | 2005-11-16 |
| DE10307453A1 (de) | 2004-09-16 |
| EP1595183B1 (en) | 2012-10-03 |
| CN1751270B (zh) | 2011-03-09 |
| CN1751270A (zh) | 2006-03-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 20/02/2004, OBSERVADAS AS CONDICOES LEGAIS. |
|
| B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time |
Free format text: REFERENTE A 13A ANUIDADE. |
|
| B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |