BRPI0413182A - poliuretano linear, composição, moldagem, material, processo para a produção de máscara de solda sobre um circuito impresso, e, uso da composição - Google Patents
poliuretano linear, composição, moldagem, material, processo para a produção de máscara de solda sobre um circuito impresso, e, uso da composiçãoInfo
- Publication number
- BRPI0413182A BRPI0413182A BRPI0413182-7A BRPI0413182A BRPI0413182A BR PI0413182 A BRPI0413182 A BR PI0413182A BR PI0413182 A BRPI0413182 A BR PI0413182A BR PI0413182 A BRPI0413182 A BR PI0413182A
- Authority
- BR
- Brazil
- Prior art keywords
- composition
- production
- molding
- printed circuit
- carbon atoms
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- 229920002635 polyurethane Polymers 0.000 title abstract 3
- 239000004814 polyurethane Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- -1 molding Substances 0.000 title abstract 2
- 238000000465 moulding Methods 0.000 title abstract 2
- 239000000463 material Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000003466 welding Methods 0.000 title 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- 125000001931 aliphatic group Chemical group 0.000 abstract 2
- 150000002009 diols Chemical class 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000004132 cross linking Methods 0.000 abstract 1
- 125000005442 diisocyanate group Chemical group 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/83—Chemically modified polymers
- C08G18/831—Chemically modified polymers by oxygen-containing compounds inclusive of carbonic acid halogenides, carboxylic acid halogenides and epoxy halides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/0804—Manufacture of polymers containing ionic or ionogenic groups
- C08G18/0819—Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups
- C08G18/0823—Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups containing carboxylate salt groups or groups forming them
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
- C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
- C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
- C08G18/6666—Compounds of group C08G18/48 or C08G18/52
- C08G18/6692—Compounds of group C08G18/48 or C08G18/52 with compounds of group C08G18/34
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/69—Polymers of conjugated dienes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polyurethanes Or Polyureas (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Ink Jet (AREA)
- Materials For Medical Uses (AREA)
Abstract
"POLIURETANO LINEAR, COMPOSIçãO, MOLDAGEM, MATERIAL, PROCESSO PARA A PRODUçãO DE MáSCARAS DE SOLDA SOBRE UM CIRCUITO IMPRESSO, E, USO DA COMPOSIçãO". Poliuretanos lineares reticuláveis obtidos de (a) pelo menos um diisocianato possuindo 2 a 30 átomos de carbono, (b) pelo menos um diol alifático ou cicloalifático possuindo 2 a 30 átomos de carbono, em cuja cadeia de carbonos está ligado pelo menos um grupo carboxila, e alguns dos ou todos os citados grupos carboxila têm sido esterificados com álcool C~ 3~-C~ 8~ olefinicamente insaturado ou com o glidicil-éster de um ácido carboxílico C~ 3~C~ 8~ olefinicamente insaturado, e (c) opcionalmente pelo menos um diol alifático ou cicloalifático possuindo 2 a 30 átomos de carbono, em cuja cadeia de carbonos está ligado pelo menos um grupo carboxila. Os poliuretanos são adequados, sozinhos ou em uma mistura com outros componentes reativos, para reticulação térmica e/ou fotoquímica em composições reticuláveis para a produção de moldagens, revestimentos e em particular máscaras de solda.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH13632003 | 2003-08-07 | ||
| PCT/EP2004/051709 WO2005014682A1 (en) | 2003-08-07 | 2004-08-04 | Photocrosslinkable polyurethanes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BRPI0413182A true BRPI0413182A (pt) | 2006-10-03 |
Family
ID=34120759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0413182-7A BRPI0413182A (pt) | 2003-08-07 | 2004-08-04 | poliuretano linear, composição, moldagem, material, processo para a produção de máscara de solda sobre um circuito impresso, e, uso da composição |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US7476484B2 (pt) |
| EP (1) | EP1651695B1 (pt) |
| JP (1) | JP5069465B2 (pt) |
| KR (2) | KR101289598B1 (pt) |
| CN (1) | CN100573325C (pt) |
| AT (1) | ATE421545T1 (pt) |
| BR (1) | BRPI0413182A (pt) |
| CA (1) | CA2532440A1 (pt) |
| DE (1) | DE602004019217D1 (pt) |
| ES (1) | ES2318324T3 (pt) |
| TW (1) | TWI349680B (pt) |
| WO (1) | WO2005014682A1 (pt) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024239159A1 (zh) * | 2023-05-19 | 2024-11-28 | 宁德时代新能源科技股份有限公司 | 分散剂及其制备方法、正极浆料、正极极片及其制备方法、电池单体、电池和用电装置 |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4596544B2 (ja) * | 2005-03-07 | 2010-12-08 | 昭和電工株式会社 | カルボキシル基含有ポリウレタン |
| WO2007066630A1 (ja) * | 2005-12-06 | 2007-06-14 | Nok Corporation | ロッドシーリングシステム |
| JP5265854B2 (ja) * | 2005-12-08 | 2013-08-14 | 昭和電工株式会社 | 熱硬化性樹脂組成物、熱可塑性樹脂溶液および皮膜形成材料ならびにこれらの硬化物 |
| KR100984592B1 (ko) * | 2006-03-16 | 2010-09-30 | 쇼와 덴코 가부시키가이샤 | 열경화성 수지 조성물, 연성 회로 기판용 오버코팅제 및 표면 보호막 |
| WO2008053985A1 (en) * | 2006-11-02 | 2008-05-08 | Toyo Ink Manufacturing Co., Ltd. | Photosensitive resin composition, cured product thereof, and method for producing photosensitive resin |
| US7935776B2 (en) * | 2007-03-21 | 2011-05-03 | Agi Corporation | Radiation curable and developable polyurethane and radiation curable and developable photo resist composition containing the same |
| TWI336691B (en) * | 2008-02-15 | 2011-02-01 | Cornerstone Optical Co Ltd | Edge coated glass polarized lens |
| WO2010028104A1 (en) * | 2008-09-05 | 2010-03-11 | Innovative Surface Technologies, Inc. | Photoactivatable crosslinker compositions for surface modification |
| DE102008052625A1 (de) * | 2008-10-22 | 2010-04-29 | Tesa Se | Thermisch vernetzende Polyacrylate und Verfahren zu deren Herstellung |
| JP5419755B2 (ja) * | 2009-03-27 | 2014-02-19 | 富士フイルム株式会社 | レーザー彫刻用レリーフ印刷版原版、レーザー彫刻用樹脂組成物、レリーフ印刷版、およびレリーフ印刷版の製造方法 |
| DE102010028870A1 (de) * | 2010-05-11 | 2011-11-17 | Henkel Ag & Co. Kgaa | Filmbildender strahlenvernetzender Klebstoff |
| US8292625B2 (en) | 2010-07-23 | 2012-10-23 | Pulpdent Corporation | Radically curable urethane dimethacrylates and compositions thereof for tougher dental prosthetics |
| WO2012035827A1 (ja) * | 2010-09-17 | 2012-03-22 | Dic株式会社 | インクジェット印刷インク用バインダー、それを含むインクジェット印刷用インク及び印刷物 |
| TW201213433A (en) * | 2010-09-28 | 2012-04-01 | Dow Global Technologies Llc | Epoxy composition with crystallization inhibition |
| KR101738464B1 (ko) * | 2012-04-27 | 2017-05-22 | 후지필름 가부시키가이샤 | 감광성 수지 조성물, 경화막의 형성 방법, 경화막, 유기 el 표시 장치, 및 액정 표시 장치 |
| US20150361257A1 (en) * | 2013-01-28 | 2015-12-17 | Nissan Chemical Industries, Ltd. | Method for producing substrate having pattern and resin composition for hydrofluoric acid etching |
| CN105102390B (zh) * | 2013-01-28 | 2019-03-01 | 日产化学工业株式会社 | 薄壁化的玻璃基板的制造方法 |
| JP6432743B2 (ja) * | 2013-03-12 | 2018-12-05 | 日産化学株式会社 | めっきレジスト用樹脂組成物を用いた基板の製造方法 |
| JP6582363B2 (ja) * | 2013-12-03 | 2019-10-02 | オート化学工業株式会社 | 接着剤組成物及びその製造方法 |
| JP6664212B2 (ja) * | 2014-12-26 | 2020-03-13 | 昭和電工株式会社 | ポリウレタン樹脂、オーバーコート用組成物およびポリウレタン樹脂の製造方法 |
| KR102381011B1 (ko) * | 2016-03-21 | 2022-04-04 | 바스프 에스이 | 가교결합된 폴리우레탄 |
| JP2018203820A (ja) * | 2017-05-31 | 2018-12-27 | 凸版印刷株式会社 | 水性ウレタン樹脂分散体及びそれを用いたフィルム及びシート |
| CN109776756A (zh) * | 2019-01-21 | 2019-05-21 | 深圳市道尔顿电子材料有限公司 | 一种双重改性环氧丙烯酸酯及其光刻胶 |
| JP7311061B1 (ja) * | 2022-08-17 | 2023-07-19 | 東洋インキScホールディングス株式会社 | 接着剤樹脂組成物、硬化物及び積層体 |
| CN116656229B (zh) * | 2023-04-18 | 2024-06-14 | 淮阴工学院 | 一种耐污型改性水性聚氨酯涂层的制备方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4666821A (en) * | 1984-02-23 | 1987-05-19 | W. R. Grace & Co. | Photopolymer for use as a solder mask |
| JPH068336B2 (ja) * | 1985-03-15 | 1994-02-02 | 大日本印刷株式会社 | 新規ウレタン化合物及びその製造方法 |
| US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
| ES2040792T3 (es) * | 1987-09-16 | 1993-11-01 | Canon Kabushiki Kaisha | Compuesto de resina curable por radiaciones de energia activa, que contiene poliuretano fotopolimerizable. |
| DE4031732A1 (de) * | 1990-10-06 | 1992-04-09 | Basf Ag | Strahlenhaertbare, waessrige bindemitteldispersionen |
| BE1010656A4 (fr) * | 1996-09-30 | 1998-11-03 | Ucb Sa | Monomeres, oligomeres et polymeres a groupes oxirannes terminaux, leur procede de preparation et leur polymerisation cationique sous irradiation. |
| US6177523B1 (en) * | 1999-07-14 | 2001-01-23 | Cardiotech International, Inc. | Functionalized polyurethanes |
| JP2001033960A (ja) * | 1999-07-16 | 2001-02-09 | Kansai Paint Co Ltd | フォトレジスト用感光性樹脂組成物及びレジストパターン形成方法 |
| US6214874B1 (en) * | 1999-10-15 | 2001-04-10 | John Hopkins University | Treatment of HPV induced cancer using in situ application of two nordihydroguiaretic acid derivatives, tetramethyl NDGA M4N and tetraglycinal NDGA G4N |
| JP4503199B2 (ja) * | 2001-04-12 | 2010-07-14 | 岡本化学工業株式会社 | 感光性平版印刷版用感光性組成物 |
| JP2003268067A (ja) | 2002-03-13 | 2003-09-25 | Nippon Kayaku Co Ltd | 感光性樹脂、及びそれを用いた感光性樹脂組成物、並びにその硬化物 |
| JP3846856B2 (ja) * | 2001-11-14 | 2006-11-15 | 日本化薬株式会社 | アルカリ水溶液可溶性ウレタン化エポキシカルボキシレート化合物及びそれを用いた感光性樹脂組成物並びにその硬化物 |
| JP2002338652A (ja) * | 2001-05-17 | 2002-11-27 | Nippon Kayaku Co Ltd | アルカリ水溶液可溶性ウレタン化エポキシカルボキシレート化合物及びそれを用いた感光性樹脂組成物並びにその硬化物 |
| JP2003155320A (ja) * | 2001-11-20 | 2003-05-27 | Nippon Kayaku Co Ltd | 感光性樹脂組成物及びその硬化物 |
| WO2002094904A1 (en) | 2001-05-17 | 2002-11-28 | Nippon Kayaku Kabushiki Kaisha | Photosensitive resin, photosensitive resin compositions containing the same and cured articles of the compositions |
| JP2003122001A (ja) * | 2001-10-15 | 2003-04-25 | Nippon Kayaku Co Ltd | 感光性樹脂、及びそれを用いた感光性樹脂組成物、並びにその硬化物 |
| JP3523857B2 (ja) * | 2001-12-25 | 2004-04-26 | 昭和高分子株式会社 | 感光性樹脂および感光性レジストインキ組成物 |
-
2004
- 2004-08-04 WO PCT/EP2004/051709 patent/WO2005014682A1/en not_active Ceased
- 2004-08-04 KR KR1020127012938A patent/KR101289598B1/ko not_active Expired - Fee Related
- 2004-08-04 US US10/567,318 patent/US7476484B2/en not_active Expired - Fee Related
- 2004-08-04 DE DE602004019217T patent/DE602004019217D1/de not_active Expired - Lifetime
- 2004-08-04 CN CNB2004800226591A patent/CN100573325C/zh not_active Expired - Fee Related
- 2004-08-04 ES ES04766414T patent/ES2318324T3/es not_active Expired - Lifetime
- 2004-08-04 BR BRPI0413182-7A patent/BRPI0413182A/pt not_active IP Right Cessation
- 2004-08-04 JP JP2006522358A patent/JP5069465B2/ja not_active Expired - Fee Related
- 2004-08-04 EP EP04766414A patent/EP1651695B1/en not_active Expired - Lifetime
- 2004-08-04 AT AT04766414T patent/ATE421545T1/de not_active IP Right Cessation
- 2004-08-04 CA CA002532440A patent/CA2532440A1/en not_active Abandoned
- 2004-08-04 KR KR1020067002499A patent/KR101178308B1/ko not_active Expired - Fee Related
- 2004-08-05 TW TW093123448A patent/TWI349680B/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024239159A1 (zh) * | 2023-05-19 | 2024-11-28 | 宁德时代新能源科技股份有限公司 | 分散剂及其制备方法、正极浆料、正极极片及其制备方法、电池单体、电池和用电装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1651695A1 (en) | 2006-05-03 |
| CA2532440A1 (en) | 2005-02-17 |
| KR20120068993A (ko) | 2012-06-27 |
| JP5069465B2 (ja) | 2012-11-07 |
| JP2007501871A (ja) | 2007-02-01 |
| US20060204895A1 (en) | 2006-09-14 |
| CN1835981A (zh) | 2006-09-20 |
| KR101289598B1 (ko) | 2013-07-24 |
| WO2005014682A1 (en) | 2005-02-17 |
| US7476484B2 (en) | 2009-01-13 |
| DE602004019217D1 (en) | 2009-03-12 |
| KR101178308B1 (ko) | 2012-08-29 |
| CN100573325C (zh) | 2009-12-23 |
| ES2318324T3 (es) | 2009-05-01 |
| TW200523285A (en) | 2005-07-16 |
| KR20060052968A (ko) | 2006-05-19 |
| ATE421545T1 (de) | 2009-02-15 |
| TWI349680B (en) | 2011-10-01 |
| EP1651695B1 (en) | 2009-01-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| BRPI0413182A (pt) | poliuretano linear, composição, moldagem, material, processo para a produção de máscara de solda sobre um circuito impresso, e, uso da composição | |
| EP1479709B1 (de) | Verzweigte, amorphe Makropolyole auf Polyesterbasis mit enger Molekulargewichtsverteilung | |
| KR102564758B1 (ko) | 티올-함유 조성물 | |
| EP0199468B1 (en) | Moisture-actuated hot melt adhesive | |
| ES2290329T3 (es) | Componentes de agentes aglutinantes para agentes de recubrimiento para superficies, con propiedades mejoradas de adherencia. | |
| US5744248A (en) | Coating compositions curable by radiation and their use for preparing coated substrates | |
| ATE491340T1 (de) | Polyglycerolfettsäureesterprodukt und beschichtung | |
| DE69738655T2 (de) | Polymerisierbare ungesättigte verbindungen, härtbare zusammensetzungen die diese verbindungen enthalten und ihre härtungsprodukte | |
| KR950014254A (ko) | 결합제 성분으로서 폴리에스테르 폴리올을 함유하는 이성분 폴리우레탄 피복 조성물 | |
| DE69332395D1 (de) | Biologisch abbaubare Kunststoffmaterialien, Verfahren zur ihrer Herstellung, sowie ihre Verwendung | |
| JP2016117833A (ja) | 光硬化性組成物およびその用途 | |
| CA2502961A1 (en) | Aqueous non-ionically stabilised epoxy resins | |
| JPH07330835A (ja) | 低粘度速硬化性(メタ)アクリレート組成物 | |
| CN109054615A (zh) | 双组份水性涂料及其制备方法 | |
| DE68905552D1 (de) | Immunostimulierende peptide, deren verfahren zur herstellung und sie enthaltende pharmazeutische zusammensetzungen. | |
| MX172267B (es) | Mejoras a composiciones recubridoras basadas sobre agentes de fraguado poliacidos y poliepoxidos | |
| EP1865010A1 (en) | Water dispersible polyurethane composition | |
| US4157421A (en) | Photocurable compositions comprising a polythiol and a polyene derived from a vinyl acetal | |
| JPS58187414A (ja) | 光硬化性組成物 | |
| CN112708110A (zh) | 一种高强度硫醇固化剂、其制备方法及环氧树脂胶黏剂 | |
| EP0676446A4 (en) | HARDENABLE RESIN COMPOSITIONS. | |
| ATE408653T1 (de) | Hitzehärtbare pulverlackzusammensetzung sowie zu ihrer herstellung verwendbares polyesterharz | |
| JPS63280739A (ja) | 光硬化性樹脂組成物 | |
| JPS6142529A (ja) | ウレタンアクリレ−トの製造方法 | |
| JPH11263906A (ja) | ウレタンプレポリマー組成物 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B07A | Application suspended after technical examination (opinion) [chapter 7.1 patent gazette] | ||
| B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 10A ANUIDADE. |
|
| B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 2266 DE 10/06/2014. |