BRPI0413182A - poliuretano linear, composição, moldagem, material, processo para a produção de máscara de solda sobre um circuito impresso, e, uso da composição - Google Patents

poliuretano linear, composição, moldagem, material, processo para a produção de máscara de solda sobre um circuito impresso, e, uso da composição

Info

Publication number
BRPI0413182A
BRPI0413182A BRPI0413182-7A BRPI0413182A BRPI0413182A BR PI0413182 A BRPI0413182 A BR PI0413182A BR PI0413182 A BRPI0413182 A BR PI0413182A BR PI0413182 A BRPI0413182 A BR PI0413182A
Authority
BR
Brazil
Prior art keywords
composition
production
molding
printed circuit
carbon atoms
Prior art date
Application number
BRPI0413182-7A
Other languages
English (en)
Inventor
Bernhard Sailer
Catherine Schoenenberger
Ottile Zelenko
Original Assignee
Huntsman Adv Mat Switzerland
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huntsman Adv Mat Switzerland filed Critical Huntsman Adv Mat Switzerland
Publication of BRPI0413182A publication Critical patent/BRPI0413182A/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08Processes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/83Chemically modified polymers
    • C08G18/831Chemically modified polymers by oxygen-containing compounds inclusive of carbonic acid halogenides, carboxylic acid halogenides and epoxy halides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08Processes
    • C08G18/0804Manufacture of polymers containing ionic or ionogenic groups
    • C08G18/0819Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups
    • C08G18/0823Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups containing carboxylate salt groups or groups forming them
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/65Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
    • C08G18/66Compounds of groups C08G18/42, C08G18/48, or C08G18/52
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/65Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
    • C08G18/66Compounds of groups C08G18/42, C08G18/48, or C08G18/52
    • C08G18/6666Compounds of group C08G18/48 or C08G18/52
    • C08G18/6692Compounds of group C08G18/48 or C08G18/52 with compounds of group C08G18/34
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67Unsaturated compounds having active hydrogen
    • C08G18/69Polymers of conjugated dienes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04Polyurethanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04Polyurethanes
    • C09D175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Ink Jet (AREA)
  • Materials For Medical Uses (AREA)

Abstract

"POLIURETANO LINEAR, COMPOSIçãO, MOLDAGEM, MATERIAL, PROCESSO PARA A PRODUçãO DE MáSCARAS DE SOLDA SOBRE UM CIRCUITO IMPRESSO, E, USO DA COMPOSIçãO". Poliuretanos lineares reticuláveis obtidos de (a) pelo menos um diisocianato possuindo 2 a 30 átomos de carbono, (b) pelo menos um diol alifático ou cicloalifático possuindo 2 a 30 átomos de carbono, em cuja cadeia de carbonos está ligado pelo menos um grupo carboxila, e alguns dos ou todos os citados grupos carboxila têm sido esterificados com álcool C~ 3~-C~ 8~ olefinicamente insaturado ou com o glidicil-éster de um ácido carboxílico C~ 3~C~ 8~ olefinicamente insaturado, e (c) opcionalmente pelo menos um diol alifático ou cicloalifático possuindo 2 a 30 átomos de carbono, em cuja cadeia de carbonos está ligado pelo menos um grupo carboxila. Os poliuretanos são adequados, sozinhos ou em uma mistura com outros componentes reativos, para reticulação térmica e/ou fotoquímica em composições reticuláveis para a produção de moldagens, revestimentos e em particular máscaras de solda.
BRPI0413182-7A 2003-08-07 2004-08-04 poliuretano linear, composição, moldagem, material, processo para a produção de máscara de solda sobre um circuito impresso, e, uso da composição BRPI0413182A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH13632003 2003-08-07
PCT/EP2004/051709 WO2005014682A1 (en) 2003-08-07 2004-08-04 Photocrosslinkable polyurethanes

Publications (1)

Publication Number Publication Date
BRPI0413182A true BRPI0413182A (pt) 2006-10-03

Family

ID=34120759

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0413182-7A BRPI0413182A (pt) 2003-08-07 2004-08-04 poliuretano linear, composição, moldagem, material, processo para a produção de máscara de solda sobre um circuito impresso, e, uso da composição

Country Status (12)

Country Link
US (1) US7476484B2 (pt)
EP (1) EP1651695B1 (pt)
JP (1) JP5069465B2 (pt)
KR (2) KR101289598B1 (pt)
CN (1) CN100573325C (pt)
AT (1) ATE421545T1 (pt)
BR (1) BRPI0413182A (pt)
CA (1) CA2532440A1 (pt)
DE (1) DE602004019217D1 (pt)
ES (1) ES2318324T3 (pt)
TW (1) TWI349680B (pt)
WO (1) WO2005014682A1 (pt)

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KR102381011B1 (ko) * 2016-03-21 2022-04-04 바스프 에스이 가교결합된 폴리우레탄
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WO2024239159A1 (zh) * 2023-05-19 2024-11-28 宁德时代新能源科技股份有限公司 分散剂及其制备方法、正极浆料、正极极片及其制备方法、电池单体、电池和用电装置

Also Published As

Publication number Publication date
EP1651695A1 (en) 2006-05-03
CA2532440A1 (en) 2005-02-17
KR20120068993A (ko) 2012-06-27
JP5069465B2 (ja) 2012-11-07
JP2007501871A (ja) 2007-02-01
US20060204895A1 (en) 2006-09-14
CN1835981A (zh) 2006-09-20
KR101289598B1 (ko) 2013-07-24
WO2005014682A1 (en) 2005-02-17
US7476484B2 (en) 2009-01-13
DE602004019217D1 (en) 2009-03-12
KR101178308B1 (ko) 2012-08-29
CN100573325C (zh) 2009-12-23
ES2318324T3 (es) 2009-05-01
TW200523285A (en) 2005-07-16
KR20060052968A (ko) 2006-05-19
ATE421545T1 (de) 2009-02-15
TWI349680B (en) 2011-10-01
EP1651695B1 (en) 2009-01-21

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Legal Events

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B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 10A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 2266 DE 10/06/2014.