BRPI0608275A2 - óxido de zinco contendo gálio - Google Patents

óxido de zinco contendo gálio

Info

Publication number
BRPI0608275A2
BRPI0608275A2 BRPI0608275-0A BRPI0608275A BRPI0608275A2 BR PI0608275 A2 BRPI0608275 A2 BR PI0608275A2 BR PI0608275 A BRPI0608275 A BR PI0608275A BR PI0608275 A2 BRPI0608275 A2 BR PI0608275A2
Authority
BR
Brazil
Prior art keywords
gallium
zinc oxide
containing zinc
heat radiation
present
Prior art date
Application number
BRPI0608275-0A
Other languages
English (en)
Inventor
Juchi Fukatani
Bungo Hatta
Tetsuya Yamamoto
Original Assignee
Sekisui Chemical Co Ltd
Univ Kochi Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd, Univ Kochi Technology filed Critical Sekisui Chemical Co Ltd
Publication of BRPI0608275A2 publication Critical patent/BRPI0608275A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G15/00—Compounds of gallium, indium or thallium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G9/00—Compounds of zinc
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

ËXIDO DE ZINCO CONTENDO GáLIO. é um objetivo da presente invenção o de prover um óxido de zinco contendo gálio com uma função de proteção contra radiação de calor melhorada e enquanto mantendo uma alta transparência com relação aos raios de luz visível. A presente invenção é direcionada a um óxido de zinco contendo gálio, que tem uma função de proteção contra radiação de calor, um teor de gálio na faixa de 0,25 até 25% em peso, e uma densidade de transportador de elétrons n~ e~ de 2 x 10^ 20^/cm^ 3^ ou mais alta.
BRPI0608275-0A 2005-02-24 2006-02-23 óxido de zinco contendo gálio BRPI0608275A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005049453 2005-02-24
PCT/JP2006/303331 WO2006090806A1 (ja) 2005-02-24 2006-02-23 ガリウム含有酸化亜鉛

Publications (1)

Publication Number Publication Date
BRPI0608275A2 true BRPI0608275A2 (pt) 2009-12-15

Family

ID=36927442

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0608275-0A BRPI0608275A2 (pt) 2005-02-24 2006-02-23 óxido de zinco contendo gálio

Country Status (10)

Country Link
US (1) US7651640B2 (pt)
EP (1) EP1852395A4 (pt)
JP (1) JPWO2006090806A1 (pt)
KR (1) KR20070112220A (pt)
CN (1) CN101124164B (pt)
AU (1) AU2006216251B2 (pt)
BR (1) BRPI0608275A2 (pt)
CA (1) CA2594290A1 (pt)
RU (1) RU2404124C2 (pt)
WO (1) WO2006090806A1 (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2056304A4 (en) * 2006-08-24 2010-06-16 Nippon Mining Co ZINKOXIDE-BASED TRANSPARENT ELECTRICAL LADDER, SPUTTER TARGET FOR FORMING THE LADDER AND PROCESS FOR PRODUCING THE TARGET
JP4820838B2 (ja) * 2008-03-28 2011-11-24 株式会社有沢製作所 感光性樹脂組成物及び該樹脂組成物を用いたハードコートフィルム並びに反射防止フィルム
KR101259066B1 (ko) * 2008-12-10 2013-04-29 엘지디스플레이 주식회사 횡전계형 액정표시장치용 컬러필터 기판 및 이의 제조방법
WO2010123142A1 (ja) * 2009-04-22 2010-10-28 協和化学工業株式会社 柱状酸化亜鉛粒子およびその製造方法
KR101300560B1 (ko) * 2009-07-01 2013-09-03 삼성코닝정밀소재 주식회사 산화아연계 전도체
JP5630747B2 (ja) * 2010-05-14 2014-11-26 リンテック株式会社 酸化亜鉛系導電性積層体及びその製造方法並びに電子デバイス
US8883555B2 (en) 2010-08-25 2014-11-11 Semiconductor Energy Laboratory Co., Ltd. Electronic device, manufacturing method of electronic device, and sputtering target
FR2968413B1 (fr) * 2010-12-06 2012-12-07 Saint Gobain Dispositif electrochimique a proprietes de transmission optique et/ou energetique electrocommandables
JP2014065198A (ja) * 2012-09-25 2014-04-17 Toppan Printing Co Ltd ガスバリアフィルム
US20190043640A1 (en) * 2017-08-04 2019-02-07 Vitro Flat Glass, LLC Protective Layer Over a Functional Coating
US10519595B2 (en) 2017-12-29 2019-12-31 Industrial Technology Research Institute Composite textile
CN119287465B (zh) * 2024-12-10 2025-06-27 江苏甬金金属科技有限公司 一种耐磨双相不锈钢带及其加工工艺

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6196609A (ja) 1984-10-15 1986-05-15 大阪特殊合金株式会社 透明導電膜
JPS61205619A (ja) * 1985-03-08 1986-09-11 Osaka Tokushu Gokin Kk 耐熱性酸化亜鉛透明導電膜
JPS62154411A (ja) 1985-12-26 1987-07-09 三井金属鉱業株式会社 透明導電膜
JPH01201021A (ja) 1988-02-04 1989-08-14 Bridgestone Corp 熱線遮蔽材料及び熱線遮蔽ガラス
JP3453805B2 (ja) * 1992-09-11 2003-10-06 旭硝子株式会社 透明導電膜
JPH0769630A (ja) * 1993-08-31 1995-03-14 Mitsubishi Materials Corp 分散性に優れた酸化亜鉛粉末
JPH08151233A (ja) * 1994-11-24 1996-06-11 Asahi Glass Co Ltd 透明発熱体
JPH11292621A (ja) * 1998-04-17 1999-10-26 Sumitomo Bakelite Co Ltd 赤外光反射組成物
JP4170507B2 (ja) * 1999-03-26 2008-10-22 スタンレー電気株式会社 透明導電膜の製造方法
JP4386986B2 (ja) * 1999-03-31 2009-12-16 株式会社日本触媒 無機系微粒子含有組成物とその用途および分散剤
JP2001329363A (ja) * 2000-05-18 2001-11-27 Bridgestone Corp 積層膜の形成方法及び積層膜
RU2202010C1 (ru) * 2001-11-23 2003-04-10 Дагестанский государственный университет Способ получения монокристаллического оксида цинка с быстрым излучением в ультрафиолетовой области спектра
JP2004292839A (ja) * 2003-03-25 2004-10-21 Sumitomo Heavy Ind Ltd 酸化亜鉛膜の製造方法
JP2004292873A (ja) * 2003-03-26 2004-10-21 Sumitomo Heavy Ind Ltd 酸化亜鉛膜の製造方法
JP2004311702A (ja) * 2003-04-07 2004-11-04 Sumitomo Heavy Ind Ltd 薄膜トランジスタの製造方法および薄膜トランジスタ
JP2006117462A (ja) 2004-10-20 2006-05-11 Sumitomo Heavy Ind Ltd ＺｎＯ焼結体およびその製造方法

Also Published As

Publication number Publication date
US20080315160A1 (en) 2008-12-25
WO2006090806A1 (ja) 2006-08-31
CA2594290A1 (en) 2006-08-31
EP1852395A1 (en) 2007-11-07
JPWO2006090806A1 (ja) 2008-07-24
RU2404124C2 (ru) 2010-11-20
AU2006216251A1 (en) 2006-08-31
KR20070112220A (ko) 2007-11-22
RU2007135180A (ru) 2009-03-27
CN101124164B (zh) 2010-12-15
AU2006216251B2 (en) 2010-11-18
US7651640B2 (en) 2010-01-26
EP1852395A4 (en) 2010-03-03
CN101124164A (zh) 2008-02-13

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 9A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2343 DE 01-12-2015 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.