BRPI0806124A2 - thermal oxidation chamber - Google Patents

Abstract

TERMAL OXIDATION CHAMBER. The patent relates to a thermal oxidation chamber which aims to burn gases from industrial processes, kitchens and any process which releases toxic gases, foul-smelling gases or pollutants into the atmosphere. The aim of the present is to provide a chamber internally equipped with semiconductors that reach high temperatures when receiving electric current so that heat that can reach values of about 1,500 degrees Celsius causes the gases to become less harmful and odorless.

Description

"TERMAL OXIDATION CAMERA".

This patent specification relates to a thermal oxidation chamber for the purpose of burning gases from industrial processes, kitchens and any process that releases toxic atmospheres, foul-smelling gases or pollutants.

Currently, undesirable gases are usually burned, so that only less polluting and / or odorless gases remain, using equipment that uses fuel to generate flames that cause the chemical transformation of the gases, which requires expensive equipment and maintenance.

Other processes used for example in industrial kitchens include electrolytic processes, which in practice cannot eliminate most gases and odors.

The purpose of the present patent relates to a thermal oxidation chamber is to minimize environmental aggression from the release of polluting gases into the atmosphere while preserving the environment, as well as neutralizing smells and odors from industrial processes.

The aim of the present is to provide an internally endowed chamber that achieves high temperatures when receiving electric current so that heat that can reach values of about 1,500 degrees Celsius causes the transformation of gases into less harmful and semodorous ones.

Further treatments, already known in the prior art, may be applied in accordance with the resulting gas for final treatment, generally by chemical processes.

For greater knowledge and understanding of the novelty, the accompanying drawings illustrate it:

Figure 1: Corresponds to the plan of the chamber. Figure 2: Shows a front view of the chamber of figure 1.

Figure 3: Shows longitudinal sectional view of the chamber of figure 1.

Figure 4: Corresponds to the sectional view according to the AA plane of figure 3.

Figure 5: shows a plan view of a constructive variant of the chamber.

Figure 6: Corresponds to the front view of the camera of figure 5.

Figure 7: Shows longitudinal sectional view of the chamber of figure 5.

Figure 8: Corresponds to the cross-sectional view of figure 5.

As can be seen from the drawings which form an integral part of this report, the chamber consists of a hollow body (1) covered by suitable thermal insulation (2), which chamber has an inlet (3) and a gas outlet (4), constituting the novelty itself in the fact that in the inner chamber several high temperature semiconductors (5) are arranged, preferably arranged transversely within the chamber.

Considering that the semiconductors are heat resistant but not impact, protections are provided on the sides of the chamber that surrounds places where said semiconductors are fitted.

The shape, width, length or temperature of the chamber semiconductors may vary as needed, such as volume, velocity, composition, temperature of the gases to be treated.

In this way the camera may be narrower as in Figure 1 or wider as in Figure 5.

The semiconductors used can reach high temperatures around 1500 degrees Celsius, but the temperature of the gas reduction is adjusted in each case, so that the combination of the parameters of each project will define the appropriate temperature. With this construction the new thermal oxidation chamber can be coupled to existing equipment, adapting to the location appropriately.

Usual measuring and control devices such as pyrometers, temperature gauges, equipment controls can adjust semiconductor temperature.

This solution is extremely economical compared to other existing ones that use flame and has high installation cost and maintenance.

This equipment uses environmental technology, since its primary purpose is industrial purification, which makes it an environmentally correct equipment, a fundamental part of the welfare of living beings and the planet as a whole.

Among the many benefits brought by the implementation of this inventive work, it is worth mentioning the deconstitution of unhealthy work environments, once the labor inspection as stated in the Regulatory Standard NR-15, through companies that work with, or even all products that make the service unhealthy. .

Claims (1)

1.) "THERMAL OXIDATION CHAMBER consisting of a hollow body (1) covered by adequate thermal insulation (2), a chamber with an inlet (3) and a gas outlet (4), characterized in that inside the chamber are arranged several high temperature semiconductors (5), preferably arranged transversely within the chamber.