BRPI0812694A2 - "aparelho e método para revestir uma superfície de um artigo com uma camada de polímero de película fina por meio de deposição de plasma,e,artigo" - Google Patents

"aparelho e método para revestir uma superfície de um artigo com uma camada de polímero de película fina por meio de deposição de plasma,e,artigo"

Info

Publication number
BRPI0812694A2
BRPI0812694A2 BRPI0812694A BRPI0812694A2 BR PI0812694 A2 BRPI0812694 A2 BR PI0812694A2 BR PI0812694 A BRPI0812694 A BR PI0812694A BR PI0812694 A2 BRPI0812694 A2 BR PI0812694A2
Authority
BR
Brazil
Prior art keywords
article
coating
thin film
polymer layer
plasma deposition
Prior art date
Application number
Other languages
English (en)
Inventor
Stephen Richard Coulson
Charles Edmund King
Original Assignee
P2I Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by P2I Ltd filed Critical P2I Ltd
Publication of BRPI0812694A2 publication Critical patent/BRPI0812694A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
BRPI0812694 2007-07-17 2008-07-17 "aparelho e método para revestir uma superfície de um artigo com uma camada de polímero de película fina por meio de deposição de plasma,e,artigo" BRPI0812694A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0713821A GB0713821D0 (en) 2007-07-17 2007-07-17 A plasma deposition apparatus
PCT/GB2008/002440 WO2009010753A2 (en) 2007-07-17 2008-07-17 Plasma deposition apparatus

Publications (1)

Publication Number Publication Date
BRPI0812694A2 true BRPI0812694A2 (pt) 2014-12-23

Family

ID=38476397

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0812694 BRPI0812694A2 (pt) 2007-07-17 2008-07-17 "aparelho e método para revestir uma superfície de um artigo com uma camada de polímero de película fina por meio de deposição de plasma,e,artigo"

Country Status (12)

Country Link
US (1) US20100183879A1 (pt)
EP (2) EP2390012A2 (pt)
JP (1) JP2010533793A (pt)
KR (1) KR20100043070A (pt)
CN (1) CN101743071A (pt)
AU (1) AU2008277410A1 (pt)
BR (1) BRPI0812694A2 (pt)
CA (1) CA2693825A1 (pt)
GB (2) GB0713821D0 (pt)
MX (1) MX2010000646A (pt)
TW (1) TW200924859A (pt)
WO (1) WO2009010753A2 (pt)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8551208B2 (en) * 2010-11-16 2013-10-08 General Electric Company Plasma treated filter
TW201233253A (en) * 2011-01-26 2012-08-01 Bing-Li Lai Plasma reaction method and apparatus
US8852693B2 (en) 2011-05-19 2014-10-07 Liquipel Ip Llc Coated electronic devices and associated methods
GB201112516D0 (en) * 2011-07-21 2011-08-31 P2I Ltd Surface coatings
CN102634776B (zh) * 2012-05-03 2014-03-12 徐明生 一种连续制备二维纳米薄膜的化学气相沉积设备
CN103898480A (zh) * 2014-03-25 2014-07-02 侯光辉 一种在电子装置上连续进行真空镀防水膜的装置及方法
TWI724298B (zh) * 2017-05-31 2021-04-11 荷蘭商耐克創新有限合夥公司 電腦可讀取媒體及監測對物品施加表面處理的方法及系統
CN111111581B (zh) * 2019-12-19 2021-07-02 中国科学院电工研究所 一种等离子体燃料重整装置

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US5137780A (en) * 1987-10-16 1992-08-11 The Curators Of The University Of Missouri Article having a composite insulative coating
GB9113350D0 (en) * 1991-06-20 1991-08-07 Thomas Thomas Ronald Asymmetric/anisotropic fluoropolymer membrane manufacture
US5514246A (en) 1994-06-02 1996-05-07 Micron Technology, Inc. Plasma reactors and method of cleaning a plasma reactor
US5683548A (en) 1996-02-22 1997-11-04 Motorola, Inc. Inductively coupled plasma reactor and process
JPH1028836A (ja) 1996-07-16 1998-02-03 Niles Parts Co Ltd 放電プラズマを用いたフロン分解処理装置
US6056848A (en) * 1996-09-11 2000-05-02 Ctp, Inc. Thin film electrostatic shield for inductive plasma processing
JP3624113B2 (ja) * 1998-03-13 2005-03-02 キヤノン株式会社 プラズマ処理方法
GB9816077D0 (en) * 1998-07-24 1998-09-23 Secr Defence Surface coatings
US6423384B1 (en) 1999-06-25 2002-07-23 Applied Materials, Inc. HDP-CVD deposition of low dielectric constant amorphous carbon film
US6568896B2 (en) * 2001-03-21 2003-05-27 Applied Materials, Inc. Transfer chamber with side wall port
US20030157269A1 (en) 2002-02-20 2003-08-21 University Of Washington Method and apparatus for precision coating of molecules on the surfaces of materials and devices
KR100483886B1 (ko) 2002-05-17 2005-04-20 (주)엔피씨 나노분말 양산용 고주파 유도 플라즈마 반응로
CN100434566C (zh) * 2002-05-24 2008-11-19 肖特股份公司 用于进行cvd涂层的回转式机器
WO2005007565A2 (en) 2003-06-10 2005-01-27 Nuvotec, Inc. Continuous production of carbon nanomaterials using a high temperature inductively coupled plasma
WO2004112447A2 (en) 2003-06-11 2004-12-23 Nuvotec, Inc. Inductively coupled plasma/partial oxidation reformation of carbonaceous compounds to produce fuel for energy production
GB0406049D0 (en) 2004-03-18 2004-04-21 Secr Defence Surface coatings
FR2872068B1 (fr) * 2004-06-28 2006-10-27 Centre Nat Rech Scient Cnrse Procede et dispositif pour le depot de couches minces par pulverisation electrohydrodynamique, notamment en post-decharge
EP1643005A3 (de) * 2004-09-01 2008-03-19 EMPA Eidgenössische Materialprüfungs- und Forschungsanstalt Abscheiden von organischen und/oder anorganischen Nanoschichten mittels Plasmaentladung

Also Published As

Publication number Publication date
CN101743071A (zh) 2010-06-16
AU2008277410A1 (en) 2009-01-22
GB0713821D0 (en) 2007-08-29
GB201000729D0 (en) 2010-03-03
JP2010533793A (ja) 2010-10-28
WO2009010753A3 (en) 2009-06-11
GB2463427A (en) 2010-03-17
MX2010000646A (es) 2010-06-25
KR20100043070A (ko) 2010-04-27
CA2693825A1 (en) 2009-01-22
EP2390012A2 (en) 2011-11-30
US20100183879A1 (en) 2010-07-22
EP2167245A2 (en) 2010-03-31
WO2009010753A2 (en) 2009-01-22
TW200924859A (en) 2009-06-16

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]