BRPI0818984A2 - processo de recuperação de gecl4 e/ou sicl4 a partir de fribras ópticas ou resíduos vítreos e processo para produzir sicl4 de materiais ricos de sio2. - Google Patents

processo de recuperação de gecl4 e/ou sicl4 a partir de fribras ópticas ou resíduos vítreos e processo para produzir sicl4 de materiais ricos de sio2.

Info

Publication number
BRPI0818984A2
BRPI0818984A2 BRPI0818984A BRPI0818984A BRPI0818984A2 BR PI0818984 A2 BRPI0818984 A2 BR PI0818984A2 BR PI0818984 A BRPI0818984 A BR PI0818984A BR PI0818984 A BRPI0818984 A BR PI0818984A BR PI0818984 A2 BRPI0818984 A2 BR PI0818984A2
Authority
BR
Brazil
Prior art keywords
sicl4
gecl4
sio2
recovering
producing
Prior art date
Application number
BRPI0818984A
Other languages
English (en)
Inventor
Bergeron Mario
Langlais Alain
Original Assignee
Institut National De La Recherche Scientifique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institut National De La Recherche Scientifique filed Critical Institut National De La Recherche Scientifique
Publication of BRPI0818984A2 publication Critical patent/BRPI0818984A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G17/00—Compounds of germanium
    • C01G17/04—Halides of germanium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/024—Chemical treatment of cullet or glass fibres

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
BRPI0818984A 2007-12-05 2008-12-01 processo de recuperação de gecl4 e/ou sicl4 a partir de fribras ópticas ou resíduos vítreos e processo para produzir sicl4 de materiais ricos de sio2. BRPI0818984A2 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US99235407P 2007-12-05 2007-12-05
US4285908P 2008-04-07 2008-04-07
PCT/CA2008/002106 WO2009070874A1 (en) 2007-12-05 2008-12-01 Gecl4 and/or sicl4 recovery process from optical fibers or glassy residues and process for producing sicl4 from sio2 rich materials

Publications (1)

Publication Number Publication Date
BRPI0818984A2 true BRPI0818984A2 (pt) 2019-09-24

Family

ID=40717222

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0818984A BRPI0818984A2 (pt) 2007-12-05 2008-12-01 processo de recuperação de gecl4 e/ou sicl4 a partir de fribras ópticas ou resíduos vítreos e processo para produzir sicl4 de materiais ricos de sio2.

Country Status (12)

Country Link
US (1) US8486360B2 (pt)
EP (1) EP2222602A4 (pt)
JP (2) JP5543923B2 (pt)
KR (1) KR20100110811A (pt)
CN (1) CN101925537B (pt)
AU (1) AU2008331380B2 (pt)
BR (1) BRPI0818984A2 (pt)
CA (1) CA2707503C (pt)
EA (1) EA017908B1 (pt)
MX (1) MX2010006254A (pt)
WO (1) WO2009070874A1 (pt)
ZA (1) ZA201004683B (pt)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2613102B2 (ja) 1988-12-06 1997-05-21 横浜ゴム株式会社 ラジアルタイヤ
CN102925689B (zh) * 2011-08-10 2014-09-10 深圳市格林美高新技术股份有限公司 废旧掺锗光纤中锗回收方法
CN103387237A (zh) * 2012-05-10 2013-11-13 深圳市格林美高新技术股份有限公司 一种光纤废料资源化的方法
CN102976395B (zh) * 2012-11-19 2014-09-17 云南驰宏锌锗股份有限公司 光纤用四氯化锗的生产系统
WO2015081427A1 (en) * 2013-12-06 2015-06-11 Niobec Inc. Dry chlorination process to produce anhydrous rare earth chlorides
KR101589049B1 (ko) * 2015-01-19 2016-01-27 주식회사 제이메탈 폐광섬유의 재활용 방법
JP7310373B2 (ja) * 2019-07-03 2023-07-19 住友電気工業株式会社 ガラス原料供給装置およびガラス原料供給装置のフィルタ交換方法
CN112546659B (zh) * 2020-12-08 2022-02-15 云南临沧鑫圆锗业股份有限公司 一种四氟化锗的提纯装置及方法
WO2025172418A1 (en) * 2024-02-14 2025-08-21 Tcm Research Ltd. Vapour metallurgical separation of metals from sulphide materials

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US4083927A (en) * 1976-11-02 1978-04-11 Toth Aluminum Corporation Controlled carbo-chlorination of kaolinitic ores
US4125590A (en) * 1977-06-29 1978-11-14 Kerr-Mcgee Chemical Corporation Method for manufacturing boron trichloride
US4220629A (en) * 1978-08-14 1980-09-02 Toth Aluminum Corporation Chlorination of ores with catalyzed metal chlorides
JPS5722101A (en) * 1980-07-15 1982-02-05 Ube Ind Ltd Preparation of chloride
JPS5857368B2 (ja) * 1980-02-13 1983-12-20 宇部興産株式会社 三塩化ホウ素の製造方法
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KR20050077446A (ko) 2004-01-28 2005-08-02 삼성전자주식회사 미증착된 유리 입자를 이용한 유리 모재의 제조 장치 및그 방법
JP2005339701A (ja) 2004-05-28 2005-12-08 Fuji Photo Film Co Ltd 情報記録テープ
JP5162819B2 (ja) 2004-12-10 2013-03-13 東京電力株式会社 廃光ファイバーケーブルのマテリアルリサイクル方法
JP4591866B2 (ja) 2004-12-27 2010-12-01 東京電力株式会社 廃光ファイバーケーブルからの心線回収法及びそれに用いる篩

Also Published As

Publication number Publication date
AU2008331380B2 (en) 2014-05-29
EP2222602A1 (en) 2010-09-01
EA017908B1 (ru) 2013-04-30
JP2011505329A (ja) 2011-02-24
JP5543923B2 (ja) 2014-07-09
CN101925537B (zh) 2012-12-12
US8486360B2 (en) 2013-07-16
ZA201004683B (en) 2011-09-28
MX2010006254A (es) 2010-08-18
WO2009070874A1 (en) 2009-06-11
CA2707503C (en) 2016-04-19
EA201070685A1 (ru) 2011-02-28
CA2707503A1 (en) 2009-06-11
JP2014193810A (ja) 2014-10-09
KR20100110811A (ko) 2010-10-13
US20100272625A1 (en) 2010-10-28
AU2008331380A1 (en) 2009-06-11
EP2222602A4 (en) 2013-01-09
CN101925537A (zh) 2010-12-22

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]
B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2543 DE 01-10-2019 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.