BRPI0904846A2 - Aparelho para deposição de película - Google Patents

Aparelho para deposição de película

Info

Publication number
BRPI0904846A2
BRPI0904846A2 BRPI0904846-4A BRPI0904846A BRPI0904846A2 BR PI0904846 A2 BRPI0904846 A2 BR PI0904846A2 BR PI0904846 A BRPI0904846 A BR PI0904846A BR PI0904846 A2 BRPI0904846 A2 BR PI0904846A2
Authority
BR
Brazil
Prior art keywords
deposition apparatus
film deposition
film
deposition
Prior art date
Application number
BRPI0904846-4A
Other languages
English (en)
Inventor
Takao Saito
Tatsuya Terazawa
Original Assignee
Ngk Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2008247728A external-priority patent/JP5280784B2/ja
Application filed by Ngk Insulators Ltd filed Critical Ngk Insulators Ltd
Publication of BRPI0904846A2 publication Critical patent/BRPI0904846A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
BRPI0904846-4A 2008-09-26 2009-02-25 Aparelho para deposição de película BRPI0904846A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008247728A JP5280784B2 (ja) 2007-11-21 2008-09-26 成膜装置
PCT/JP2009/053458 WO2010035516A1 (ja) 2008-09-26 2009-02-25 成膜装置

Publications (1)

Publication Number Publication Date
BRPI0904846A2 true BRPI0904846A2 (pt) 2015-06-30

Family

ID=42060515

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0904846-4A BRPI0904846A2 (pt) 2008-09-26 2009-02-25 Aparelho para deposição de película

Country Status (5)

Country Link
EP (1) EP2327811A4 (pt)
AU (1) AU2009292608B2 (pt)
BR (1) BRPI0904846A2 (pt)
MX (1) MX2010002570A (pt)
WO (1) WO2010035516A1 (pt)

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0644554B2 (ja) * 1984-03-28 1994-06-08 株式会社富士電機総合研究所 プラズマｃｖｄ装置
EP0183254B1 (en) * 1984-11-29 1994-07-13 Matsushita Electric Industrial Co., Ltd. Plasma CVD apparatus and method for forming a diamond-like carbon film
DE19635736C2 (de) * 1996-09-03 2002-03-07 Saxonia Umformtechnik Gmbh Diamantähnliche Beschichtung
JP3420960B2 (ja) * 1999-01-29 2003-06-30 シャープ株式会社 電子デバイス製造装置および電子デバイス製造方法
JP2000319784A (ja) * 1999-05-07 2000-11-21 Riken Corp 摺動部品及びその製造方法
WO2002015225A2 (en) * 2000-08-10 2002-02-21 Tokyo Electron Limited Multiple chamber plasma reactor
JP3914093B2 (ja) 2002-05-23 2007-05-16 積水化学工業株式会社 放電プラズマ処理装置及び放電プラズマ処理方法
JP4437426B2 (ja) * 2004-08-13 2010-03-24 日本碍子株式会社 薄膜の製造方法
EP1841896B1 (en) * 2004-11-25 2014-11-05 Kabushiki Kaisha Toyota Chuo Kenkyusho Amorphous carbon film, process for forming the same, and high wear-resistant sliding member with amorphous carbon film provided
JP4519625B2 (ja) * 2004-12-13 2010-08-04 株式会社ジェイテクト 堆積膜形成装置
JP2007308758A (ja) * 2006-05-18 2007-11-29 Denso Corp 成膜装置及び成膜方法
JP2008153007A (ja) * 2006-12-15 2008-07-03 Nisshin:Kk プラズマ発生装置
JP2008163430A (ja) * 2006-12-28 2008-07-17 Jtekt Corp 高耐食性部材およびその製造方法

Also Published As

Publication number Publication date
AU2009292608B2 (en) 2010-10-21
AU2009292608A1 (en) 2010-04-29
MX2010002570A (es) 2010-05-27
EP2327811A4 (en) 2012-07-04
WO2010035516A1 (ja) 2010-04-01
EP2327811A1 (en) 2011-06-01

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 6A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2343 DE 01-12-2015 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.