BRPI0915791A2 - processo de instalação para a preparação de superfície mediante descarga de barreira dielétrica - Google Patents

processo de instalação para a preparação de superfície mediante descarga de barreira dielétrica

Info

Publication number
BRPI0915791A2
BRPI0915791A2 BRPI0915791A BRPI0915791A BRPI0915791A2 BR PI0915791 A2 BRPI0915791 A2 BR PI0915791A2 BR PI0915791 A BRPI0915791 A BR PI0915791A BR PI0915791 A BRPI0915791 A BR PI0915791A BR PI0915791 A2 BRPI0915791 A2 BR PI0915791A2
Authority
BR
Brazil
Prior art keywords
installation process
dielectric barrier
barrier discharge
surface preparation
preparation
Prior art date
Application number
BRPI0915791A
Other languages
English (en)
Inventor
Eric Michel
Eric Tixhon
Joseph Leclercq
Original Assignee
Agc Glass Europe
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agc Glass Europe filed Critical Agc Glass Europe
Publication of BRPI0915791A2 publication Critical patent/BRPI0915791A2/pt
Publication of BRPI0915791B1 publication Critical patent/BRPI0915791B1/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32366—Localised processing
    • H01J37/32376—Scanning across large workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
BRPI0915791-3A 2008-07-16 2009-07-16 Processo de instalação para a preparação de superfície mediante descarga de barreira dielétrica BRPI0915791B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08160512.3 2008-07-16
EP08160512A EP2145701A1 (fr) 2008-07-16 2008-07-16 Procédé et installation pour la préparation de surface par décharge à barrière diélectrique
PCT/EP2009/059158 WO2010007135A1 (en) 2008-07-16 2009-07-16 Process and installation for surface preparation by dielectric barrier discharge

Publications (2)

Publication Number Publication Date
BRPI0915791A2 true BRPI0915791A2 (pt) 2015-11-10
BRPI0915791B1 BRPI0915791B1 (pt) 2019-10-01

Family

ID=40111056

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0915791-3A BRPI0915791B1 (pt) 2008-07-16 2009-07-16 Processo de instalação para a preparação de superfície mediante descarga de barreira dielétrica

Country Status (10)

Country Link
US (1) US8470095B2 (pt)
EP (2) EP2145701A1 (pt)
JP (1) JP5558465B2 (pt)
CN (1) CN102083554B (pt)
BR (1) BRPI0915791B1 (pt)
EA (1) EA018888B1 (pt)
ES (1) ES2399181T3 (pt)
PL (1) PL2321070T3 (pt)
SI (1) SI2321070T1 (pt)
WO (1) WO2010007135A1 (pt)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2145978A1 (fr) 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur un substrat
EP2145979A1 (fr) * 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur les deux faces d'un substrat de façon simultanée
EP2326151A1 (fr) * 2009-11-24 2011-05-25 AGC Glass Europe Procédé et dispositif de polarisation d'une électrode DBD
CN102325422A (zh) * 2011-09-13 2012-01-18 青岛佳明测控仪器有限公司 平板型全密封低温等离子体激发源
WO2013052261A2 (en) * 2011-09-15 2013-04-11 Cold Plasma Medical Technologies, Inc. Harmonic cold plasma devices and associated methods
US9378932B2 (en) 2012-07-11 2016-06-28 Asahi Glass Company, Limited Device and process for preventing substrate damages in a DBD plasma installation
US10133196B2 (en) * 2014-04-09 2018-11-20 Asml Netherlands B.V. Apparatus for cleaning an object
DE102017126886B3 (de) * 2017-11-15 2019-01-24 Graforce Gmbh Verfahren und Vorrichtung zur plasmainduzierten Wasserspaltung
CN115650736B (zh) * 2022-10-10 2023-06-16 国网江西省电力有限公司电力科学研究院 一种基于介质阻挡放电排胶处理的陶瓷室温超快烧结方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5711806A (en) * 1980-06-27 1982-01-21 Nagoya Sangyo Kagaku Kenkyusho Ozonizer
JPH0719750B2 (ja) * 1984-06-22 1995-03-06 鐘淵化学工業株式会社 グロ−放電型成膜装置
US4871421A (en) * 1988-09-15 1989-10-03 Lam Research Corporation Split-phase driver for plasma etch system
JPH0892747A (ja) * 1994-09-22 1996-04-09 Sekisui Chem Co Ltd 基板の表面処理方法
US5910886A (en) * 1997-11-07 1999-06-08 Sierra Applied Sciences, Inc. Phase-shift power supply
JP3868624B2 (ja) * 1998-03-31 2007-01-17 三菱電機株式会社 プラズマ発生用電源装置
JP3719352B2 (ja) * 1999-07-23 2005-11-24 三菱電機株式会社 プラズマ発生用電源装置及びその製造方法
JP2002058995A (ja) * 2000-08-21 2002-02-26 Matsushita Electric Works Ltd プラズマ処理装置及びプラズマ処理方法
JP2003059909A (ja) * 2001-08-17 2003-02-28 Sekisui Chem Co Ltd 放電プラズマ処理装置及びそれを用いた処理方法
WO2003034014A2 (en) * 2001-10-16 2003-04-24 Innovent, Llc. Systems and methods for measuring pressure
US6774569B2 (en) * 2002-07-11 2004-08-10 Fuji Photo Film B.V. Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions
JP2004103251A (ja) * 2002-09-04 2004-04-02 Sekisui Chem Co Ltd 放電プラズマ処理装置
CN100589675C (zh) * 2004-03-29 2010-02-10 三菱电机株式会社 等离子体发生用电源装置
DE602004003697T2 (de) * 2004-08-13 2007-10-04 Fuji Film Manufacturing Europe B.V. Verfahren und Vorrichtung zur Steuerung eines Glühentladungsplasmas unter atmosphärischem Druck
CN1852632A (zh) * 2006-06-07 2006-10-25 大连理工大学 基片电极调谐型射频感性耦合等离子体源
JP2008153148A (ja) * 2006-12-20 2008-07-03 Seiko Epson Corp プラズマ処理装置
EP2145978A1 (fr) * 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur un substrat
EP2145979A1 (fr) * 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur les deux faces d'un substrat de façon simultanée

Also Published As

Publication number Publication date
SI2321070T1 (sl) 2013-03-29
WO2010007135A1 (en) 2010-01-21
EP2145701A1 (fr) 2010-01-20
JP2011528165A (ja) 2011-11-10
BRPI0915791B1 (pt) 2019-10-01
EA201100220A1 (ru) 2011-08-30
EP2321070B1 (en) 2012-11-28
US8470095B2 (en) 2013-06-25
CN102083554B (zh) 2012-08-29
JP5558465B2 (ja) 2014-07-23
EA018888B1 (ru) 2013-11-29
US20110174333A1 (en) 2011-07-21
EP2321070A1 (en) 2011-05-18
PL2321070T3 (pl) 2013-04-30
ES2399181T3 (es) 2013-03-26
CN102083554A (zh) 2011-06-01

Similar Documents

Publication Publication Date Title
BRPI0915791A2 (pt) processo de instalação para a preparação de superfície mediante descarga de barreira dielétrica
BRPI0911254A2 (pt) processo para a preparação de um composto
BRPI0915017A2 (pt) Processo para a produção de álcool
BRPI1012595A2 (pt) processo para fabricação de uma manta em relevo
BRPI0910910A2 (pt) processo para preparar um composto
BRPI0819659A2 (pt) Processo para produção de álcool
BR112012003615A2 (pt) processo para a produção de butadieno
BRPI0910916A2 (pt) Processo para a produção de um dianidroaçúcar
BRPI0817836A2 (pt) Método para a produção de cerveja
BRPI0718257A2 (pt) Método para a produção de alumina
BR112012014490A2 (pt) processo para a preparação substituída de 1-o-acil-2-desóxi-2-fluoro-4-tio-beta-d-arabinofuranoses
BRPI1012018A2 (pt) processo para preparar um composto
BRPI0922490A2 (pt) Método para produção de beta-santaleno
BRPI0915572A2 (pt) processo para a fabricação de epicloroidrina
BRPI1014267A2 (pt) processo para a carbonitrificação
BRPI0913217A2 (pt) processo para a produção de etileno
BRPI0919241A8 (pt) processo para fabricação de compostos de quinolona
BRPI1011008A2 (pt) processo para a produção de copolímeros em bloco de éter de poliarieno
BRPI0813960A2 (pt) Processo para produção de biarilas
BRPI0910545A2 (pt) processo contínuo para fazer composições farmacêuticas
BRPI1013830A2 (pt) Processo para a iodação de compostos aromáticos
BRPI0921882A2 (pt) processo para fabricar um composto.
BRPI0921420A2 (pt) processo para preparar compostos
BRPI0907540A2 (pt) Processo para a fabricação de pelo menos um composto derivado de etileno
BRPI0912202A2 (pt) processo para a preparação de um painel

Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06T Formal requirements before examination [chapter 6.20 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 01/10/2019, OBSERVADAS AS CONDICOES LEGAIS. (CO) 10 (DEZ) ANOS CONTADOS A PARTIR DE 01/10/2019, OBSERVADAS AS CONDICOES LEGAIS

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 13A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2679 DE 10-05-2022 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.