BRPI0920600A2 - method for galvanic deposition of resistant chrome layers - Google Patents

method for galvanic deposition of resistant chrome layers

Info

Publication number
BRPI0920600A2
BRPI0920600A2 BRPI0920600A BRPI0920600A BRPI0920600A2 BR PI0920600 A2 BRPI0920600 A2 BR PI0920600A2 BR PI0920600 A BRPI0920600 A BR PI0920600A BR PI0920600 A BRPI0920600 A BR PI0920600A BR PI0920600 A2 BRPI0920600 A2 BR PI0920600A2
Authority
BR
Brazil
Prior art keywords
galvanic deposition
chrome layers
resistant chrome
resistant
layers
Prior art date
Application number
BRPI0920600A
Other languages
Portuguese (pt)
Inventor
Helmut Horsthemke
Original Assignee
Enthone
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40427109&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BRPI0920600(A2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Enthone filed Critical Enthone
Publication of BRPI0920600A2 publication Critical patent/BRPI0920600A2/en
Publication of BRPI0920600B1 publication Critical patent/BRPI0920600B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/04—Removal of gases or vapours ; Gas or pressure control
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/10—Bearings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
BRPI0920600-0A 2008-10-22 2009-10-22 Method for galvanic deposition of a resistant chromium layer on a substrate surface BRPI0920600B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08018462.5A EP2180088B2 (en) 2008-10-22 2008-10-22 Method for electroplating hard chrome layers
EP08018462.5 2008-10-22
PCT/US2009/061683 WO2010048404A1 (en) 2008-10-22 2009-10-22 Method for galvanic deposition of hard chrome layers

Publications (2)

Publication Number Publication Date
BRPI0920600A2 true BRPI0920600A2 (en) 2015-12-22
BRPI0920600B1 BRPI0920600B1 (en) 2019-05-28

Family

ID=40427109

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0920600-0A BRPI0920600B1 (en) 2008-10-22 2009-10-22 Method for galvanic deposition of a resistant chromium layer on a substrate surface

Country Status (9)

Country Link
US (1) US20110198226A1 (en)
EP (1) EP2180088B2 (en)
JP (1) JP5739341B2 (en)
KR (1) KR101658254B1 (en)
CN (1) CN102257184B (en)
BR (1) BRPI0920600B1 (en)
ES (1) ES2363566T5 (en)
PL (1) PL2180088T5 (en)
WO (1) WO2010048404A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL2845928T3 (en) * 2013-09-05 2020-05-18 Macdermid Enthone Inc. Aqueous electrolyte composition having a reduced airborne emission
DE102015122479A1 (en) * 2014-12-19 2016-07-07 Weber-Hydraulik Gmbh Process for the optical marking and / or marking of round material
DE102020105003A1 (en) * 2020-02-26 2021-08-26 Federal-Mogul Burscheid Gmbh Piston ring with hard chrome layer and improved run-in behavior
US11566679B2 (en) * 2020-11-03 2023-01-31 DRiV Automotive Inc. Bumper cap for damper
CN114703516A (en) * 2021-12-14 2022-07-05 西安昆仑工业（集团）有限责任公司 Rapid chromium plating process method for artillery barrel

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE494578A (en) 1949-03-18
FI53841C (en) 1975-05-07 1978-08-10 Teuvo Tapio Korpi ELEKTROLYTISK YTBELAEGGNINGSANORDNING
FR2462490A1 (en) * 1979-08-03 1981-02-13 Centre Techn Ind Mecanique ELECTROLYTIC COATING DEVICE
US4261086A (en) 1979-09-04 1981-04-14 Ford Motor Company Method for manufacturing variable capacitance pressure transducers
JPS62263991A (en) * 1986-05-07 1987-11-16 Adachi Shin Sangyo Kk Manufacture of plated material
JPH02217429A (en) * 1989-02-17 1990-08-30 Fujitsu Ltd Plating method and apparatus
US5277785A (en) 1992-07-16 1994-01-11 Anglen Erik S Van Method and apparatus for depositing hard chrome coatings by brush plating
US20010054557A1 (en) 1997-06-09 2001-12-27 E. Jennings Taylor Electroplating of metals using pulsed reverse current for control of hydrogen evolution
JP3918142B2 (en) † 1998-11-06 2007-05-23 株式会社日立製作所 Chrome-plated parts, chromium-plating method, and method of manufacturing chromium-plated parts
USRE40386E1 (en) * 1998-11-06 2008-06-17 Hitachi Ltd. Chrome plated parts and chrome plating method
JP2002047595A (en) * 2000-07-31 2002-02-15 Tokico Ltd Chrome plating method and chrome plating equipment
JP3423702B2 (en) * 2000-08-29 2003-07-07 創輝株式会社 Metal plating method
SG130126A1 (en) * 2005-08-08 2007-03-20 Nanofilm Technologies Int Metal coatings

Also Published As

Publication number Publication date
EP2180088A1 (en) 2010-04-28
KR20110075028A (en) 2011-07-05
PL2180088T3 (en) 2011-09-30
US20110198226A1 (en) 2011-08-18
ES2363566T5 (en) 2020-04-16
EP2180088B1 (en) 2011-05-11
JP2012506496A (en) 2012-03-15
ES2363566T3 (en) 2011-08-09
WO2010048404A1 (en) 2010-04-29
EP2180088B2 (en) 2019-06-12
CN102257184B (en) 2014-01-15
JP5739341B2 (en) 2015-06-24
BRPI0920600B1 (en) 2019-05-28
KR101658254B1 (en) 2016-09-20
PL2180088T5 (en) 2020-11-16
CN102257184A (en) 2011-11-23

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Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06T Formal requirements before examination [chapter 6.20 patent gazette]

Free format text: O DEPOSITANTE DEVE RESPONDER A EXIGENCIA FORMULADA NESTE PARECER POR MEIO DO SERVICO DE CODIGO 206 EM ATE 60 (SESSENTA) DIAS, A PARTIR DA DATA DE PUBLICACAO NA RPI, SOB PENA DO ARQUIVAMENTO DO PEDIDO, DE ACORDO COM O ART. 34 DA LPI.PUBLIQUE-SE A EXIGENCIA (6.20).

B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 22/10/2009, OBSERVADAS AS CONDICOES LEGAIS. (CO) 20 (VINTE) ANOS CONTADOS A PARTIR DE 22/10/2009, OBSERVADAS AS CONDICOES LEGAIS

B25I Requirement for requested change of headquarter

Owner name: ENTHONE INC. (US)

Free format text: A FIM DE ATENDER A ALTERACAO DE ENDERECO REQUERIDA ATRAVES DA PETICAO 870190056622 DE 18/06/2019, E NECESSARIO O RECOLHIMENTO DE UMA GUIA 248, ALEM DA GUIA 207 DE CUMPRIMENTO DE EXIGENCIA, PARA A EXECUCAO DO SERVICO, POIS FORAM SOLICITADOS DOIS SERVICOS, UMA ALTERACAO DENOME E UMA ALTERACAO DE ENDERECO, E APENAS UMA GUIA 248 FOI RECOLHIDA.

B25L Entry of change of name and/or headquarter and transfer of application, patent and certificate of addition of invention: publication cancelled

Owner name: ENTHONE INC. (US)

Free format text: ANULADA A PUBLICACAO CODIGO 25.9 NA RPI NO 2543 DE 01/10/2019 POR TER SIDO INDEVIDA.

B25D Requested change of name of applicant approved

Owner name: MACDERMID ENTHONE INC. (US)

B25G Requested change of headquarter approved

Owner name: MACDERMID ENTHONE INC. (US)