BRPI0923092A2 - dispositivo e método para tratamento e/ou revestimento de superfícies de componentes de substrato por deposição a partir da fase gasosa. - Google Patents

dispositivo e método para tratamento e/ou revestimento de superfícies de componentes de substrato por deposição a partir da fase gasosa.

Info

Publication number
BRPI0923092A2
BRPI0923092A2 BRPI0923092A BRPI0923092A BRPI0923092A2 BR PI0923092 A2 BRPI0923092 A2 BR PI0923092A2 BR PI0923092 A BRPI0923092 A BR PI0923092A BR PI0923092 A BRPI0923092 A BR PI0923092A BR PI0923092 A2 BRPI0923092 A2 BR PI0923092A2
Authority
BR
Brazil
Prior art keywords
deposition
coating
surface treatment
gas phase
substrate components
Prior art date
Application number
BRPI0923092A
Other languages
English (en)
Inventor
Mario Fiedler
Original Assignee
Guhring Ohg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guhring Ohg filed Critical Guhring Ohg
Publication of BRPI0923092A2 publication Critical patent/BRPI0923092A2/pt
Publication of BRPI0923092B1 publication Critical patent/BRPI0923092B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
BRPI0923092-0A 2008-12-15 2009-12-04 Dispositivo e método para tratamento e/ou revestimento de superfícies de componentes de substrato por deposição a partir da fase gasosa BRPI0923092B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102008062332.6 2008-12-15
DE102008062332A DE102008062332A1 (de) 2008-12-15 2008-12-15 Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten
PCT/DE2009/001712 WO2010069289A1 (de) 2008-12-15 2009-12-04 Vorrichtung zur oberflächenbehandlung und/oder -beschichtung von substratkomponenten

Publications (2)

Publication Number Publication Date
BRPI0923092A2 true BRPI0923092A2 (pt) 2016-07-26
BRPI0923092B1 BRPI0923092B1 (pt) 2020-02-11

Family

ID=41818515

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0923092-0A BRPI0923092B1 (pt) 2008-12-15 2009-12-04 Dispositivo e método para tratamento e/ou revestimento de superfícies de componentes de substrato por deposição a partir da fase gasosa

Country Status (13)

Country Link
US (2) US20110305833A1 (pt)
EP (1) EP2373828B1 (pt)
JP (1) JP5700454B2 (pt)
KR (1) KR20110098764A (pt)
CN (1) CN102245799B (pt)
AU (1) AU2009328788B2 (pt)
BR (1) BRPI0923092B1 (pt)
CA (1) CA2748893A1 (pt)
DE (1) DE102008062332A1 (pt)
EA (1) EA023891B1 (pt)
MX (1) MX2011006238A (pt)
SG (1) SG172178A1 (pt)
WO (1) WO2010069289A1 (pt)

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DE102010032591A1 (de) 2010-07-23 2012-01-26 Leybold Optics Gmbh Vorrichtung und Verfahren zur Vakuumbeschichtung
CN102560373B (zh) * 2010-12-16 2014-12-17 北京北方微电子基地设备工艺研究中心有限责任公司 基片加热腔室、使用基片加热腔室的方法及基片处理设备
CN102560381A (zh) * 2010-12-29 2012-07-11 鸿富锦精密工业（深圳）有限公司 溅镀装置
EP2924142B1 (en) 2012-05-15 2016-11-16 ZhongAo HuiCheng Technology Co. Ltd. A nano-multilayer film
EP2868768B1 (en) * 2013-10-29 2021-06-16 Oerlikon Surface Solutions AG, Pfäffikon Shutter system
CN103643205B (zh) * 2013-12-04 2015-11-18 王普 一种真空镀膜机
WO2015161469A1 (zh) * 2014-04-23 2015-10-29 中奥汇成科技股份有限公司 一种人工关节臼杯、磁控溅射镀膜装置及其制备方法
CN104120389B (zh) * 2014-08-04 2016-08-24 上海和辉光电有限公司 镀膜设备
JP6823392B2 (ja) * 2016-07-05 2021-02-03 東京エレクトロン株式会社 絶縁膜を形成する方法
CN107130213B (zh) * 2017-05-03 2019-04-09 成都真锐科技涂层技术有限公司 多元合金复合薄膜制备设备和制备方法
WO2019018698A1 (en) * 2017-07-19 2019-01-24 Intevac, Inc. SYSTEM FOR FORMING A NANO-LAMINATED OPTICAL COATING
KR102022927B1 (ko) * 2017-10-19 2019-09-19 재단법인 오송첨단의료산업진흥재단 의료용 peek 소재 표면의 마이크로 기공 구조의 타이타늄 코팅 방법
CN109023288B (zh) * 2017-12-08 2020-10-13 寰采星科技(宁波)有限公司 一种具有高效蒸镀工作装置的oled蒸镀设备
US20220242672A1 (en) * 2019-02-20 2022-08-04 Oerlikon Surface Solutions Ag, Pfäffikon Optimized System and Method for Transporting and Moving Substrates in a Modular Coating Facility
CN109898062A (zh) * 2019-03-07 2019-06-18 厦门阿匹斯智能制造系统有限公司 一种磁控溅射镀膜设备及镀膜方法
CN115896747B (zh) * 2021-09-30 2024-10-15 馗鼎奈米科技(深圳)有限公司 表面处理设备
US12331400B2 (en) 2022-11-07 2025-06-17 Creating Nano Technologies, Inc. Surface treatment apparatus

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JPS59157281A (ja) * 1983-02-24 1984-09-06 Tokuda Seisakusho Ltd スパツタリング装置
US5328583A (en) * 1991-11-05 1994-07-12 Canon Kabushiki Kaisha Sputtering apparatus and process for forming lamination film employing the apparatus
GB9405442D0 (en) * 1994-03-19 1994-05-04 Applied Vision Ltd Apparatus for coating substrates
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Also Published As

Publication number Publication date
KR20110098764A (ko) 2011-09-01
AU2009328788A1 (en) 2011-07-28
MX2011006238A (es) 2011-06-28
JP2012512321A (ja) 2012-05-31
EP2373828A1 (de) 2011-10-12
DE102008062332A1 (de) 2010-06-17
WO2010069289A1 (de) 2010-06-24
BRPI0923092B1 (pt) 2020-02-11
EA201170814A1 (ru) 2011-12-30
EA023891B1 (ru) 2016-07-29
CA2748893A1 (en) 2010-06-24
SG172178A1 (en) 2011-07-28
US10711349B2 (en) 2020-07-14
US20110305833A1 (en) 2011-12-15
US20130216711A1 (en) 2013-08-22
CN102245799B (zh) 2014-02-12
JP5700454B2 (ja) 2015-04-15
EP2373828B1 (de) 2014-11-12
CN102245799A (zh) 2011-11-16
AU2009328788B2 (en) 2015-10-29

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Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B15K Others concerning applications: alteration of classification

Free format text: AS CLASSIFICACOES ANTERIORES ERAM: C23C 14/35 , C23C 14/56

Ipc: C23C 14/00 (1985.01), C23C 14/56 (1985.01), C23C 1

B06T Formal requirements before examination [chapter 6.20 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 11/02/2020, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 15A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2804 DE 01-10-2024 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.