CA1005174A - Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts - Google Patents

Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts

Info

Publication number
CA1005174A
CA1005174A CA202,050A CA202050A CA1005174A CA 1005174 A CA1005174 A CA 1005174A CA 202050 A CA202050 A CA 202050A CA 1005174 A CA1005174 A CA 1005174A
Authority
CA
Canada
Prior art keywords
substrate
electron beam
schottky barrier
beam alignment
barrier contacts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA202,050A
Other languages
English (en)
Other versions
CA202050S (en
Inventor
Terence W. O'keeffe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Westinghouse Electric Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00402239A external-priority patent/US3832561A/en
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Application granted granted Critical
Publication of CA1005174A publication Critical patent/CA1005174A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
CA202,050A 1973-06-15 1974-06-10 Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts Expired CA1005174A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37048973A 1973-06-15 1973-06-15
US00402239A US3832561A (en) 1973-10-01 1973-10-01 Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts

Publications (1)

Publication Number Publication Date
CA1005174A true CA1005174A (en) 1977-02-08

Family

ID=27004972

Family Applications (1)

Application Number Title Priority Date Filing Date
CA202,050A Expired CA1005174A (en) 1973-06-15 1974-06-10 Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts

Country Status (5)

Country Link
JP (1) JPS5035799A (ja)
CA (1) CA1005174A (ja)
DE (1) DE2428041A1 (ja)
FR (1) FR2233791B1 (ja)
GB (1) GB1468892A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101116321B1 (ko) * 2009-08-21 2012-03-09 에이피시스템 주식회사 기판 정렬 방법
CN111128829B (zh) * 2019-12-23 2022-07-19 上海华力微电子有限公司 对准方法及校准方法

Also Published As

Publication number Publication date
DE2428041A1 (de) 1975-03-20
FR2233791B1 (ja) 1978-10-27
FR2233791A1 (ja) 1975-01-10
JPS5035799A (ja) 1975-04-04
GB1468892A (en) 1977-03-30

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