CA1008593A - Polymeric quinone diazides in photosensitive compositions - Google Patents

Polymeric quinone diazides in photosensitive compositions

Info

Publication number
CA1008593A
CA1008593A CA160,733A CA160733A CA1008593A CA 1008593 A CA1008593 A CA 1008593A CA 160733 A CA160733 A CA 160733A CA 1008593 A CA1008593 A CA 1008593A
Authority
CA
Canada
Prior art keywords
photosensitive compositions
quinone diazides
polymeric
polymeric quinone
diazides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA160,733A
Other languages
English (en)
Inventor
Joseph A. Arcesi
Constantine C. Petropoulos
Frederick J. Rauner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of CA1008593A publication Critical patent/CA1008593A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02—Polyamines
    • C08G73/0206—Polyalkylene(poly)amines
    • C08G73/0213—Preparatory process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CA160,733A 1972-02-22 1973-01-08 Polymeric quinone diazides in photosensitive compositions Expired CA1008593A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22839272A 1972-02-22 1972-02-22

Publications (1)

Publication Number Publication Date
CA1008593A true CA1008593A (en) 1977-04-12

Family

ID=22856992

Family Applications (1)

Application Number Title Priority Date Filing Date
CA160,733A Expired CA1008593A (en) 1972-02-22 1973-01-08 Polymeric quinone diazides in photosensitive compositions

Country Status (4)

Country Link
JP (1) JPS4896575A (fr)
BE (1) BE795809A (fr)
CA (1) CA1008593A (fr)
FR (1) FR2173074A1 (fr)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526856A (en) * 1983-05-23 1985-07-02 Allied Corporation Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents
JP2697039B2 (ja) * 1988-12-06 1998-01-14 住友化学工業株式会社 ポジ型レジスト組成物の製造方法
DE4039920A1 (de) * 1990-12-14 1992-06-17 Basf Ag Neue polyethylenimin- und polyvinylamin-derivate, mit diesen derivaten beschichtete traegermaterialien auf der basis von aluminium sowie deren verwendung zur herstellung von offsetdruckplatten
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
US5942368A (en) * 1996-04-23 1999-08-24 Konica Corporation Pigment dispersion composition
ATE420767T1 (de) 2000-11-30 2009-01-15 Fujifilm Corp Lithographische druckplattenvorläufer
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
US7081330B2 (en) 2002-09-20 2006-07-25 Fuji Photo Film Co., Ltd. Method of making lithographic printing plate
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
WO2009063824A1 (fr) 2007-11-14 2009-05-22 Fujifilm Corporation Procédé de séchage de film de revêtement et procédé pour produire un précurseur de plaque d'impression lithographique
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
US8883401B2 (en) 2009-09-24 2014-11-11 Fujifilm Corporation Lithographic printing original plate
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Also Published As

Publication number Publication date
JPS4896575A (fr) 1973-12-10
BE795809A (fr) 1973-08-22
FR2173074A1 (en) 1973-10-05

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