CA1050865A - Composes alcalins et methode de gravure sur cuivre - Google Patents

Composes alcalins et methode de gravure sur cuivre

Info

Publication number: CA1050865A
Authority: CA; Canada
Prior art keywords: copper; ions; solution; sulfamate; etchant
Prior art date: 1975-09-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA235,971A

Other languages

English (en)

Other versions

CA235971S (en

Inventor

Jo Wynschenk

Theophil J. Wieczorek

Frank A. Brindisi (Jr.)

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

MacDermid Enthone Inc

Original Assignee

Enthone Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-09-22

Filing date

1975-09-22

Publication date

1979-03-20

1975-09-22 Application filed by Enthone Inc filed Critical Enthone Inc

1975-09-22 Priority to CA235,971A priority Critical patent/CA1050865A/fr

1979-03-20 Application granted granted Critical

1979-03-20 Publication of CA1050865A publication Critical patent/CA1050865A/fr

Status Expired legal-status Critical Current

Links

239000010949 copper Substances 0.000 title claims abstract description 87
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 70
229910052802 copper Inorganic materials 0.000 title claims abstract description 69
238000005530 etching Methods 0.000 title claims abstract description 41
238000000034 method Methods 0.000 title claims description 16
230000008569 process Effects 0.000 title claims description 11
239000000203 mixture Substances 0.000 title description 3
-1 sulfamate ions Chemical class 0.000 claims abstract description 31
150000002500 ions Chemical class 0.000 claims abstract description 28
239000007800 oxidant agent Substances 0.000 claims abstract description 6
230000001590 oxidative effect Effects 0.000 claims abstract description 4
LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 claims description 16
IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 claims description 15
VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical group [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 14
239000000908 ammonium hydroxide Substances 0.000 claims description 14
229940116318 copper carbonate Drugs 0.000 claims description 10
229910000009 copper(II) carbonate Inorganic materials 0.000 claims description 10
GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 claims description 10
235000019854 cupric carbonate Nutrition 0.000 claims description 10
239000011646 cupric carbonate Substances 0.000 claims description 10
QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 8
QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 7
239000000470 constituent Substances 0.000 claims description 4
239000000758 substrate Substances 0.000 claims description 4
GEHMBYLTCISYNY-UHFFFAOYSA-N Ammonium sulfamate Chemical compound [NH4+].NS([O-])(=O)=O GEHMBYLTCISYNY-UHFFFAOYSA-N 0.000 claims description 3
BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims description 2
229910052921 ammonium sulfate Inorganic materials 0.000 claims description 2
235000011130 ammonium sulphate Nutrition 0.000 claims description 2
238000004519 manufacturing process Methods 0.000 abstract description 6
239000000654 additive Substances 0.000 abstract description 3
230000000996 additive effect Effects 0.000 abstract description 2
230000000536 complexating effect Effects 0.000 abstract 1
239000000243 solution Substances 0.000 description 100
229910001868 water Inorganic materials 0.000 description 15
239000012141 concentrate Substances 0.000 description 14
235000008504 concentrate Nutrition 0.000 description 14
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 4
229910017974 NH40H Inorganic materials 0.000 description 4
239000002253 acid Substances 0.000 description 4
ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 4
239000008139 complexing agent Substances 0.000 description 4
ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 4
QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical class [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
239000007864 aqueous solution Substances 0.000 description 3
XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 3
238000002360 preparation method Methods 0.000 description 3
150000003839 salts Chemical class 0.000 description 3
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
229910021529 ammonia Inorganic materials 0.000 description 2
235000019270 ammonium chloride Nutrition 0.000 description 2
229910001870 ammonium persulfate Inorganic materials 0.000 description 2
ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
229910000366 copper(II) sulfate Inorganic materials 0.000 description 2
OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
229960003280 cupric chloride Drugs 0.000 description 2
230000000694 effects Effects 0.000 description 2
230000005484 gravity Effects 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
239000007921 spray Substances 0.000 description 2
PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
239000004593 Epoxy Substances 0.000 description 1
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
239000005977 Ethylene Substances 0.000 description 1
241000982822 Ficus obtusifolia Species 0.000 description 1
CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
241000357437 Mola Species 0.000 description 1
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
229910002651 NO3 Inorganic materials 0.000 description 1
DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical class CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
230000002378 acidificating effect Effects 0.000 description 1
229910052783 alkali metal Inorganic materials 0.000 description 1
239000001099 ammonium carbonate Substances 0.000 description 1
235000012501 ammonium carbonate Nutrition 0.000 description 1
150000001450 anions Chemical class 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid group Chemical group C(C1=CC=CC=C1)(=O)O WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
239000004202 carbamide Substances 0.000 description 1
239000003153 chemical reaction reagent Substances 0.000 description 1
229910001919 chlorite Inorganic materials 0.000 description 1
229910052619 chlorite group Inorganic materials 0.000 description 1
QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 description 1
239000010941 cobalt Substances 0.000 description 1
229910017052 cobalt Inorganic materials 0.000 description 1
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
230000002844 continuous effect Effects 0.000 description 1
150000001879 copper Chemical class 0.000 description 1
239000011889 copper foil Substances 0.000 description 1
JJLJMEJHUUYSSY-UHFFFAOYSA-L copper(II) hydroxide Inorganic materials [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
229940076286 cupric acetate Drugs 0.000 description 1
229960004643 cupric oxide Drugs 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
235000011187 glycerol Nutrition 0.000 description 1
229960002163 hydrogen peroxide Drugs 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
238000011065 in-situ storage Methods 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
239000007788 liquid Substances 0.000 description 1
229910052750 molybdenum Inorganic materials 0.000 description 1
239000011733 molybdenum Substances 0.000 description 1
238000012544 monitoring process Methods 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
229910000069 nitrogen hydride Inorganic materials 0.000 description 1
150000002894 organic compounds Chemical class 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
238000005554 pickling Methods 0.000 description 1
238000007747 plating Methods 0.000 description 1
BTAAXEFROUUDIL-UHFFFAOYSA-M potassium;sulfamate Chemical compound [K+].NS([O-])(=O)=O BTAAXEFROUUDIL-UHFFFAOYSA-M 0.000 description 1
150000004672 propanoic acids Chemical class 0.000 description 1
235000019260 propionic acid Nutrition 0.000 description 1
235000013772 propylene glycol Nutrition 0.000 description 1
230000000979 retarding effect Effects 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000011734 sodium Substances 0.000 description 1
229910000679 solder Inorganic materials 0.000 description 1
230000000087 stabilizing effect Effects 0.000 description 1
239000000126 substance Substances 0.000 description 1
IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid group Chemical group S(N)(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
238000004448 titration Methods 0.000 description 1
YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1
229910052720 vanadium Inorganic materials 0.000 description 1
GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
239000011701 zinc Substances 0.000 description 1

Landscapes

ing And Chemical Polishing (AREA)
Manufacturing Of Printed Circuit Boards (AREA)

CA235,971A 1975-09-22 1975-09-22 Composes alcalins et methode de gravure sur cuivre Expired CA1050865A (fr)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
CA235,971A CA1050865A (fr)	1975-09-22	1975-09-22	Composes alcalins et methode de gravure sur cuivre

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
CA235,971A CA1050865A (fr)	1975-09-22	1975-09-22	Composes alcalins et methode de gravure sur cuivre

Publications (1)

Publication Number	Publication Date
CA1050865A true CA1050865A (fr)	1979-03-20

Family

ID=4104108

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA235,971A Expired CA1050865A (fr)	1975-09-22	1975-09-22	Composes alcalins et methode de gravure sur cuivre

Country Status (1)

Country	Link
CA (1)	CA1050865A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN112064030A (zh) *	2020-08-03	2020-12-11	广东臻鼎环境科技有限公司	一种适用于电解提铜的印刷线路板碱性蚀刻液
CN114025501A (zh) *	2021-11-19	2022-02-08	深圳玛斯兰电路科技实业发展有限公司	一种pcb板蚀刻加工去铜的方法

1975
- 1975-09-22 CA CA235,971A patent/CA1050865A/fr not_active Expired

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN112064030A (zh) *	2020-08-03	2020-12-11	广东臻鼎环境科技有限公司	一种适用于电解提铜的印刷线路板碱性蚀刻液
CN114025501A (zh) *	2021-11-19	2022-02-08	深圳玛斯兰电路科技实业发展有限公司	一种pcb板蚀刻加工去铜的方法
CN114025501B (zh) *	2021-11-19	2024-03-29	吉安市三强线路有限公司	一种pcb板蚀刻加工去铜的方法

Publication	Publication Date	Title
US4311551A (en)	1982-01-19	Composition and method for etching copper substrates
DE102009037855B4 (de)	2022-12-15	Verfahren zur Oberflächenbehandlung von Aluminium oder Aluminiumlegierungen
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